CVD equipment for deposition of carbon-based materials

FACILITIES / NANOMATERIALE

CVD equipment for deposition of carbon-based materials

The equipment will be used for the deposition of carbon-based materials, such as graphene, nanotubes, possibly SiC, necessary for developing heterostructures of interest, including such materials.

TECHNICAL SPECIFICATIONS
  • Substrate size: 2 inches;
  • Base vacuum chamber in deposit: minimum 10-5 mbar;
  • Substrate temperature of 1400 oC;
  • Gas Lines: 5, with flow control;
  • Automatic and computerized control of all process parameters, including recipes’ storage.


Back to top

Copyright © 2019 National Institute of Materials Physics. All Rights Reserved