Dr. Gheorghe IORDACHE

Lowering the temperature of crystallization by deposition of thin films on a heated substrate represents the easiest way to find new means to develop and improve new working devices based on nanocrystals embedded in thin films. The improvements are strongly related with the increasing of operation speed, substantially decreasing the energy consumption and reducing unit fabrication costs of the respective semiconductor devices. This approach avoids major problems, such as those related to diffusion or difficulties in controlling nanocrystallites size, which appear during thermal treatments at high temperatures after deposition. This article reports on a significant progress given by structuring Ge nanocrystals (Ge-NCs) embedded in silicon dioxide (SiO2) thin films by heating the substrate at 400 degrees C during co-deposition of Ge and SiO2 by magnetron sputtering. As a proof-of-concept, a Si/Ge-NCs:SiO2 photo-sensitive structure was fabricated thereof and characterized. The structure shows superior performance on broad operation bandwidth from visible to near-infrared, as strong rectification properties in dark, significant current rise in the inversion mode when illuminated, high responsivity, high photo-detectivity of 10(14) Jones, quick response and significant conversion efficiency with peak value reaching 850% at -1 V and about 1000 nm. This simple preparation approach brings an important contribution to the effort of structuring Ge nanocrystallites in SiO2 thin films at a lower temperature for the purpose of using these materials for devices in optoelectronics, solar cells and electronics on flexible substrates.

This paper presents some investigations of the effect of nanopatterning on the properties of aluminum layer deposited by sputtering. UV-Nanoimprint Lithography technique has been used for the realization of a 2D array of nanostructures (pillars) in aluminum film characterized by cylindrical shape and the following structural parameters: diameter between 400 nm and 490 nm, depth between 320 nm and 420 nm and periodicity of 1.1 mu m, which have been revealed by SEM and AFM measurements. The UV-Vis transmission, reflection and photoluminescence measurements have evidenced the effect of the nanopatterning on the optical properties of the A1 layer.

Ultracompact polarization components modeled and analyzed with Finite Difference Time Domain Photonics Simulation Software (FTDT) are: a wire-grid linear polarizer and a quarter waveplate for infrared (IR) domain. They will be integrated into a polarization state analyzer (PSA). The components will be manufactured with metamaterials (MTMs). These are composite materials consisting of artificial meta-atoms, i.e. conductive nano- or micro-structures regularly arranged in a dielectric or semiconductor matrix. These conductive structures are made-up smaller than the wavelength of the radiation work. MTMs show extraordinary electromagnetic properties, typically not found in nature, such as negative refractive index. They increase the interaction between radiation and matter. The use of optical polarization components in IR imaging systems dedicated to difficult conditions of visibility is a must, as it allows improving performance and reducing the dimension of optoelectronic devices used in air, car and naval navigation. We will focus on developing the components for applications of imaging polarimetry in long-wave infrared (LWIR) range.

Obtaining high-quality materials, based on nanocrystals, at low temperatures is one of the current challenges for opening new paths in improving and developing functional devices in nanoscale electronics and optoelectronics. Here we report a detailed investigation of the optimization of parameters for the in situ synthesis of thin films with high Ge content (50 %) into SiO2. Crystalline Ge nanoparticles were directly formed during co-deposition of SiO2 and Ge on substrates at 300, 400 and 500 degrees C. Using this approach, effects related to Ge-Ge spacing are emphasized through a significant improvement of the spatial distribution of the Ge nanoparticles and by avoiding multi-step fabrication processes or Ge loss. The influence of the preparation conditions on structural, electrical and optical properties of the fabricated nanostructures was studied by X-ray diffraction, transmission electron microscopy, electrical measurements in dark or under illumination and response time investigations. Finally, we demonstrate the feasibility of the procedure by the means of an Al/n-Si/Ge:SiO2/ITO photodetector test structure. The structures, investigated at room temperature, show superior performance, high photoresponse gain, high responsivity (about 7 AW(-1)), fast response time (0.5 mu s at 4 kHz) and great optoelectronic conversion efficiency of 900% in a wide operation bandwidth, from 450 to 1300 nm. The obtained photoresponse gain and the spectral width are attributed mainly to the high Ge content packed into a SiO2 matrix showing the direct connection between synthesis and optical properties of the tested nanostructures. Our deposition approach put in evidence the great potential of Ge nanoparticles embedded in a SiO2 matrix for hybrid integration, as they may be employed in structures and devices individually or with other materials, hence the possibility of fabricating various heterojunctions on Si, glass or flexible substrates for future development of Si-based integrated optoelectronics.

N-type P-doped silicon single crystals with resistivity higher than 8000 Omega cm were irradiated with I-127(6+) ions of 28 MeV kinetic energy. The penetration of the ions through the target and the processes of energy loss were simulated using the CTRIM Monte Carlo code, and point defect production was calculated in the frame of our diffusion-reaction model. Trapping phenomena were investigated using the method of thermally stimulated currents without applied bias. The modeling of the current-temperature curves takes into consideration both point defects and stress-type trapping centers, produced by the ions stopped into the crystal.

The effects of 5 x 10(11) cm(-2 6+)I(127) ions of 28 MeV kinetic energy on high resistivity (100) Si were studied. The profile of primary defects was simulated. The defects produced by irradiation which act as traps were investigated. Thermally stimulated current measurements without externally applied bias were used, and for this the traps were charged by illuminating samples with 1000, 800, and 400 nm wavelengths. The discharge currents were recorded and modeled, and therefore the parameters of the traps were determined. The presence of I ions, heavier than Si, stopped into the target was modeled as a temperature independent electric field. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.4772015]

Transmission electron microscopy and X-ray photoelectron spectroscopy analyses are performed to investigate Ge nanoparticles embedded in an amorphous SiO2 matrix. GeSiO thin films are prepared by two methods, sol-gel and radio frequency magnetron sputtering. After the deposition, the sol-gel films are annealed in either N-2 (at 1 atm and 800 A degrees C) or H-2 (at 2 atm and 500 A degrees C), and the sputtered films in H-2 (at 2 atm and 500 A degrees C), to allow Ge segregation. Amorphous Ge-rich nanoparticles (3-7 nm size) are observed in sol-gel films. Crystalline Ge nanoparticles in the high pressure tetragonal phase (10-50 nm size) are identified in the sputtered films. The size of the nanoparticles increases with Ge concentration in the volume of the film. At the film surface, the Ge concentration is much larger that in the volume for both sol-gel and sputtered films. At the same time, at the film surface, only oxidized Ge is observed.

The long time degradation produced by particles and ions in crystalline materials used for devices to work in space, or for detectors in HEP and astroparticles, is characterised by the non-ionising energy loss, which is calculated in the frame of an analytical model. The transient phenomena as short time degradation are characterised by the time and space dependencies of the lattice and electron temperatures near the projectile trajectory. These processes are considered in the frame of a thermal spike model, which takes into account both ionization and nuclear energy loss processes.

The thermal spike model which takes into account both ionization and nuclear energy loss processes of the projectile as distinct electronic and atomic heat sources is used to describe transient processes induced by ions in silicon. The time and space dependencies of the lattice and electron temperatures near the projectile trajectory are calculated. The contribution of the rise in temperature on defect formation and annealing is considered.

Leakage currents determine bumps in the capacitance-voltage characteristics of metal-oxide-semiconductor-type heterostructures with capacitance values larger than the insulator capacitance. A nearly parallel shift with frequency is also observed. These aspects are connected with the presence of a high density of interface states. We illustrate these effects for the case of nano-PbS/SiO2/Si heterostructures. The phenomena were simulated and we propose a method to quickly estimate the interface state density level of a heterostructure when leakage channels are present. (C) 2008 American Institute of Physics.

Dark noise plays an important role in electronic devices, especially in detectors. Performance of infrared detectors is reflected by parameters such as detectivity and specific detectivity, strongly related to the noise spectral density. This work summarizes the results on characterization of high-performance PbS photo detectors, using a certification pending method developed by the laboratory, in agreement to the standard ISO/CEI 17025:2005. The method is validated for a resistor of known resistance, by comparing the Johnson thermal noise using two different methods: first, the fast Fourier transform measured with a Stanford Research Systems SR785 Spectrum Analyzer and second using a Stanford SR830 lock-in amplifier which measures the rms noise for a certain frequency. We studied the influence of physical dimensions on the performance of thin film polycrystalline PbS photoresistors in the planar geometry. Measurements were performed to compare the dark noise of PbS photoresistors with that in high quality metal thin film resistors. The laboratory setup used for the measurements is appropriate to accurately determine typical parameters of infrared detectors such as spectral responsivity, blackbody responsivity, specific detectivity, and noise spectral density.

This paper demonstrates an analytical expression for the quasistatic capacitance of a quantum dot layer embedded in a junction, where the reverse bias is used to discharge the initially occupied energy levels. This analysis can be used to determine the position and the Gaussian homogeneous broadening of the energy levels in the conduction band, and is applied for an InGaAs/GaAs quantum dot structure grown by metal organic chemical vapor deposition. It is shown that the Gaussian broadening of the conduction band levels is significantly larger than the broadening of the interband photoluminescence (PL) transitions involving both conduction and hole states. The analysis also reveals a contribution from the wetting layer both in PL and modeled C-V profiles which is much stronger than in typical molecular beam epitaxy grown dots. The presence of a built-in local field oriented from the apex of the dot toward its base, contrary to the direction expected for a strained dot with uniform composition (negative dipole), is also derived from fitting of the C- V experimental data. (c) 2008 American Institute of Physics.

Self assembled InGaAs/GaAs quantum dots (QD) have a great potential for high performance optoelectronic devices such as low threshold laser diodes, infrared detectors, modulators, memories. In order to characterize the behavior of the QD system, we use two p(+)-n structures grown epitaxially on GaAs under similar conditions. The first structure acts as reference while in the second structure a single QD self-assembled layer is introduced in the middle of the n-GaAs matrix layer. The structure is designed such that for OV applied bias the QD layer lies outside the depleted region. When the reverse bias is increased, the charge from the QD system is removed and the depletion layer moves further into the GaAs matrix material. The electronic structure of the QD is investigated using two methods: photoluminescence, in order to characterize the transition energies between electron and hole levels in the QD system and capacitance spectroscopy in order to study the electron levels in the conduction band only. In addition, admittance spectroscopy spectra are measured in order to characterize the carrier transport mechanism. There is no evident step in the capacitance versus frequency behavior at room temperature in the range 1 Hz-1 MHz, indicating a large carrier cross section caption and/or a low activation energy for the carrier transport between the dot system and the wetting layer and GaAs barriers. The plateau in the C-V behavior, due to charging or discharging of the QD system is modeled using the solution of a Poisson equation and the resulting energy of the electron states within the conduction band and QD size distribution are correlated with results from photoluminescence studies, which involve transitions between energy levels both from the conduction and valence bands.

The nano-crystalline PbS/n-Si heterostructure was studied using photocurrent spectra, I-V and C-V characteristics and admittance spectroscopy. The frequency dependent junction capacitance and conductance measurements show the presence of two contributions: first, a defect related mechanism which we attribute to a deep trap level with a large cross-section in nano-crystals with smaller sizes around 5 nm at the interface with Si and a second mechanism with an activation energy of about 250 meV, attributed to carrier transport in relatively large PbS grains of about 15 nm in size. (c) 2007 Elsevier B.V. All fights reserved.

The influence of the gate voltage on photoconductivity in P-Si/SiO2/(nano)crystalline PbS, Metal-Oxide Semiconductor Field-Effect Transistor (MOSFET)-like structures is investigated. The effect on the photo-signal in the wavelength range 500-1180 nm is opposite compared to the effect in the wavelength range 1600-2500 nm: a negative gate voltage increases the signal in the short wavelength range and decreases it for the long wavelength range. The opposite is valid for a positive gate bias. An on-off ratio better than 85 times is obtained for the spectral range 500-1180 nm, corresponding to the absorption in p-Si and better than 3.5 times for the spectral range 1600-2500 nm corresponding to the absorption in the (nano)crystal line PbS region, respectively. (c) 2007 Elsevier B.V. All rights reserved.

The PbS micro-crystalline and nano-crystalline films were obtained using the Chemical Bath Deposition method. We investigated comparatively the structural, electrical and photoconductive properties of these films deposited on glass. PbS/SiO2/Si heterostructures made with nanocrystalline PbS layers present interesting peculiarities. Their C-V curves show hysterezis. In a field effect arrangement it is possible to control the photoconductive short and long wavelength ratio response. The heterostructure properties were explained by taking into account the interface charged traps.

The PbS/SiO2/Si structures show a clockwise hysteresis of capacitance-voltage (C-V) characteristics. The loop width increases with temperature and sweep time. The conductance-voltage (G-V) characteristics also present a hysteresis effect with two bumps. Both characteristics show a strong shift with frequency. We show that these effects are determined by the positive mobile ions injected in the oxide region during the chemical bath deposition of PbS and by the high concentration Of Si/SiO2 interface states. The corresponding C-V and G-V characteristics are simulated and the main peculiarities of the experimental results are well reproduced by the modeled curves.

A comparative study of photodetector performance for nano- and micro-crystalline PbS thin layers is presented Both types of PbS films were obtained using the Chemical Bath Deposition method. To prepare nano-crystalline thin films we used a short reaction time with no doping Bi added At low levels of irradiance (0.1 mW/cm(2)) and room temperature (RT), the macro-crystalline PbS outperforms its nano-crystalline counterpart, by a factor of 6 for the value of Delta R/R-dark. However the nano-crystalline photodetectors show significantly lower optical quenching for large values of irradiance (approximate to 500 mW/cm(2)) at RT and better Delta R/R-dark performance at lower temperature, with an optimum temperature Of 150 K. The low frequency noise behavior is a superposition of 1/f flicker noise at low frequency and generation-recombination and thermal noise at higher frequency. The proportionaliiy factor between the 1/f noise and the DC dark current for the series resistor is 1.5 times larger for the nano-crystalline photodetector at room temperature.

A low-confinement asymmetric GaAs-AlGaAs double-quantum-well molecular-beam-epitaxy grown laser diode structure with optical trap layer is characterized. The value of the internal absorption coefficient is as low as 1.4 cm(-1), while keeping the series resistance at values comparable with symmetrical quantum-well gradient index structures in the same material system. Uncoated devices show COD values of 35 mW/mu m. If coated, this should scale to about 90 mW/mu m, The threshold current density is about 1000 A/cm(2) for 2-mm-long devices and a considerable part of it is probably due to recombination in the optical trap layer. Fundamental mode operation is limited to 120-180 mW for 6.5-mu m-wide ridge waveguide uncoated devices and to 200-300 mW for 13.5-mu m-wide ones, because of thermal waveguiding effects, These values are measured under pulsed conditions, 10 mu s/l ms.

This paper presents the optical field behaviour of relatively large stripes, long laser diodes. The devices were designed to operate in the fundamental lateral mode. The stripe width, of order of 16 mu m, involves a very low refractive index step at the ridge edges and the operation of the diode in weak index guided regime. This index profile and subsequently, the optical field distribution is very easily disturbed by carrier injection or by temperature The paper aims to characterise the influence of direct current intensity on lateral far field.

This paper reports experimental results on single quantum-well separate confinement heterostructures (SQW SCH) with low-confinement factor, designed for very high-power operation, The maximum power output for AR/HR coated 3-mm-long devices, measured in very short pulsed conditions (100 ns/1 kHz), from 10-mu m-wide stripes was as high as 6.4 W before catastrophical optical degradation, If scaled to continuous-wave (CW) conditions, this value would be 800-1100 mW, which would mean a factor of 2-2.7 times more than reported for the best devices with normal design for threshold minimization, The absorption coefficient for the symmetrical structure is as low as 1.1 cm(-1), in spite of the low trapping efficiency of carriers in the quantum well (QW), The maximum differential efficiency is 40% (both faces, uncoated devices) for symmetrical structure and 33% for the asymmetrical one (all measurements in pulsed conditions), Threshold current densities were 800 A/cm(2) for 5-mm-long devices in the symmetrical case and 2200 A/cm(2) in the asymmetrical one, The effects of inefficient carrier trapping in the QW on the threshold current densities and differential efficiency are discussed.