National Institute Of Materials Physics - Romania

Our research is mainly directed towards the investigation and manipulation of physical properties at nanometric and atomic scale for the development of new materials (dielectrics, semiconductors, alloys, ceramics) for applications in the semiconductor industry (gas sensors, optical sensors, memories, radiation detectors), telecommunications, energy conversion, health and environment.

We use modern physical and chemical methods for nanomaterials synthesis, thin film deposition and device manufacturing, and we apply advanced techniques for the in-depth characterization of the microstructural, optical, electronic and magnetic properties of the created materials and devices.

Our laboratory acts as Partner Facility within the CERIC-ERIC European consortium, offering Open Access to state-of-the-art instrumentation to academic or industrial users worldwide, by semesterly calls.

Approached systems and topics:

• Thin films and multilayered structures based on SiGeSn nanoparticles embedded in dielectric matrices (HfO₂, ZrO₂, SiO₂, TiO₂, Al₂O₃, Si₃N₄) for SWIR photodetectors and non-volatile memories;
• 2D transition metal dichalcogenides materials and heterojunctions with electro-optic properties for health and environment applications;
• Metal oxides for gas sensing, photocatalysis, batteries, biomedical and environment-related applications;
• Investigation of atomic structures, interfaces, phase transitions, extended and point defects by microstructural (HRTEM, XRD), spectroscopic (EPR, EELS) and optical methods for structure-functionality correlations in advanced materials (nanoparticles, thin films, ceramics and special alloys).

Techniques and expertise available for materials synthesis, processing and characterization:

• Analytical Transmission and Scanning Electron Microscopy – open access via CERIC-ERIC.
• Multifrequency Electron Paramagnetic Resonance spectroscopy - open access via CERIC-ERIC.
• X-ray diffraction (XRD) on powder and thin film samples
• Complex electrical measurements in variable conditions: under controlled gas atmosphere, in dark or under illumination, Hall effect measurements and modelling of experimental curves;
• Optical spectroscopy.
• Magnetron sputtering deposition of thin films and multilayers;
• Rapid thermal annealing (RTA) and controlled oxidations (RTO);

Preparation of nanocrystalline materials by co-precipitation, solvothermal method and high energy ball milling.