1. Multi-cathode radio-frequency (RF), direct current (DC) and pulsed direct current (p-DC) Magnetron Sputtering (MS) systems
2. SURFACE systems+technology GmbH & Co. KG
3. SURFACE systems+technology GmbH & Co. KG Pulsed Laser Deposition (PLD) workstation
4. Scanning Electron Microscope S-3400 N (Hitachi) with Quantum Elphy Nanolithography System and Laser Interferometer Ultra Precision Positioning Strage (Raith)
5. Photolithography Mask Aligner EVG 620 NT with Nanoimprint Litography (EV Group)
6. Electron lithography equipment – High resolution installation
7. CVD equipment for deposition of polymers
8. CVD equipment for deposition of carbon-based materials
Back to top
Copyright © 2025 National Institute of Materials Physics. All Rights Reserved