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Pure, smooth and dense W films obtained by an anodic arc plasma
Show abstract
Tungsten films have a number of important applications. The techniques to produce quality films are very few and most of them use gases as precursors or as buffer. The Thermoionic Vacuum Arc (TVA) plasma is an original technique capable of producing pure, dense and very smooth Tungsten films of thicknesses from nanometers to tens of micrometers with no buffer gas or gas precursors. This paper presents characterisation of Tungsten films obtained by TVA in terms of composition and topography using XRF, XPS and AFM. The films studied are pure and contain a very thin surface oxide of WO(3). The influence of water vapors inherently present on the chamber walls to the film surface composition is also presented.