National Institute Of Materials Physics - Romania
Publications
761. Influence of crystal growth technology on the tolerance to radiation of silicon for detectors at future accelerators
Published: 2004, 2004 International Semiconductor Conference, Vols 1and 2, Proceedings, 422, DOI:
762. EPR study of the low temperature ferroelectic phase transition in Cu2+ doped Rb2ZnCl4 single crystals
Published: SEP 2003, SOLID STATE COMMUNICATIONS, 127, 698, DOI: 10.1016/S0038-1098(03)00649-5
763. Morphology, structure and optical properties of sol-gel ITO thin films
Published: AUG 15 2003, MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 101, 226, DOI: 10.1016/S0921-5107(02)00667-0
764. Modeling of optical charging spectroscopy investigation of trapping phenomena in nanocrystalline porous silicon
Published: JUL 1 2003, JOURNAL OF APPLIED PHYSICS, 94, 223, DOI: 10.1063/1.1576301
765. Coupled confinement effect on the photoluminescence and electrical transport in porous silicon
Published: MAY 2003, JOURNAL OF LUMINESCENCE, 102, 497, DOI: 10.1016/S2313(02)00589-6
766. Densification and crystallization of SnO2 : Sb sol-gel films using excimer laser annealing
Published: MAR 15 2003, APPLIED SURFACE SCIENCE, 208, 387, DOI: 10.1016/S0169-4332(02)01412-5
767. Calcium phosphate thin film processing by pulsed laser deposition and in situ assisted ultraviolet pulsed laser deposition
Published: DEC 2002, JOURNAL OF MATERIALS SCIENCE-MATERIALS IN MEDICINE, 13, 1173, DOI: 10.1023/A:1021150207350
768. Non-equilibrium electronic processes in nanocrystalline silicon
Published: 2002, ADVANCED TOPICS IN OPTOELECTRONICS, MICROELECTRONICS, AND NANOTECHNOLOGIES, 5227, 273, DOI:
769. Tl-0 and Tl2+ centers as paramagnetic probes for the 74K phase transition in Rb2ZnCl4
Published: 2002, RADIATION EFFECTS AND DEFECTS IN SOLIDS, 157, 697, DOI: 10.1080/10420150215809
770. The stability of cadmium chalcogenide pigments in the process of laser cleaning of painted surfaces
Published: DEC 2001, JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS, 3, 902, DOI:
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