National Institute Of Materials Physics - Romania

Structural characterization by near infrared (NIR), infrared (midIR) and far infrared (farIR) Fourier transform infrared (FTIR) spectrometry platform from JASCO, encompassing the 12000 – 50 cm–1 spectral range

Optical characterization system by variable angle spectroscopic ellipsometer (WOOLLAM) – with wavelength range 200 – 1700 nm (6.2 – 0.73 eV), angle of incidence (35 – 90°), automated sample translation stage (for mapping) 150 mm × 150 mm, and an Instec temperature control stage (-160 – 600 °C). VASE Woollam can be used in (a) […]

Microwave dielectric materials and devices testing laboratory, including:

Solar cells testing laboratory, with two NEWPORT LED solar simulators (aperture 50 mm × 50 mm), one system for measuring the Quantum Efficiency/IPCE, and accessories.

Surface investigation by scanning probe microscopy (SPM) in contact or non-contact mode with piezoelectric (PFM), magnetic (MFM) or conductive (C-AFM) response: NT-MDT NTEGRA system (left) and Asylum MFP 3D SA (right).

Electrical measurements laboratory including: a tpt HB05 wire bonding machine, 2 LAKE SHORE cryo-probers for electrical measurements in the temperature range of 10 K – 400 K; one with vertical magnetic field up to 2.5 T, and one with horizontal magnetic field up to 1.5 T, each with at least 3 micro-manipulated arms with contact […]

X-ray diffraction systems (i) for thin films analysis – Rigaku SmartLab 3 kW (2017) and Bruker D8 Advance (2006) from room-temperature to 1100 °C) and (ii) for powders – Anton Paar XRDynamic (2022) and Bruker D8 Advance (2007), from -190 ° to 600 °C. Structural characterization, allowing identification of crystalline phases, crystalline strain, quality of […]

Ceramic materials 3D printing laboratory, equipped with a NORDSON EFD, EV series, robocasting (direct ink writing) printing system, with Ultimus V dispenser (Fig. 1); an ANTON PARR MCR302e modular rheometer (Fig. 2); and a THINKY ARE-250 ceramic mixing & degassing machine.

Chemistry laboratories for the preparation of powders, thin films and bulk materials by chemical (wet) methods, equipped with high-temperature annealing furnaces; spin-coating and doctor-blade systems; glove-boxes; fume hoods; aggregate mills, weighing scales; glassware; etc (e.g., see below).  

Multi-cathode radio-frequency (RF), direct current (DC) and pulsed direct current (p-DC) Magnetron Sputtering (MS) systems with various facilities: bias, etching and heating (up to 800 °C) of substrates; vacuum load-lock for sample transfer; vacuum systems (down to ~10-6 Pa); computerized control and process automation. The latest MS equipment, AJA PHASE II J, purchased in 2016, […]