Gold nanoparticles (similar to 10 nm) were deposited on titanium dioxide nanoparticles (similar to 21 nm) and the material obtained was characterized using IR, UV-Vis, N-2 adsorption-desorption isotherm, DLS, EDS (EDX), TEM, XPS, and XRD techniques. It was found that the methylene blue dye is degraded in the presence of this material when using hydrogen peroxide as the oxidant. Tests were performed at 2, 4, 6, and 24 h, with hydrogen peroxide contents varying from 1 to 5 mg/mL. Longer exposure time and a higher content of oxidant led to the degradation of methylene blue dye at up to 90%. The material can be reused several times with no loss of activity.

UV-nanoimprint lithography is currently seen like an alternative to the classical lithographic techniques (electron beam or optical lithography) for large scale patterning in industrial applications. The present study is oriented on the fabrication of silicon nano-cones (pyramids) by using the UV-nanoimprint technique with polymeric stamps and deep reactive ion etching using the UV-cured resist as etching mask at cryogenic temperatures. The results show that the resist can act successfully as etching mask for the cryogenic silicon etching process.