Facilități

1
Multi-cathode radio-frequency (RF), direct current (DC) and pulsed direct current (p-DC) Magnetron Sputtering (MS) systems
2
SURFACE systems+technology GmbH & Co. KG
3
SURFACE systems+technology GmbH & Co. KG Pulsed Laser Deposition (PLD) workstation
4
Scanning Electron Microscope S-3400 N (Hitachi) with Quantum Elphy Nanolithography System and Laser Interferometer Ultra Precision Positioning Strage (Raith)
5
Photolithography Mask Aligner EVG 620 NT with Nanoimprint Litography (EV Group)
6
Electron lithography equipment – High resolution installation
7
CVD equipment for deposition of polymers
8
CVD equipment for deposition of carbon-based materials