Pulsed Laser Deposition (PLD) Workstation for thin layer deposition, fitted with in-situ Reflection High Energy Electron Diffraction (RHEED) analysis system (Surface)

FACILITIES / NANOMATERIALE

Pulsed Laser Deposition (PLD) Workstation for thin layer deposition, fitted with in-situ Reflection High Energy Electron Diffraction (RHEED) analysis system (Surface)
Pulsed Laser Deposition System – PLD for deposition of oxide materials thin films and multilayers, especially ferroelectrics and multiferroics. Specifications:
  • excimer laser KrF 248 nm
  • Four 2″ targets with permanent rotation and 5 axis PC controlled motion
  • substrate temperature: ≤ 1000°C
  • high vacuum 10-7 mbar
  • high-pressure RHEED system for in-situ characterization included
The Reflection High Energy Electron Diffraction –RHEED is a technique that can be used during the thin film growth to characterize the surface of crystalline materials and to monitor the deposition of each atomic layer.


Back to top

Copyright © 2019 National Institute of Materials Physics. All Rights Reserved