1. Multi-cathode radio-frequency (RF), direct current (DC) and pulsed direct current (p-DC) Magnetron Sputtering (MS) systems
2. SURFACE systems+technology GmbH & Co. KG
3. SURFACE systems+technology GmbH & Co. KG Pulsed Laser Deposition (PLD) workstation
4. Magnetron sputtering equipment
5. Scanning Electron Microscope Lyra 3XMU with Focused Ion Beam SEM-FIB sample preparation system (Tescan) with EBSD and EDS analysis systems (Bruker)
6. Scanning Electron Microscope S-3400 N (Hitachi) with Quantum Elphy Nanolithography System and Laser Interferometer Ultra Precision Positioning Strage (Raith)
7. Photolithography Mask Aligner EVG 620 NT with Nanoimprint Litography (EV Group)
8. Electron lithography equipment – High resolution installation
9. CVD equipment for deposition of polymers
10. CVD equipment for deposition of carbon-based materials
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