Pulsed Laser Deposition System – PLD for deposition of oxide materials thin films and multilayers, especially ferroelectrics and multiferroics. Specifications:
- excimer laser KrF 248 nm
- Four 2″ targets with permanent rotation and 5 axis PC controlled motion
- substrate temperature: ≤ 1000°C
- high vacuum 10-7 mbar
- high-pressure RHEED system for in-situ characterization included
The Reflection High Energy Electron Diffraction –RHEED is a technique that can be used during the thin film growth to characterize the surface of crystalline materials and to monitor the deposition of each atomic layer.
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