Dr. Ioana PINTILIE

Herein we present a comparative study among different spray-coated nanometric mesoporous electron transporting layers (ETLs) in perovskite solar cells (PSC), namely m-TiO2, 2 , m-SnO2 2 and m-SnO2 2 quantum dots (mSnO2QDs). 2 QDs). The solutions used for deposition were prepared from commercial pastes and colloidal suspensions for m-TiO2 2 and m-SnO2. 2 . For m-SnO2QDs 2 QDs in-house QDs solutions were prepared. The formamidiniummethylamonium-potassium (FAMA@10 K) has been used as light absorber material in the fabricated PSCs. The structural, compositional and morphological studies, correlated with the photovoltaic performance of PSCs, indicate that the m-SnO2 2 QDs layer is the best candidate among the three investigated mesoporous ETLs. Compared with the suspensions used for the other two ETLs, the in-house prepared SnO2 2 QDs solution presents smaller agglomerates of nanoparticles and results in the formation of a thinner, more uniform and compact mesoporous ETL. The FAMA@10 K perovskite deposited on m-SnO2 2 QDs ETL presents a lower roughness, better uniformity and a higher amount of PbI2. 2 . Our work unveils that the SnO2 2 QDs solution can be easily produced in laboratory and when is deposited as mesoporous scaffold in a PSC with FAMA@10 K perovskite, the power conversion efficiency increases up to 14.90 %, being with up to 27 % larger than in the PSCs with m-TiO2 2 and mSnO2 2 ETLs prepared from commercial solutions. By modeling the J-V dynamic hysteresis with more than 90 % match between the calculated and experimental J-V data, for all three types of mesoporous ETLs, the relevant parameters that explain the hysteresis magnitude and account for ionic-induced recombination processes in PSCs were determined.

Despite the promise of high-k dielectrics, inherent limitations persist in transistor scaling and enhancing energy efficiency, including a fundamental threshold of 60 mV/dec for increasing drain current by an order of magnitude. Proposed solutions involve negative capacitance at the gate oxide to overcome this barrier using ferroelectric structures. Efforts to understand and regulate the switching dynamics and intricate electrostatic configurations of ferroelectric structures towards achieving negative capacitance regimes have intensified. While standalone ferroelectric capacitors cannot stabilize negative capacitance without external fields, multilayered thin films offer a promising solution. Typically, ferroelectric layers are paired with dielectrics/insulator, demonstrating steady-state negative capacitance, often at nanoscale or specific temperature domains. This study aims to stabilize negative capacitance in ferroelectric structures by inducing internal electric fields, aligning the system near coercivity, particularly in bilayer structures formed by two ferroelectric layers with slight differences in polarization values, such as p-n heterojunctions using Pb (Zr,Ti)O3 PZT) with different doping as Fe, Nb, Bi. Most of these structures exhibit evident amplification of capacitance compared to the equivalent series-connected capacitance, across a large temperature domain. The complex capacitance-frequency characteristic of these structures indicates a complex equivalent circuit. Analysis of these complex circuits compared with simple component layers concludes that at least one of the FE layers in these bilayer structures is in a negative capacitance (NC) state.

Interest in self-cleaning coatings is rising due to their potential to enhance comfort and quality of life in polluted urban environments, driving the search for materials with optimal physical properties. Convergent with this goal, this study investigates the wetting properties and photo-catalytic efficiency of reticulated TiO2 layers. It shows that these properties are significantly influenced by the topographical characteristics of the TiO2 surface, which can be precisely controlled through variations in pulverization pressure and low-temperature post-annealing treatments. Post-deposition annealing of the TiO2 layers achieves 100 % self-cleaning efficiency for both thick and thin films, with optical transmission ranging from approximately 60 %-80 % in the visible spectrum. Additionally, the TiO2 layers exhibited promising capabilities for eliminating pathogenic microorganisms and disinfecting surfaces. The underlying causal factors of these remarkable and technologically promising surface features are explored and discussed.

In this work, the effects of 60Co y -ray irradiation on high resistivity p -type diodes have been investigated. The diodes were exposed to dose values of 0.1, 0.2, 1, and 2 MGy. Both macroscopic (I-V, C-V) and microscopic investigations, by means of Thermally Stimulated Current (TSC) and Deep Level Transient Spectroscopy (DLTS) techniques, were conducted to characterize the radiation -induced changes. The investigated diodes were manufactured on high resistivity p -type Float Zone (FZ) silicon and were further classified into two types based on the isolation technique between the pad and guard ring: p -stop and p -spray. After irradiation, the macroscopic results of current-voltage and capacitance-voltage measurements were obtained and compared with existing literature data. Additionally, the microscopic measurements focused on the development of the concentration of different radiation -induced defects, including the Boron interstitial -Oxygen interstitial (BiOi) complex, the Carbon interstitial -Oxygen interstitial (CiOi) defect, the H40K, and the so-called I*P. To investigate the thermal stability of induced defects in the bulk, isochronal annealing studies were performed in the temperature range of 100 degrees C to 300 degrees C. These annealing processes were carried out on diodes irradiated with doses of 1 and 2 MGy. Furthermore, in order to investigate the unexpected results observed in the C-V measurements after irradiation with high dose values, the surface conductance between the pad and guard ring was measured as a function of both dose and annealing temperature.

The present study aims to describe the role of the grain size on the properties of submicron- and nano-structured Ba0.8Sr0.2TiO3 (BST) ceramics. Dense (1 - 2% porosity) ceramics with average grain sizes in the range of (77 234) nm were consolidated under different spark plasma sintering conditions starting from nanopowders with a mean particle size of 70 nm, synthesized via the acetate variant of the sol-gel method. The structural analysis based on XRD data revealed a mixture of cubic and tetragonal modifications at room temperature for the precursor powders and for all the investigated ceramics. The structural heterogeneity of the individual ceramic grains with coexistence of cubic and tetragonal polymorphs was confirmed by HR-TEM investigations. Accordingly, a "brick-wall" model with cubic grain boundary regions and tetragonal grain cores is proposed. By increasing the grain size, from 77 to 234 nm, a decrease of the phase transitions diffuseness accompanied by an increase of the permittivity maxima (from 650 to 4500) and dielectric losses (from 5 to 7.5%, at 100 Hz), was detected by broadband dielectric spectroscopy. No variation of the Curie temperature in the investigated Ba0.8Sr0.2TiO3 ceramics was detected, unlike typically reported for BaTiO3 ceramics with similar grain sizes. The Curie-Weiss temperature and the Curie constant decrease when grain size is diminished, indicating an overall reduction of the ferroelectric active volume, as a scaling effect. The ferroelectric switching was demonstrated for all the selected fine-grained BST ceramics, either at nanoscale or macroscopically, with an increased ferroelectric character for the coarser submicron-structured ceramics, with respect to the nanocrystalline one. The observed properties of the fine-grained Ba0.8Sr0.2TiO3 ceramics are explained in the frame of multiphase coexistence and ferroelectricity "dilution" due to the increasing role of non-ferroelectric grain boundaries when reducing grain size and complete the knowledge on the scale-dependent properties of dense fine-grained BaTiO3-based ceramics.

This paper evidences research results on a new technology for deposition of TiO2 nanostructured layers on glass. Air pollution, industrialization and everyday life activities are factors that point towards the need for efficient and ergonomic cleaning process of the impressive glazing surfaces that surround people in modern offices, leisure places and not the least, in houses. The design of equipment, the innovative technique based on pneumatically spraying a suspension of TiO2 nanocrystals, the process parameters and preliminary test results for the obtained layers stand as main topics for the article. Integration of the system into industry 4.0 virtual intelligent platform is also presented. Further research development in order to validate the nanostructured TiO2 coating on glazed surfaces is aimed.

Replacing lead atoms in halide perovskite materials is of significant importance for the development of environmentally friendly perovskite solar cells. In this paper, we investigated the effect of doping the MAPbI(2.6)Cl(0.4) hybrid perovskite (MA-methyl ammonium) with non-toxic elements, such as alkaline earth metal ions (Mg2+) and transition metal ions (Zn2+). The structural, morphological, and optical properties of the prepared samples were analyzed using X-ray diffraction (XRD), scanning electron microscopy (SEM), atomic force microscopy (AFM), and UV-Vis. spectroscopy. Finally, the doped films were used as photoactive layers in solar devices in order to evaluate their photovoltaic performance. Zn proved to be more appropriate to replace partially Pb and films with higher quality were obtained. As a result, the MAPb1(-x)Zn(x)I(2.6)Cl(0.4) based solar cells have demonstrated a slight improvement of the photovoltaic performances, resulting in a uniform and narrower PCEs (power conversion efficiency) range, compared to pristine MAPbI(2.6)Cl(0.4) based devices.

Electronic and stability properties of quasi-2D alkylammonium perovskites are investigated using density functional theory (DFT) calculations and validated experimentally on selected classes of compounds. Our analysis is focused on perovskite structures of formula (A)(2)(A ')(n-1)PbnX3n+1, with large cations A = butyl-, pentyl-, hexylammonium (BA, PA, HXA), small cations A ' = methylammonium, formamidinium, ethylammonium, guanidinium (MA, FA, EA, GA) and halogens X = I, Br, Cl. The role of the halogen ions is outlined for the band structure, stability and defect formation energies. Two opposing trends are found for the absorption efficiency versus stability, the latter being assessed with respect to possible degradation mechanisms. Experimental validation is performed on quasi-2D perovskites based on pentylammonium cations, namely: (PA)(2)PbX4 and (PA)(2)(MA)Pb2X7, synthesized by antisolvent-assisted vapor crystallization. Structural and optical analysis are inline with the DFT based calculations. In addition, the thermogravimetric analysis shows an enhanced stability of bromide and chloride based compounds, in agreement with the theoretical predictions.

This study focuses on the properties of the BiOi (interstitial Boron-interstitial Oxygen) and CiOi (interstitial Carbon-interstitial Oxygen) defect complexes by 5.5MeV electrons in low resistivity silicon. Two different types of diodes manufactured on p-type epitaxial and Czochralski silicon with a resistivity of about 10 Omega center dot cm were irradiated with fluence values between 1x10(15) cm(-2) and 6x10(15) cm(-2). Such diodes cannot be fully depleted and thus the accurate evaluation of defect concentrations and properties (activation energy, capture cross-section, concentration) from Thermally Stimulated Currents (TSC) experiments alone is not possible. In this study we demonstrate that by performing Thermally Stimulated Capacitance (TS-Cap) experiments in similar conditions to TSC measurements and developing theoretical models for simulating both types of BiOi signals generated in TSC and TS-Cap measurements, accurate evaluations can be performed. The changes of the position-dependent electric field, the effective space charge density N-eff profile as well as the occupation of the BiOi defect during the electric field dependent electron emission, are simulated as a function of temperature. The macroscopic properties (leakage current and..eff) extracted from current-voltage and capacitance-voltage measurements at 20 degrees C are also presented and discussed.

The acceptor removal process is the most detrimental effect encountered in irradiated boron-doped silicon. This process is caused by a radiation-induced boron-containing donor (BCD) defect with bistable properties that are reflected in the electrical measurements performed in usual ambient laboratory conditions. In this work, the electronic properties of the BCD defect in its two different configurations (A and B) and the kinetics behind transformations are determined from the variations in the capacitance-voltage characteristics in the 243-308 K temperature range. The changes in the depletion voltage are consistent with the variations in the BCD defect concentration in the A configuration, as measured with the thermally stimulated current technique. The A & RARR;B transformation takes place in non-equilibrium conditions when free carriers in excess are injected into the device. B & RARR;A reverse transformation occurs when the non-equilibrium free carriers are removed. Energy barriers of 0.36 eV and 0.94 eV are determined for the A & RARR;B and B & RARR;A configurational transformations, respectively. The determined transformation rates indicate that the defect conversions are accompanied by electron capture for the A & RARR;B conversion and by electron emission for the B & RARR;A transformation. A configuration coordinate diagram of the BCD defect transformations is proposed.

The technology of perovskite solar cells (PSC) is getting close to breaching the consumer market. Yet, one of the current challenges is to reduce the toxicity during their fabrication by reducing the use of the toxic solvents involved in the perovskite fabrication process. A good solubilization of lead halides used in hybrid perovskite preparation is required, and it is only possible with polar solvents. A mixture of dimethylformamide (DMF) and dimethyl sulfoxide (DMSO) is the most popular solvent combination for a perovskite precursor solution. DMF is necessary to ensure a good dissolution of lead iodide, but it is also the most toxic solvent. In this paper, we study the replacement of the dimethylformamide with presumably less toxic alternatives, such as N-methyl-2-Pyrrolidone (NMP) and ethyl acetate (EA), for the preparation of the K(0.1)FA(0.7)MA(0.2)PbI(2.8)Cl(0.2) (KFAMA) hybrid perovskite. The perovskite thin films were investigated by various characterization techniques: X-ray diffraction, atomic force microscopy, scanning electron microscopy, and UV-vis spectroscopy, while the photovoltaic parameters were determined by measuring the IV curves of the corresponding solar cells. The present study shows that by keeping the same deposition parameters as when only DMF solvent is used, the partial solvent substitution with NMP and EA gives promising results for reducing the toxicity of the fabrication process of KFAMA-based PSCs. Thus, with no specific optimization of the deposition process, and for the maximum possible partial substitution of DMF with NMP and EA solvents, the loss in the power conversion efficiency (PCE) value is only 35% and 18%, respectively, associated with the more structural defects promoted by NMP and EA.

The p-n junctions are the building blocks of nowadays electronic devices. The n- or p-type conductivity is obtained in classic semiconductors, like Si, by doping with atoms acting as donors or acceptors, respectively. Doping was used in ferroelectrics to influence the transition temperature, magnitude of some physical properties, but not necessarily conduction type. Therefore, comprehensive studies to obtain true ferroelectric p-n junctions by controlled doping are missing. Recently, it has been shown that Pb(Zr0.2Ti0.8)O-3 films doped with & AP;1% atomic Nb (n-type doping) or Fe (p-type doping) have different orientations of polarization in the as-grown state. Knowing that polarization orientation depends on doping type, the next step is to build ferroelectric p-n homojunctions and to study their properties in relation to ferroelectric polarization. p-n and n-p structures were grown for this purpose by successive deposition of Nb-doped and Fe-doped Pb(Zr,Ti)O-3 layers with different thicknesses. We find that these p-n homojunctions are ferroelectric, but the magnitude of the polarization and coercive field, as well as the dominant polarization orientation in the as-grown state, depend on the conduction type of the first grown layer. The I-V characteristics are quasi-linear, although the interfaces with the electrodes behaves as Schottky contacts. The resistance extracted from the I-V characteristics displays an exponential dependence on temperature, with an activation energy in the range of 0.14-0.17 eV. These results are explained assuming that the total current in the junction is the total of electron and hole injections at the electrode interfaces. It is shown that for relatively low doping concentrations, the current density contains a dominant term with a linear voltage dependence and an exponential temperature dependence, as observed experimentally, and a secondary (correction) term that is dependent on the free carrier density and can induce non-linear voltage dependence when this density is significant.

High-energy physics detectors with internal charge multiplication, like Low Gain Avalanche Detectors (LGADs), that will be used for fast timing in the High Luminosity LHC experiments, have to exhibit a significant radiation tolerance. In this context, the impact of radiation on the highly boron-doped gain layer is of particular interest, since due to the so-called Acceptor Removal Effect (ARE) a radiation-induced deactivation of active boron dopants takes place, that is causing a progressive loss in the gain with increasing irradiation level. In this paper we present defect-spectroscopy measurements (Deep-Level Transient Spectroscopy and Thermally Stimulated Current technique) on neutron, proton and electron irradiated p-type silicon pad diodes of different resistivity as well as LGADs neutron irradiated at fluences up to 1 x 1015 neq/cm2. We show that compared to silicon pad diodes the determination of LGAD defect introduction rates is less straightforward as they are strongly influenced by the impact of the gain layer. The measured gain layer capacitance has a strong frequency and temperature dependence which makes DLTS measurements challenging to perform with results difficult to interpret. With the TSC technique the defects formed in the LGADs are nicely observed and can be compared to the defects formed in the silicon pad diodes. However, the exact assignment of defects to the gain layer or bulk region remains challenging and the charge amplification effect of the LGADs impacts the exact determination of defect concentrations. We also demonstrate that, depending on the TSC measurement conditions, defect induced internal electric fields are built up in the irradiated LGADs which impact the signal current.

Two new families of zinc/cobalt/aluminum-based pigments, with a unique composition, were obtained through the polyol method. The hydrolysis process of a mixture of Co(CH3COO)(2), Zn(acac)(2) and Al(acac)(3) (acac(-) = acetylacetonate ion) in 1,4-butanediol afforded dark blue gels (wPZn(x)Co(1-x)Al), in the presence of a supplementary amount of water, and light green powders (PZnxCo1-xAl), respectively, for the water-free procedure (x = 0, 0.2, 0.4). The calcination of the precursors yielded dark green (wZn(x)Co(1-x)Al) and blue (ZnxCo1-xAl) products. XRD measurements and Rietveld refinement indicate the co-existence of three spinel phases, in different proportions: ZnxCo1-xAl2O4, Co3O4 and the defect spinel, ?-Al2.67O4. The Raman scattering and XPS spectra are in agreement with the compositions of the samples. The morphology of wZn(x)Co(1-x)Al consists of large and irregular spherical particle aggregates (ca. 5-100 mm). Smaller agglomerates (ca. 1-5 mm) with a unique silkworm cocoon-like hierarchical morphology composed of cobalt aluminate cores covered with flake-like alumina shells are formed for ZnxCo1-xAl. TEM and HR-TEM analyses revealed the formation of crystalline, polyhedral particles of 7-43 nm sizes for wZn(x)Co(1-x)Al, while for ZnxCo1-xAl, a duplex-type morphology, with small (7-13 nm) and larger (30-40 nm) particles, was found. BET assessment showed that both series of oxides are mesoporous materials, with different pore structures, with the water-free samples exhibiting the largest surface areas due, most likely, to the high percent of aluminum oxide. A chemical mechanism is proposed to highlight the role of the water amount and the nature of the starting compounds in the hydrolysis reaction products and, further, in the morpho-structural features and composition of the resulting spinel oxides. The CIE L*a*b* and C* colorimetric parameters indicate that the pigments are bright, with a moderate degree of luminosity, presenting an outstanding high blueness.

Dense fine-grained Ba0.6Sr0.4TiO3 ceramics with submicronic grains sizes (GS) have been prepared using nanopowders synthesized via sol-gel route and consolidated by Spark Plasma Sintering (SPS). By changing SPS parameters, the GS was reduced from 214 nm to 74 nm. Diffuse ferroelectric-paraelectric phase transitions and low values of dielectric permittivity (<1000) at the Curie temperature (T-C similar to 280 K) were revealed by Impedance Spectroscopy in all sintered ceramics. The GS reduction from submicron to nanoscale range reflects in a gradually diminishment of dielectric constant, tunability, polarisation and storage energy properties. Raman spectroscopy investigations pointed out the presence of polar nanoclusters above the T-C. The short-range polar order is affected by the GS decrease, but becomes more thermally stable. The observed properties of Ba0.6Sr0.4TiO3 nanostructured ceramics are interpreted by considering the interplay between the GS reduction, the role of low-permittivity grain boundaries and the diffuse character of the ferroelectric-to-paraelectric transformation.

The diffusion of iodide defects has been considered the most important degradation mechanism of methylammonium lead iodide (MAPI) in solar cells. The present study demonstrates the importance of the pressure inside this material on the dynamics of iodide defects, using molecular dynamics simulations. It is known that the diffusion coefficient of an iodide vacancy is an order of magnitude higher than that of interstitial iodide. We show that this difference systematically increases with increased tensile strain and that both diffusion coefficients tend to zero when a compressive strain is applied. This result suggests that compression of the MAPI can be a good solution to reduce its degradation rate. Besides, the statistical aspect of deriving the diffusion coefficient from the mean squared displacement (MSD) is discussed in terms of the initial conditions (positions and velocities) of the atoms and the simulation time, considering different seeds of the pseudorandom number generator used in the simulations performed with the LAMMPS software.

Complex ferroelectric structures with dielectric interlayers may become possible alternatives for neuromorphic computing and low-power field-effect transistors since they exhibit multiple polarization states and negative capacitance. However, the effects on the switching characteristics due to the electric properties of the nonferroelectric circuit element have not been clearly evaluated so far. A high-resistance or low-capacitance element is usually associated with an increased depolarization field and eventually with suppression of polarization but without further consideration of the electrostatic differences. Therefore, we show that switching behavior is dramatically changed if the non-FE element is a resistive component or a capacitive one. This is reflected by either an increased apparent coercive field or imprint, respectively. A negative capacitance regime was observed at different moments but strongly depends on the nature of the nonferroelectric element. The voltage on the ferroelectric component remains constant during switching, which is a fingerprint of the system passing through non-equilibrium states. Therefore, we propose an algorithm to recover the S-shape of polarization dependence on the ferroelectric internal voltage during the slowed transition between the two stable states of polarization.

Flexible composites containing BaTiO3 nanoparticles into Gelatin bio-polymer matrix were designed and investigated. Following the idea that the electric field concentration in corners/edges at the interfaces between dissimilar materials give rise to enhanced effective permittivity in composites, cuboid-like BaTiO3 nanoparticles have been employed as nanofillers into Gelatin matrix by using an inexpensive solution-based processing method. As predicted by finite element method simulations developed for cubic-like inclusions into a homogeneous polymer matrix, the experimental permittivity of xBT-(1-x)Gelatin composites increases when increasing the high-permittivity filler addition. For the composition x = 40 wt% (corresponding to 12 vol% BaTiO3 addition), permittivity reaches epsilon r -15.7 with respect to epsilon r -9.8 of pure Gelatine (measured at 105 Hz), while the average piezoelectric coefficient d33 as determined by piezoelectric force microscopy shows a remarkable increase up to 21 pm/V in composites with x = 40 wt%, in comparison to -7 pm/V in pure Gelatin. By using the experimentally determined material constants, the simulated piezoelectric voltage output vs. time has shown a similar increase (about a doubling of its amplitude) of the harvesting signal in the composite with x = 40 wt% BT, with respect to one of the polymer matrix, thus demonstrating the beneficial role of embedding BT nanoparticles into the biopolymer for increasing the mechanical harvesting response.

Organic-inorganic hybrid perovskite solar cells are within the emerging photovoltaic technologies. The combination of different halogen ions, in certain fill fractions, is one of the methods to improve the perovskite film properties. Herein, fabrication and characterization of perovskite cells in standard mesoscopic architecture using one-step deposition method has been done. The role of the halogen ions (Chlorine or Bromine) on crystal structure growth and photoelectric performance has been investigated. X-ray diffraction, scanning electron microscopy, atomic force microscopy and optical microscopy analysis were performed. The microstructure, composition and morphology of CH3NH3PbI1.8Br1.2 and CH3NH3PbI1.8Cl1.2 films are dissimilar, although identical fabrication method was used. Same holds for optical properties, band gap energies of 1.84 eV and 1.63 eV, respectively, being obtained. Integrated in solar cells, the maximum power conversion efficiency of the Br based devices is beyond 10%, while for those based on Cl, the efficiency drops around 5%.

Dynamic hysteresis effects have been long known to occur in the current density-voltage characteristics of perovskite solar cells, with the ionic migration being identified as the primary factor. The hysteretic effects impacted early studies by the uncertainty in the evaluation of the power conversion efficiency, while currently, potential links to degradation mechanisms are the focus. Therefore, understanding ion migration is a central goal, typically addressed by performing a combined large and small signal analysis. The reported large capacitive and inductive effects created controversies with respect to the underlying mechanisms, yielding essentially two classes of models, one based on the large accumulation capacitances and the other based on the ionic modulation of the collected current. We introduce here an equivalent circuit model and interpret these phenomena in terms of recombination current modulation, identifying the distinct contributions from ion current and ionic charge accumulations. These contributions to the recombination current are associated with capacitive and inductive effects, respectively, and we corroborate the numerical simulations with electrochemical impedance spectroscopy measurements. These show the role of the recombination currents of photogenerated carriers in producing both capacitive and inductive effects as the illumination is varied. Moreover, we provide a bridging point between the two classes of models and suggest a framework of investigation of defect states based on the observed inductive behavior, which would further aid the mitigation of the degradation effects.

Fe (acceptor) and Nb (donor) doped epitaxial Pb(Zr0.2Ti0.8)O-3 (PZT) films were grown on single crystal SrTiO3 substrates and their electric properties were compared to those of un-doped PZT layers deposited in similar conditions. All the films were grown from targets produced from high purity precursor oxides and the doping was in the limit of 1% atomic in both cases. The remnant polarization, the coercive field and the potential barriers at electrode interfaces are different, with lowest values for Fe doping and highest values for Nb doping, with un-doped PZT in between. The dielectric constant is larger in the doped films, while the effective density of charge carriers is of the same order of magnitude. An interesting result was obtained from piezoelectric force microscopy (PFM) investigations. It was found that the as-grown Nb-doped PZT has polarization orientated upward, while the Fe-doped PZT has polarization oriented mostly downward. This difference is explained by the change in the conduction type, thus in the sign of the carriers involved in the compensation of the depolarization field during the growth. In the Nb-doped film the majority carriers are electrons, which tend to accumulate to the growing surface, leaving positively charged ions at the interface with the bottom SrRuO3 electrode, thus favouring an upward orientation of polarization. For Fe-doped film the dominant carriers are holes, thus the sign of charges is opposite at the growing surface and the bottom electrode interface, favouring downward orientation of polarization. These findings open the way to obtain p-n ferroelectric homojunctions and suggest that PFM can be used to identify the type of conduction in PZT upon the dominant direction of polarization in the as-grown films.

A consistent quantitative description of radiation-induced degradation on p-type Silicon detectors is conducted within CERN RD50 collaboration. The present contribution summarizes the first obtained results for epitaxial 50 mu m thin pad diodes irradiated with protons, neutrons and gamma rays. Microscopic and Macroscopic damage-driven effects are analyzed.

The feasibility of mixed-cation mixed-halogen perovskites of formula A(x)A'1-xPbXyXz'X3-y-z '' is analyzed from the perspective of structural stability, opto-electronic properties and possible degradation mechanisms. Using density functional theory (DFT) calculations aided by machine-learning (ML) methods, the structurally stable compositions are further evaluated for the highest absorption and optimal stability. Here, the role of the halogen mixtures is demonstrated in tuning the contrasting trends of optical absorption and stability. Similarly, binary organic cation mixtures are found to significantly influence the degradation, while they have a lesser, but still visible effect on the opto-electronic properties. The combined framework of high-throughput calculations and ML techniques such as the linear regression methods, random forests and artificial neural networks offers the necessary grounds for an efficient exploration of multi-dimensional compositional spaces.

Polarization switching in ferroelectric films is exploited in many applications, such as non-volatile memories and negative capacitance field affect transistors. This can be inhomogeneous or homogeneous, depending on if ferroelectric domains are forming or not during the switching process. The relation between the polarization switching, the structural quality of the films and the negative capacitance was not studied in depth. Here, Pb(Zr0.2Ti0.8)O-3 (PZT) layers were deposited by pulse laser deposition (PLD) and sol-gel (SG) on single crystal SrTiO3 (STO) and Si substrates, respectively. The structural quality was analyzed by X-ray diffraction and transmission electron microscopy, while the electric properties were investigated by performing hysteresis, dynamic dielectric measurements, and piezo-electric force microscopy analysis. It was found that the PZT layers grown by PLD on SRO/STO substrates are epitaxial while the layers deposited by SG on Pt/Si are polycrystalline. The polarization value decreases as the structure changes from epitaxial to polycrystalline, as well as the magnitude of the leakage current and of the differential negative capacitance, while the switching changes from homogeneous to inhomogeneous. The results are explained by the compensation rate of the depolarization field during the switching process, which is much faster in epitaxial films than in polycrystalline ones.

Structural and electrical properties of epitaxial Pb(Zr0.2Ti0.8)O-3 films grown by pulsed laser deposition from targets with different purities are investigated in this study. One target was produced in-house by using high purity precursor oxides (at least 99.99%), and the other target was a commercial product (99.9% purity). It was found that the out-of-plane lattice constant is about 0.15% larger and the a domains amount is lower for the film grown from the commercial target. The polarization value is slightly lower, the dielectric constant is larger, and the height of the potential barrier at the electrode interfaces is larger for the film deposited from the pure target. The differences are attributed to the accidental impurities, with a larger amount in the commercial target as revealed by composition analysis using inductive coupling plasma-mass spectrometry. The heterovalent impurities can act as donors or acceptors, modifying the electronic characteristics. Thus, mastering impurities is a prerequisite for obtaining reliable and reproducible properties and advancing towards all ferroelectric devices.

Graded structures with different architectures were obtained by spark plasma sintering from (Ba1-xSrx)TiO3 (BST, x = 0.10; 0.20; 0.30) powders. The presence of the composition gradient was confirmed by structural and compositional investigations using X-ray diffraction and electron microscopy combined with energy dispersive X-ray spectroscopy. The concentration gradient was either asymmetric (3 layers, starting with x = 0.10 and ending with x = 0.30) or symmetric (5 or 6 layers, starting and ending with x = 0.10, and with a single or double x = 0.30 layer in the middle, respectively). Electrical measurements reveal a decrease of the dielectric constant with increasing the number of the layers. It was found that the symmetric graded structure with 6 layers has the best thermal stability of both, the dielectric constant (variation of only 8% between zero and 100 degrees C) and the py-roelectric coefficient (6% variation between zero and 80 degrees C). In addition, an enhancement of the pyroelectric signal for frequencies above 100 Hz is obtained in symmetric structures, an effect that is attributed to the additive contributions of the signals originated from the layers with different Sr content. (C) 2021 The Author(s). Published by Elsevier B.V.

In this study, nano-BaTiO3 (BTO) powders were obtained via the solvothermal method at different reaction times and were investigated using transmission electron microscopy (TEM), X-ray diffraction (XRD) and Raman spectroscopy. The results were compared with those obtained for a larger crystallite size BTO powder (BTO-m). The sizes of the cuboid crystallites (as determined by XRD and TEM) ranged from about 18 to 24 nm, depending on the reaction time. The evolution with temperature of the structure parameters of nano-BTO was monitored by means of X-ray diffraction and Raman spectroscopy and no signs of phase transition were found up to 170 degrees C. Careful monitoring of the dependence of the XRD peak widths on the hkl indices showed that the effect of the cubic crystallite shape upon the XRD peak widths was buried by the effect of hidden tetragonal line splits and by anisotropic microstrain. The good correlation of the line widths with the tetragonal split amplitudes, observed especially for BTO-m above the transition temperature, indicates tetragonal deformations, as also revealed by Raman spectroscopy. The large anisotropic microstrain shown by the nano-powders, which had a maximum value in the directions, was considered evidence of the phenomenon of surface relaxation of cubic crystallites edged by {100} faces. The observed behavior of the nano-BTO structures with increasing temperature may suggest a correlation between the surface relaxation and tetragonal deformation in the nano-cubes. The experimental results for both nano-BTO and mezoscale-BTO are in agreement with the core-shell model.

The frequency and temperature dependence of dielectric properties of CH3NH3PbI3 (MAPI) crystals have been studied and analyzed in connection with temperature-dependent structural studies. The obtained results bring arguments for the existence of ferroelectricity and aim to complete the current knowledge on the thermally activated conduction mechanisms, in dark equilibrium and in the presence of a small external a.c. electric field. The study correlates the frequency-dispersive dielectric spectra with the conduction mechanisms and their relaxation processes, as well as with the different transport regimes indicated by the Nyquist plots. The different energy barriers revealed by the impedance spectroscopy highlight the dominant transport mechanisms in different frequency and temperature ranges, being associated with the bulk of the grains, their boundaries, and/or the electrodes' interfaces.

A simple dynamic method was developed to evaluate the components in the equivalent circuit of a ferroelectric capacitor. The method is based on the application of short trapezoidal voltage pulses of variable amplitude and the analysis of the resulting current by considering the ferroelectric capacitor as a parallel R-p-C-p equivalent circuit. The values of R-p and C-p components are obtained in relation to different stages of polarization switching as the amplitude of the applied pulses increases. The most important result obtained by applying the present method is the evidence of an abrupt decrease of the R-p value (about 2 orders of magnitude) at the coercive voltage, while the equivalent C-p does not present a dramatic variation during polarization switching. This is interpreted in the context of negative capacitance obtained for ferroelectrics when polarization passes through zero value. The results obtained by using the proposed dynamic characterization method that will be referred to as "dynamic dielectric characterization", are in good agreement with those obtained by classic capacitance-voltage measurements. A method to stabilize the negative capacitance for longer periods of time is also presented by adding an external resistance in series with the ferroelectric capacitor.

The dependencies of the BiOi defect concentration on doping, irradiation fluence and particle type in p-type silicon diodes have been investigated. We evidenced that large data scattering occurs for fluences above 10(12) 1 MeV neutrons/cm(2), becoming significant larger for higher fluences. We show that the BiOi defect is metastable, with two configurations A and B, of which only A is detected by Deep Level Transient Spectroscopy and Thermally Stimulated Currents techniques. The defect' electrical activity is influenced by the inherent variations in ambient and procedural experimental conditions, resulting not only in a large scattering of the results coming from the same type of measurement but making correlation between different types of experiments difficult. It is evidenced that the variations in [BiOiA] are triggered by subjecting the samples to an excess of carriers, by either heating or an inherent short exposure to ambient light when manipulating the samples prior to experiments. For the samples investigated in this work both, the [BiOiA] as determined from electrical spectroscopic measurements and the full depletion voltage as measured from Current-Voltage characteristics reach a steady state in similar to 7h. Any electrical measurement performed before will give a different result. The bi-stable behavior of the BiOi defect fully accounts for these variations.

Properties of epitaxial PbZr0.2Ti0.8O3 (PZT) films deposited on Si substrates were investigated for integration in the present CMOS technology. Polarization is downward oriented, in association with the presence of an internal electric field, and has a lower value compared to the PZT films deposited on single crystal perovskite SrTiO3 (STO) substrates (40 mu C/cm(2) versus 80 mu C/cm(2)), while the dielectric constant is larger (180 versus 120). Large value for the pyroelectric coefficient was also found, 1.22 x 10(-3)C/m(2)K, as for PZT grown on single crystal STO. The macroscopic ferroelectric and pyroelectric properties appear to be affected by the structural quality and stoichiometry of the PZT film. The changes in the electric properties are an effect of the strain gradients induced by the large difference between the thermal expansion coefficients of PZT and Si substrate, leading in turn to Pb oxidation and antisite defect formation compared to PZT films deposited on STO substrates.

The discovery of ferroelectricity in doped HfO2 represents an excellent opportunity to overcome the obstacles in manufacturing reliable ferroelectric field effect transistors (FeFET) for nonvolatile memory applications, considering that HfO2 is compatible with Si and Ge and it is already used in semiconductor industry. The presence of interface defects may have detrimental effects on the operation of FeFETs, so their role is systematically investigated in this study in correlation with the substrate doping. Metal-ferroelectric-semiconductor (MFS) structures are fabricated by depositing Hf0.5Zr0.5O2 (HZO) layers on n-type Ge substrate. Their electric properties are compared with those of MFS structures obtained by depositing HZO on p-type Ge, to study the influence of the doping. It is found that, although the ferroelectric properties of HZO are similar, the capacitance and impedance of the MFS structures behave differently. For n-Ge, the occupation probability of a large number of low-lying interface defect acceptor states, charges the interface negatively which adversely affects the C-V response of the MFS, albeit without harming the ferroelectric (P-V) hysteresis. Although the interface defects do not harm ferroelectricity, they could inhibit inversion in p-type Ge or accumulation in n-type Ge so they should be taken into account when designing Ge FeFET devices.

Hybrid perovskites based solar cells have demonstrated high conversion efficiency but poor long-term stability. This study reports on the results obtained after doping the CH3NH3PbI2.6Cl0.4 mixed halide perovskite with imidazolium (C3N2H5+, denoted IM) on the "A site" position of a perovskite, to improve photovoltaic performances and stability of hybrid perovskite solar cells. The perovskite films were investigated exhaustively by different characterization techniques: X-ray diffraction, Atomic Force Microscopy, Scanning Electron Microscopy, UV-Vis, X-ray Photoelectron Electron Paramagnetic Resonance spectroscopies, Impedance Spectroscopy and Incident Photon-to-Electron Conversion Efficiency. The photovoltaic parameters were determined by measuring the IV curves of the corresponding solar cells. The amount of IM inserted in the perovskite play a key role on the film properties. The calculated new tolerance factors according to the "globularity factor" are experimentally proved and thus at doping concentrations greater than 20% for CH3NH3PbI2.6Cl0.4 perovskite the 3D structure is no longer obtained. However, below this value, the IM substituted perovskite film possesses an improved film quality and crystallinity as compared to the pristine film. Substituting MA+ with IM+ provides a favorable way to reduce recombination processes and shows great potential to achieve high stability, and an improved charge generation, resulting in increased PCE values. We find that the optimal percentage of imidazolium incorporation to achieve better stability of solar cells is 6%.

In view of the HL-LHC upgrade, radiation-tolerant silicon sensors containing low-resistivity p-type implants or substrates, like LGAD or HV-CMOS devices, are being developed in the framework of ATLAS, CMS, RD50 and other sensor R&D projects. These devices are facing a particular problem - the apparent deactivation of the doping due to the irradiation, the so-called acceptor removal effect. In the present work proton and neutron fluence-dependent radiation damage effects, including the change in leakage current and effective doping concentration, space charge sign-inversion, but also introduction and annealing of point- and cluster-like defects have been studied in Si pad diodes fabricated from p-type EPI material of different resistivity (10-1000 Omega cm). Standard electrical characterisations (IV, CV), TCT (Transient Current Technique) and TSC (Thermally Stimulated Current) techniques were applied. A correlation between effective doping concentration obtained from CV measurements and defect concentration N-t extracted from TSC measurements for both - neutron and proton - irradiations was observed pointing towards the microscopic origin of the acceptor removal. A detailed analysis of the dominant TSC peaks - E(30), BiOi and three main deep acceptor levels H(116), H(140) and H(152) - responsible for the changes in the effective space charge is performed. The origin and annealing behaviour of E(30) and H(40) and other cluster-related defects are discussed as well.

The negative-capacitance effect in devices based on combined ferroelectric-dielectric gate oxides is thought to be a potential solution to break free from the so-called Boltzmann tyranny. To lower the power consumption in field-effect transistors, the subthreshold swing factor S should be reduced below the ther-modynamic limit of 60 mV per decade. Yet, despite numerous studies dedicated to this effect in the past decade, its origin in ferroelectric capacitors or ferroelectric-based superlattices remains unclear, being considered either a transitory product of polarization switching or an intrinsic phenomenon related to the presence of ferroelectric polarization. In this study it is shown, starting from simple electrostatic con-siderations, that negative capacitance is present during polarization switching and is accompanied by a significant increase of the current flowing through the ferroelectric capacitor. Coupled with piezo-force microscopy results, it is shown that the polarization orientation suddenly changes at the coercive voltage, accompanied by a complete reconfiguration of the potential barriers at the Schottky-like contacts present at the electrode-ferroelectric interfaces. A method to estimate the polarization-switching time, as the time associated with the presence of the negative-capacitance effect, is proposed. Values in the range from 100 to 1000 ns are obtained for epitaxial PbZr0.2Ti0.8O3 films. These findings suggest that negative capacitance may be an intrinsic effect in ferroelectrics but that it is a transitory effect, present only when ferroelectric polarization passes through zero (switching).

Single-phase Ba1-xSrxTiO3 (BST) perovskite ceramics with 0.3 <= x <= 0.4 were prepared from powders synthesized via sol-gel route. The compositions have the ferroelectric-paraelectric phase transition close to room temperature. At 20 degrees C the BST ceramics are ferroelectric for 0.3 <= x <= 0.35 and paraelectric for x = 0.375 and x = 0.40. The study follows the relation between the structural changes produced when increasing the Sr content and the dielectric properties at low intensity electric fields. It is found that the grain size and tetragonality decreases as the Sr content increases. Analyses of complex permittivity and impedance spectroscopy reveal the temperature and frequency dependencies of the dielectric properties. The phase transitions seem to be of first order for all compositions, with a thermal hysteresis that decreases with increasing the Sr content, fact attributed to the corresponding increase of the grain boundaries weight allowing a more efficient stress relaxation in the structure during the change of the symmetry from cubic to tetragonal. The diffusiveness degree during the phase transition is increasing with Sr content, suggesting some relaxor-type contribution attributed to smaller grain size. The ac conductivity follows the universal Jonscher law, with an ac component having the power parameter s independent of Sr content, and a dc component that it is thermally activated with an activation energy of about 0.7-0.77 eV attributed to oxygen vacancies acting as donor-like defects. The fit of impedance spectra at different temperatures and frequencies is obtained by using an equivalent circuit accounting the grains, grain boundaries, electrode interfaces and the local contributions produced by reorientation of defect dipoles or defect clusters. All the component circuits have significant variations around phase transitions. These are discussed in relation to structural changes occurring during transition and considering the changes in the distribution of various charges when polarization vanishes.

This study reports on the results obtained after doping the [CH3NH3](0.94)[C3N2H5](0.06)PbI2.6Cl0.4 mixt halide perovskite with europium or antimony (Eu3+/Sb3+) at the 'B site'. This way two new complex compounds were obtained, [CH3NH3](0.94)[C3N2H5](0.06)Pb1-yByI2.6Cl0.4 (B = Eu or Sb and y = 0-0.05) as perovskite precursor solutions and deposited as thin films. The properties of the perovskite films were investigated by various characterization techniques: x-ray diffraction (XRD), atomic force microscopy (AFM), scanning electron microscopy (SEM), UV-vis spectroscopy while the photovoltaic parameters were determined by measuring the IV curves of the corresponding solar cells. We find that doping the mixt halide perovskite with very small quantities of Sb improves the quality of the perovskite films and further improves the stability of perovskite solar cells.

The influence of the injection of minority charge carriers on the formation of a divalent bistable defect (DBH) having two energy levels of E-v + 0.44 eV and E-v + 0.53 eV in its metastable configuration is investigated. Using forward current injection, the formation temperature of this defect in p-type silicon can be lowered by about 50 degrees C. The production of such bistable defect is enhanced in materials with a high ratio of boron to carbon concentrations. This allows one to conclude that the boron atom is one of the constituents of the defect under study. There is also a correlation between the behavior of the bistable hole traps and a metastable electron trap observed earlier. It is concluded that these traps are related to metastable and stable configurations of the DBH defect, which has inverse occupancy level ordering in its stable configuration.

A carbon-based layer was deposited by spraying on top of a ferroelectric layer grown by sol-gel on Si (001) substrate and its properties as electrode and absorber for pyroelectric detection were tested. It was found that the electric properties of the ferroelectric capacitor with top carbon-based sprayed electrode (CBSE) are comparable with those of the capacitors with standard top SrRuO3 (SRO)/Au electrode. Pyroelectric measurements show that the pyroelectric signal recorded on ferroelectric capacitors with top CBSE electrode is 2.5 times greater than for top SRO/Au electrode for low frequency range. The value of the pyroelectric coefficient was estimated to 9.73.10(-4) C/m(2)K for CBSE electrodes and 3.36.10(-4) C/m(2)K for SRO/Au respectively. The fabrication process of CBSE is of low cost, easy to implement and with high throughput making it attractive for manufacturing various devices like pyroelectric detector, thermal imaging, solar cells, etc.

We present an extension of the dynamic electrical model, which enable us to explain some important features of the perovskite solar cells (PSC), like the shape of the hysteresis and the appearance of the ?bump? in the so called reverse scan, without requiring any additional assumptions. We give analytical expressions in terms of the Lambert?s function W for the open circuit voltage, the stationary current, and the instantaneous current, which can be written also in terms of elementary functions for the most part of the ranges of the physical parameters. The initial polarization of the cell, modeled as the charging of a capacitor with voltage dependent capacitance, is consistently determined in the model, from the initial stationary conditions. This is inline with a previously observed sharp increase of the PSC capacitance beyond the open-circuit voltage. Besides the known features, we obtain characteristics that were not yet analyzed experimentally, like the change of the bump from the reverse scan branch of the J?V characteristic to the forward scan, with the increase of the poling voltage (or the increase of the PSC capacitance).

Multiple nonvolatile and well-separated capacitive states can be obtained in a two-terminal ferroelectric capacitor setup by fine tuning the polarization switching process. This approach allows for the implementation of memcomputing (same platform for storage and computing) capable ferroelectric structures. Digital and analog storage modes are exemplified in this work together with an algorithm for simple binary computation functions such as OR/NOR and AND/NAND for data processing on the same device. Results are obtained by controlling the polarization switching process in ferroelectric multi-layers such as Pb (Zr0.2Ti0.8)O-3/SrTiO3/Pb (Zr0.2Ti0.8)O-3 and Pb (Zr0.2Ti0.8)O-3/BaTiO3/Pb (Zr0.2Ti0.8)O-3. Besides memcomputing, these results can be used for nondestructive capacitive reading of information in simple ferroelectric capacitors or can open the way toward applications such as neuromorphic and chaotic circuits.

We investigate how far the hysteresis-free behavior of perovskite solar cells can be reproduced using particular pre-conditioning and measurement conditions. As there are currently more and more reports of perovskite solar cells without J-V hysteresis it is crucial to distinguish between genuine performance improvements and measurement artifacts. We focus on two of the parameters that influence the dynamic J-V scans, namely the bias scan rate and the bias poling voltage, and point out measurement conditions for achieving a hysteresis-free behavior. In this context we discuss the suitability of defining a hysteresis index (HI) for the characterization of dynamic J-V scans. Using HI, aging effects are also investigated, establishing a potential connection between the sample degradation and the variation of the maximal hysteresis on one hand, and the relaxation time scale of the slow process on the other hand. Pre-poling induced recombination effects are identified. In addition, our analysis based on sample pre-biasing reveals potential indications regarding two types of slow processes, with two different relaxation time scales, which provides further insight regarding ionic migration.

Single-phase Ce3+-doped BaTiO3 powders described by the nominal formula Ba1-xCexTi1-x/4O3 with x = 0.005 and 0.05 were synthesized by the acetate variant of the sol-gel method. The structural parameters, particle size, and morphology are strongly dependent on the Ce3+ content. From these powders, dense ceramics were prepared by conventional sintering at 1300 degrees C for 2 h, as well as by spark plasma sintering at 1050 degrees C for 2 min. For the conventionally sintered ceramics, the XRD data and the dielectric and hysteresis measurements reveal that at room temperature, the specimen with low cerium content (x = 0.005) was in the ferroelectric state, while the samples with significantly higher Ce3+ concentration (x = 0.05) were found to be in the proximity of the ferroelectric-paraelectric phase transition. The sample with low solute content after spark plasma sintering exhibited insulating behavior, with significantly higher values of relative permittivity and dielectric losses over the entire investigated temperature range relative to the conventionally sintered sample of similar composition. The spark-plasma-sintered Ce-BaTiO3 specimen with high solute content (x = 0.05) showed a fine-grained microstructure and an almost temperature-independent colossal dielectric constant which originated from very high interfacial polarization.

Ferroelectrics are intensively studied materials due to their unique properties with high potential for applications. Despite all efforts devoted to obtain the values of ferroelectric material constants, the problem of the magnitude of static dielectric constant remains unsolved. In this article it is shown that the value of the static dielectric constant at zero electric field and with negligible contribution from the ferroelectric polarization (also called static background dielectric constant, or just background dielectric constant) can be very low (between 10 and 15), possibly converging towards the value in the optical domain. It is also found that the natural state of an ideal, mono-domain, epitaxial ferroelectric is that of full depletion with constant capacitance at voltages outside the switching domain. The findings are based on experimental results obtained from a new custom method designed to measure the capacitance-voltage characteristic in static conditions, as well from Rayleigh analysis. These results have important implications in future analysis of conduction mechanisms in ferroelectrics and theoretical modeling of ferroelectric-based devices.

Comparative studies employing Deep Level Transient Spectroscopy and C-V measurements have been performed on recombination-enhanced reactions between defects of interstitial type in boron doped silicon diodes irradiated with alpha-particles. It has been shown that self-interstitial related defects which are immobile even at room temperatures can be activated by very low forward currents at liquid nitrogen temperatures. Their activation is accompanied by the appearance of interstitial carbon atoms. It has been found that at rather high forward current densities which enhance BiOi complex disappearance, a retardation of C-i annealing takes place. Contrary to conventional thermal annealing of the interstitial boron-interstitial oxygen complex, the use of forward current injection helps to recover an essential part of charge carriers removed due to irradiation. Published by AIP Publishing.

We investigate the dynamic behavior of perovskite solar cells by focusing on the relaxation time tau, which corresponds to the slow de-polarization process from an initial bias pre-poled state. The dynamic electrical model (DEM) is employed for simulating the J-V characteristics for different bias scan rates and pre-poling conditions. Depending on the sign of the initial polarization normal or inverted hysteresis may be induced. For fixed pre-poling conditions, the relaxation time, in relation to the bias scan rate, governs the magnitude of the dynamic hysteresis. In the limit of large tau the hysteretic effects are vanishing for the typical range of bias scan rates considered, while for very small tau the hysteresis is significant only when it is comparable with the measurement time interval.

The dynamic effects observed in the J-V measurements represent one important hallmark in the behavior of the perovskite solar cells. Proper measurement protocols (MPs) should be employed for the experimental data reproducibility, in particular for a reliable evaluation of the power conversion efficiency (PCE), as well as for a meaningful characterization of the type and magnitude of the hysteresis. We discuss here several MPs by comparing the experimental J-V characteristics with simulated ones using the dynamic electrical model (DEM). Pre-poling conditions and bias scan rate can have a dramatic influence not only on the apparent solar cell performance, but also on the hysteretic phenomena. Under certain measurement conditions, a hysteresis-free behavior with relatively high PCEs may be observed, although the J-V characteristics may be far away from the stationary case. Furthermore, forward-reverse and reverse-forward bias scans show qualitatively different behaviors regarding the type of the hysteresis, normal and inverted, depending on the bias pre-poling. We emphasize here that correlated double-scans, forward-reverse or reverse-forward, where the second scan is conducted in the opposite sweep direction and begins immediately after the first scan is complete, are essential for a correct assessment of the dynamic hysteresis. In this context, we define a hysteresis index which consistently assigns the hysteresis type and magnitude. Our DEM simulations, supported by experimental data, provide further guidance for an efficient and accurate determination of the stationary J-V characteristics, showing that the type and magnitude of the dynamic hysteresis may be affected by unintentional pre-conditioning in typical experiments.

This work focuses on the kinetic mechanisms responsible for the annealing behavior of radiation cluster-related defects with impact on the electrical performance of silicon sensors. Such sensors were manufactured on high resistivity n-type standard float-zone (STFZ) and oxygen enriched float-zone (DOFZ) material and had been irradiated with mono-energetic electrons of 3.5 MeV energy and fluences of 3 x 10(14) cm(-2) and 6 x 10(14) cm (-2). After irradiation, the samples were subjected either to isochronal or isothermal heat treatments in the temperature range from 80 degrees C to 300 degrees C. The specific investigated defects are a group of three deep acceptors [H(116 K), H(140 K), and H(152 K)] with energy levels in the lower half of the band gap and a shallow donor E(30 K) with a level at 0.1 eV below the conduction band. The stability and kinetics of these defects at high temperatures are discussed on the basis of the extracted activation energies and frequency factors. The annealing of the H defects takes place similarly in both types of materials, suggesting a migration rather than a dissociation mechanism. On the contrary, the E(30 K) defect shows a very different annealing behavior, being stable in STFZ even at 300 degrees C, but annealing-out quickly in DOFZ material at temperatures higher than 200 degrees C, with a high frequency factor of the order of 10(13) s(-1). Such a behavior rules out a dissociation process, and the different annealing behavior is suggested to be related to a bistable behavior of the defect. Published by AIP Publishing.

Co-doped CeO2 thin films were grown from a bulk target with starting composition Ce0.95Yb0.04Er0.01O2 by pulsed laser deposition (PLD) on a p(+)-n-n(+) single crystal silicon diode. The PLD laser fluence was varied between 1.7 J/cm(2) and 3.7 J/cm(2). The device with the film grown for a laser fluence of 2.3 J/cm(2) delivers the highest performance taking advantage of the up conversion (UC) effect provided by this film. Namely, the increase in the relative power conversion efficiency of the device is 12.1% and 39.2% for illumination under 1 and 2.1 sun, respectively, and its relative external quantum efficiency is 8.2% when illuminated with 980 nm light. The film grown for the optimum 2.3 J/cm(2) fluence shows good target-film composition transfer and a granular morphology with a low roughness. The UC mechanism consists of efficient energy transfer between spatially separated Yb3+ and Er3+ ions, i.e. the absorption of infrared light photons by the Yb3+ ions (F-2(7/2) -> F-2(5/2) transition) is followed by a two-step energy transfer process to neighboring Er3+ ions and by their characteristic luminescent emissions ((H-2(11/2), S-4(3/2)) -> I-4(15/2)) and (F-4(9/2) -> I-4(15/2)).

Non-ionising energy loss of radiation produces point defects and defect clusters in silicon, which result in a significant degradation of sensor performance. In this contribution results from TSC (Thermally Stimulated Current) defect spectroscopy for silicon pad diodes irradiated by electrons to fluences of a few 10(14) cm(-2) and energies between 3.5 and 27 MeV for isochronal annealing between 80 and 280 degrees C, are presented. A method based on SRH (Shockley-Read-Hall) statistics is introduced, which assumes that the ionisation energy of the defects in a cluster depends on the fraction of occupied traps. The difference of ionisation energy of an isolated point defect and a fully occupied cluster, Delta E-a is extracted from the TSC data. For the VOt (vacancy-oxygen interstitial) defect Delta E-a = 0 is found, which confirms that it is a point defect, and validates the method for point defects. For clusters made of deep acceptors the Delta E-a values for different defects are determined after annealing at 80 degrees C as a function of electron energy, and for the irradiation with 15 MeV electrons as a function of annealing temperature. For the irradiation with 3.5 MeV electrons the value Delta E-a = 0 is found, whereas for the electron energies of 6-27 MeV Delta E-a > 0. This agrees with the expected threshold of about 5 MeV for cluster formation by electrons. The Delta E-a values determined as a function of annealing temperature show that the annealing rate is different for different defects. A naive diffusion model is used to estimate the temperature dependencies of the diffusion of the defects in the clusters.

Pure BT and BT doped with 1 and 2 mol% Zr, with orthorhombic-tetragonal (O-T) phase transitions near room temperature were prepared, with different grain sizes, by conventional ceramic method, at various sintering temperatures. Intrinsic and extrinsic effects of Zr addition on structural, dielectric, piezoelectric and ferroelectric properties of BT ceramics, near O-T phase transition were studied. In coarse grained ceramics, the intrinsic effects manifested in low field measurements (dielectric and piezoelectric constants), were reduced by Zr addition, while the extrinsic effects which control the high field response (remanent polarization and coercive field) were significantly enhanced. Instead, in fine grains ceramics, of either pure or doped BT, the extrinsic effects related to increased domain wall and grain boundaries density were dominant in both low and high field measurements, overlapping Zr effects. The results were explained in terms of crystal anisotropy correlated with grain size effects.

Here we report a ferroelectric capacitor structure obtained by alternating ferroelectric and insulator thin-film layers which allows an increase of up to 2(n) polarization states, with n the number of ferroelectric layers. Four and up to eight distinct, stable and independently addressed polarization states are experimentally demonstrated in this work. The experimental findings are supported by a theoretical model based on the Landau-Ginzburg-Devonshire theory. The key parameter is the change in the strain conditions of ferroelectric layers induced by the insulating separator. Notably, the 2(n) increase in the storage capacity can be achieved without major changes in the present technology used for FeRAM devices. The test structures demonstrate very good memory characteristics such as retention and fatigue, opening the way towards the design of high density ferroelectric memories.

Hysteretic effects are investigated in perovskite solar cells in the standard FTO/TiO2/CH3NH3PbI3-xClx/spiro-OMeTAD/Au configuration. We report normal (NH) and inverted hysteresis (IH) in the J-V characteristics occurring for the same device structure, and the behavior strictly depends on the prepoling bias. NH typically appears at prepoling biases larger than the open circuit bias, while pronounced IH occurs for negative bias prepoling. The transition from NH to IH is marked by an intermediate mixed hysteresis behavior characterized by a crossing point in the J-V characteristics. The measured J-V characteristics are explained quantitatively by the dynamic electrical model. Furthermore, the influence of the bias scan rate on the NH/IH hysteresis is discussed based on the time evolution of the accumulated ionic and electronic polarization charge at the interfaces. Introducing a three-step measurement protocol, which includes stabilization, prepoling, and measurement, we put forward the difficulties and possible solutions for a correct photoconversion efficiency evaluation.

Epitaxial thin films of NiFe2O4 are fabricated by pulsed laser deposition on SrTiO3 substrate. Symmetrical capacitor-like structures are formed using SrRuO3 as bottom and top electrodes. Electrical characterizations, including current-voltage, capacitance-voltage and capacitance-frequency measurement, reveal a hysteresis-like behaviour for current and capacitance as function of voltage. This could be assigned to a resistive and/or capacitive switching. A "degradation" process takes place after repeated voltage cycling or after heating the sample to 400 K, leading to the stabilization of different resistive states. These features can be related to the changes observed in the capacitance-frequency characteristics, suggesting the presence of a relaxation mechanism at low frequencies, and can be associated with the presence of a deep donor-type level in the band-gap of the NiFe2O4 layer.

A dynamic electrical model is introduced to investigate the hysteretic effects in the J-V characteristics of perovskite based solar cells. By making a simple ansatz for the polarization relaxation, our model is able to reproduce qualitatively and quantitatively detailed features of measured J-V characteristics. Pre-poling effects are discussed, pointing out the differences between initially over- and under-polarized samples. In particular, the presence of the current overshoot observed in the reverse characteristics is correlated with the solar cell pre-conditioning. Furthermore, the dynamic hysteresis is analyzed with respect to changing the bias scan rate, the obtained results being consistent with experimentally reported data: the hysteresis amplitude is maximum at intermediate scan rates, while at very slow and very fast ones it becomes negligible. The effects induced by different relaxation time scales are assessed. The proposed dynamic electrical model offers a comprehensive view of the solar cell operation, being a practical tool for future calibration of tentative microscopic descriptions. (C) 2016 Elsevier B.V. All rights reserved.

The integration of ferroelectrics in perovskite solar cells is proposed as possible way to enhance charge collection efficiency. First results on solar cellmanufactured with PbTiO3 (PTO) instead of TiO2 have shown negligible values for the power conversion efficiency (PCE). This is explained by the high serial resistance of sol-gel deposited PTO on F:SnO2 electrodes (FTO). Although PTO layer has remnant polarization of 22 mu C/cm(2), the high potential barrier (0.25 +/- 0.05 eV) at the FTO/PTO interface and lowcarriermobility (10(-8) cm(2) V-1 s(-1)) compared to TiO2 leads to high serial resistance. Better results were obtained with thinner PTO layers grown by pulsed laser deposition, with PCE values up to 0.6%. Further enhancement was obtained by replacing PTO with BaTiO3 (BTO), with PCE value reaching about 0.8% after poling the cell with +3 V. The most important finding was that the magnitude of the short circuit current increases with the amplitude of the poling voltage while the value of the open-circuit voltage remains about the same, around 0.9 V. This is explained through more efficient collection of the charges generated under illumination in the absorber layer due to the polarization that is present in the ferroelectric film. (C) 2017 Elsevier Ltd. All rights reserved.

The substantial increase in the power conversion efficiency of hybrid perovskite solar cells, to date reaching more than 20% in the laboratory, has strongly motivated research on this class of organic-inorganic materials and related devices, particularly based on CH3NH3PbI3-xXx/TiO2 heterostructures (X = Cl,Br). Taking under consideration that a ferroelectric substrate may act as an efficient electron transporter, positively influencing charge collection across the interface and allowing the tuning of the halide perovskite (HP) - ferroelectric junction, we performed extensive density functional theory calculations on CH3NH3PbI3-xClx layers deposited on tetragonal PbTiO3 (PTO) (001) surfaces, to study their structural and electronic properties. The main findings of this study are as follows. (i) A ferroelectric polarization pointing from the PTO/HP interface to the PTO is favorable for the photogenerated electrons transfer across the interface and their transport to the collecting electrode. (ii) The PTO internal electric field leads to a position dependent energy levels diagram. (iii) The HP gap may be tuned by chlorine concentration at the interface, as well as the by the surface terminations of PbTiO3 and hybrid perovskite layers. (iv) The presence of the PTO ferroelectric surface is likely to have just a slight orientational effect on the (CH3NH3)(+) dipoles.

Epitaxial Pb(Zr0.2Ti0.8)O-3 (PZT) thin films were grown by pulsed laser deposition on two slightly different types of single crystal substrates, namely SrTiO3 (STO) buffered with a thin layer of conductive SrRuO3 (SRO), and SrTiO3 doped with 0.5% Nb (STON). Although self-poling effect was expected in both cases, due to the compressive strain imposed by the substrate, it was found that the pyroelectric response of as grown samples is with about two orders of magnitude larger for the PZT film deposited on SRO/STO compared to the one deposited on STON substrate. In order to explain the finding, the electrical properties were investigated and it was found that the quantities involved in the equation giving the magnitude of the pyroelectric signal, namely dielectric constant and electrical resistivity, have about the same values Therefore, the different pyroelectric response in the as-grown samples was explained by different structure of ferroelectric domains induced by the different carrier concentration in the two substrates: 90 degrees domains for PZT on SRO/STO and 180 degrees domains for PZT on STON. It appears that the resistivity of the substrate and its ability to compensate the depolarization field affect the domain structure, with impact on the pyroelectric response, although the strain conditions are similar in both cases. The trying to increase the pyroelectric response for the PZT film deposited on STON substrate by applying a poling process was not successful, as the 180 degrees domain structure restores shortly after removing the poling field. (C) 2017 Elsevier Ltd. All rights reserved.

A hysteresis loop with three polarization states is obtained in the case of a symmetric epitaxial ferroelectric-interlayer-ferroelectric structure with bottom and top SrRuO3 electrodes. The ferroelectric layers are of PbZr0.2Ti0.8O3, while the interlayer is CoFe2O4. It is shown that the three polarization states can be separately accessed, suggesting that this type of structure can be used as building element for a three-state nonvolatile ferroelectric random-access memory (FERAM). The presence of the three-state memory effect is explained through a simple phenomenological model based on Landau-Ginzburg-Devonshire theory. The findings of this study can pave the way to multistate all-oxide FERAM devices, resulting in a 50% increase in the storage density compared to actual nonvolatile memories.

The intrinsic pyroelectric properties of thick, coarse grained Ba1-xSrxTiO3 (BST) ceramics were studied in relation with Sr content. The intrinsic values of the pyroelectric coefficient were determined directly from the frequency dependence of the measured pyroelectric signal by adapting the formalism developed for thin films deposited on thick substrates to thick and non-uniformly heated ceramics with uniform composition. Ceramic pellets, of about 1 mm thickness, with relative density of 89-95% were prepared using powder synthesized by the sol gel method. It was found that the intrinsic pyroelectric properties are enhanced by increasing the Sr content, while other features (e.g. tetragonality, grain size, polarization, transition temperature) decrease. The best intrinsic pyroelectric properties were obtained for 30% Sr content. The present results open the possibility to use large and thick BST ceramic pellets for manufacturing detectors useful for monitoring high power lasers. (C) 2016 Elsevier Ltd and Techna Group S.r.l. All rights reserved.

Electrochemical deposition allows the preparation of ZnO nanostructures with precisely controlled morphology and properties, by finely tuning the process parameters. ZnO nanowires were deposited onto gold substrates by electrodeposition from a low concentration zinc nitrate bath Photolithography was employed for patterning interdigitated electrode systems onto silicon/silicon dioxide substrates and ZnO electrodeposition lead to wires connected to each other by bridging neighboring interdigits allowing electronic transport characterization. Optical measurements, i.e. reflection and photoluminescence spectroscopy, were performed and the results were correlated to electronic transport data. We found that we deal with a system for which one can apply a model of space charge limited currents with different traps energy distribution as a consequence of electrodeposition rate. Current versus temperature measurements show different behavior for lower and higher range of temperatures. Such nanowires, fabricated and contacted in a straightforward way, allow a wide area of applications ranging from conductometric bio- or chemo-sensors to optoelectronic devices. (C) 2015 Elsevier Ltd. All rights reserved.

We monitored the evolution in time of pinhole-free structures based on FTO/TiO2/CH3NH3PbI2.6Cl0.4 layers, with and without spiro-OMeTAD and counter electrodes (Ag, Mo/Ag, and Au), aged at 24 degrees C in a dark nitrogen atmosphere. In the absence of electrodes, no degradation occurs. While devices with Au show only a 10% drop in power conversion efficiency, remaining stable after a further overheating at 70 degrees C, >90% is lost when using Ag, with the process being slower for Mo/Ag. We demonstrate that iodine is dislocated by the electric field between the electrodes, and this is an intrinsic cause for electromigration of I- from the perovskite until it reaches the anode. The iodine exhaustion in the perovskite layer is produced when using Ag electrodes, and AgI is formed. We hypothesize that in the presence of Au the iodine migration is limited due to the buildup of I- negative space charge accumulated at the perovskite-OMeTAD interface.

The degradation of thin-film transistors (TFTs) caused by the self-heating effect constitutes a problem to be solved for the next generation of displays. Aluminum nitride (AlN) is a viable alternative for gate dielectric of TFTs due to its good thermal conductivity, matching coefficient of thermal expansion to indium-gallium-zinc-oxide, and excellent stability at high temperatures. Here, AlN thin films of different thicknesses were fabricated by a low temperature reactive radio-frequency magnetron sputtering process, using a low cost, metallic Al target. Their electrical properties have been thoroughly assessed. Furthermore, the 200 nm and 500 nm thick AlN layers have been integrated as gate-dielectric in transparent TFTs with indium-gallium-zinc-oxide as channel semiconductor. Our study emphasizes the potential of AlN thin films for transparent electronics, whilst the functionality of the fabricated field-effect transistors is explored and discussed. (C) 2016 Elsevier B.V. All rights reserved.

This work is focusing on generation, time evolution, and impact on the electrical performance of silicon diodes impaired by radiation induced active defects. n-type silicon diodes had been irradiated with electrons ranging from 1.5 MeV to 27 MeV. It is shown that the formation of small clusters starts already after irradiation with high fluence of 1.5 MeV electrons. An increase of the introduction rates of both point defects and small clusters with increasing energy is seen, showing saturation for electron energies above similar to 15 MeV. The changes in the leakage current at low irradiation fluence-values proved to be determined by the change in the configuration of the tri-vacancy (V-3). Similar to V-3, other cluster related defects are showing bistability indicating that they might be associated with larger vacancy clusters. The change of the space charge density with irradiation and with annealing time after irradiation is fully described by accounting for the radiation induced trapping centers. High resolution electron microscopy investigations correlated with the annealing experiments revealed changes in the spatial structure of the defects. Furthermore, it is shown that while the generation of point defects is well described by the classical Non Ionizing Energy Loss (NIEL), the formation of small defect clusters is better described by the "effective NIEL" using results from molecular dynamics simulations. (C) 2015 Author(s). All article content, except where otherwise noted, is licensed under a Creative Commons Attribution 3.0 Unported License.

The current-voltage (C-V) characteristic of epitaxial ferroelectric films is simulated assuming the presence of Schottky-type contacts at the two electrode interfaces. The model assumes that the overall capacitance of the metal-ferroelectric-metal (MFM) structure is composed of two parts: (i) one associated with the Schottky contacts, in which the ferroelectric polarization is saturated, the dielectric constant is independent on the voltage and only the linear response to the applied electric field is taken into account; (ii) one related to the ferroelectric volume, where the dielectric constant is voltage dependent through the hysteresis response of the ferroelectric polarization. Themost important result of the model is that it can simulate the experimentally observed thickness dependence of the dielectric constant without considering a so-called "dead layer" at the electrode interface. The model renders C-V characteristics in good qualitative agreement with the experimental ones in the case of an MFM structure based on epitaxial PZT films. The quantitative fit suggests that the behaviour of the ferroelectric polarization during the C-V measurement may be very different from its behaviour during the hysteresis measurement. This is explained by the fact that the two measurements have very different principles. It is also found that the dielectric constant of the ferroelectric volume has a different voltage dependence compared to the one derived from the hysteresis loop or from the experimental C-V characteristic. This is also related to the different measurement principles and to the fact that the measured capacitance of the MFM structure includes, besides the ferroelectric volume, the voltage dependent capacitance of the Schottky contacts. (C) 2015 Elsevier B.V. All rights reserved.

Ferroelectric/electric properties of PbZr0.52Ti0.48O3 (PZT) thin films grown by pulsed laser deposition (PLD) on two different substrates, Si (001) and SrTiO3 (STO) (001), were comparatively analyzed. The structural characterization has revealed the epitaxial relationship between the grown layers and the two types of substrates, with larger density of structural defects for the films deposited on Si (001) with buffer STO layer. The ferroelectric/electric properties are also different, with lower remnant polarization (about half of the value obtained on STO substrate), higher dielectric constant (about two times larger), and lower leakage current (about two orders of magnitude lower) for the PZT films deposited on Si (001) compared to those deposited on (001) STO substrates. Nevertheless, the results show that the use of a STO buffer layer on Si can be a solution to obtain good quality PZT capacitor structures without using expensive single-crystal oxide substrates. In this way, applications based on PZT capacitors (e.g. non-volatile memories, pyroelectric detectors, light switches, etc.) would be more easily integrated directly on Si wafers.

Electric and pyroelectric properties of AIN layers deposited on Si substrates with different resistivities were investigated. The dielectric constant was found to be around 12, while the conductance determined from dc current measurements was found to be in the 10(-9) to 10(-19) S range. The pyroelectric measurements were performed in voltage mode using two types of IR sources: a laser diode with 800 nm wavelength and a black body at 700 degrees C. A peculiar behavior was observed for the signal recorded when the laser diode was used as IR source. It was found that the Si substrate is introducing a signal component, due to the photogenerated carriers, which is adding to the pyroelectric signal generated by the AIN layer. This component is strongly dependent on the resistivity of the Si substrate. For strongly doped Si (Si++) the signal generated into the substrate represents only 10% of the recorded pyroelectric voltage. For electronic grade Si the signal generated into the substrate is about 100 times larger than the pyroelectric signal generated in the AIN layer. This effect can be used as an optical amplification of the pyroelectric signal. The frequency dependence observed for the pyroelectric signal recorded when the black body is used as IR source is typical for a pyroelectric detector. A value as large as 12.4 degrees C m(-2) K-1 was obtained for the pyroelectric coefficient using for estimation the constant signal at low modulation frequencies of the IR beam. However, the value of the pyroelectric coefficient is strongly affected by the electrical conductance of the AIN layer. As the conductance is frequency dependent it results that the value of the pyroelectric coefficient is frequency dependent, the value from above being valid only for very small frequencies of the temperature variation. It was also found that the electric and pyroelectric properties are dependent on the crystalline quality of the AIN layer. (C) 2015 Elsevier B.V. All rights reserved.

The compensation of the depolarization field in ferroelectric layers requires the presence of a suitable amount of charges able to follow any variation of the ferroelectric polarization. These can be free carriers or charged defects located in the ferroelectric material or free carriers coming from the electrodes. Here we show that a self-doping phenomenon occurs in epitaxial, tetragonal ferroelectric films of Pb(Zr0.2Ti0.8)O-3, consisting in generation of point defects (vacancies) acting as donors/acceptors. These are introducing free carriers that partly compensate the depolarization field occurring in the film. It is found that the concentration of the free carriers introduced by selfdoping increases with decreasing the thickness of the ferroelectric layer, reaching values of the order of 10(26) m(-3) for 10 nm thick films. One the other hand, microscopic investigations show that, for thicknesses higher than 50 nm, the 2O/(Ti+Zr+Pb) atomic ratio increases with the thickness of the layers. These results suggest that the ratio between the oxygen and cation vacancies varies with the thickness of the layer in such a way that the net free carrier density is sufficient to efficiently compensate the depolarization field and to preserve the outward direction of the polarization.

An amplification of near three orders of magnitude was observed in Pb(Zr,Ti)O-3 (PZT) thin films deposited on Pt/Si substrates when the Si substrate is included as an impedance in series with the PZT capacitor. The effect is present only at wavelengths below 1100 nm, where the incident light can be absorbed in the Si substrate with generation of free carriers. These carriers in turns modulate the internal electric field inside the ferroelectric layer leading to a much larger variation of the polarization compared to the one generated only by the temperature variation. This fact leads to a considerable enhancement of the pyroelectric signal. The finding can be useful in designing pyroelectric detectors with enhanced characteristics for visible and near infrared region of the electromagnetic spectrum.

Electrical properties of ferroelectric capacitors based on PbZr0.52Ti0.48O3 thin films grown by pulsed laser deposition on silicon substrate with SrTiO3 buffer layer grown by molecular beam epitaxy were studied. A SrRuO3 layer was deposited as bottom electrode also by pulse laser deposition and Pt, Ir, Ru, SrRuO3 were used as top contacts. Electrical characterization comprised hysteresis and capacitance-voltage measurements in the temperature range from 150 K to 400 K. It was found that the macroscopic electrical properties are affected by the electrode interface, by the choice of the top electrode. However, even for metals with very different work functions (e.g. Pt and SrRuO3) the properties of the top and bottom electrode interfaces remain fairly symmetric suggesting a strong influence from the bound polarization charges located near the interface. (C) 2015 Elsevier B.V. All rights reserved.

Quasi-static polarization induced by dc electric field was studied in a broad range of temperatures in epitaxial films of relaxor ferroelectric PbMg1/3Nb2/3O3 and PbSc1/2Nb1/2O3. The electric field was applied and the response was measured along the out-of-plane crystal direction of the epitaxial perovskite-structure (001) oriented films. The films remained in the relaxor state in zero-field cooling. A new polar state can be induced by electric field at a critical temperature below 100 K. The critical field and the induced polarization increased on cooling and reached the bulk-like values at 20 K. The orientational anisotropy of thin-film dipolar systems is discussed as a possible reason for the observed stable relaxor state.

The leakage current was studies in epitaxial ferroelectric Pb(Zr0.52Ti0.48)O-3 layer with common SrRuO3 bottom electrode and different metals as top contacts (SrRuO3, Pt, Ir, Ru). It was found that the dominant conduction mechanism in the 200-350 K temperature range and for voltages significantly larger than the coercive value is the thermionic emission governed by the Schottky-Simmons equation. The height of the potential barriers was estimated and was found that this is about the same for negative and positive voltage polarities. No correlation was found between the height of the potential barriers for different top contacts and the work function difference between the bottom and top electrodes. The results suggest that the potential barrier is controlled by the polarization charges in a similar way to the one reported for Pb(Zr0.2Ti0.8)O-3 and BaTiO3 epitaxial films with bottom SrRuO3 electrode and different metals as top contacts. It was also found that above 350 K the conduction mechanism changes to ohmic and/or space charge limited currents.

Electrode interface is a key element in controlling the macroscopic electrical properties of the ferroelectric capacitors based on thin films. In the case of epitaxial ferroelectrics, the electrode interface is essential in controlling the leakage current and the polarization switching, two important elements in the read/write processes of nonvolatile memories. However, the relation between the polarization bound charges and the electronic properties of the electrode interfaces is not yet well understood. Here we show that polarization charges are controlling the height of the potential barriers at the electrode interfaces in the case of Pb(Zr,Ti)O-3 and BaTiO3 epitaxial films. The results suggest that the height is set to a value allowing rapid compensation of the depolarization field during the polarization switching, being almost independent of the metals used for electrodes. This general behavior open a new perspective in engineering interface properties and designing new devices based on epitaxial ferroelectrics.

Using forward current injection with densities in the range 15-30A/cm(2) we can effectively eliminate the radiation-induced boron-oxygen complex, which is the main compensating center in irradiated Si solar cells. It was found that for a given forward current density the elimination rate is decreasing with increasing irradiation dose. Additionally, some evidences have been obtained on the negative-U properties of the radiation-induced boron-oxygen complex.

New findings on the formation and annealing of interstitial boron-interstitial oxygen complex (BiOi) in p-type silicon are presented. Different types of n(+)-p structures irradiated with electrons and alpha-particles have been used for DLTS and MCTS studies. Electronic excitation essentially changes the formation rate of BiOi. It has been found that the increase of oxygen content slows the BiOi annealing rate down. The activation energy of the BiOi dissociation has been determined and it was found that germanium doping does not change the activation energy.

Voltage and frequency dependent capacitance measurements were performed on epitaxial BaTiO3 and Pb(Zr0.2Ti0.8)O-3 thin films deposited on single crystal SrTiO3 substrates with (001) and (111) orientations. The measured capacitors have common bottom SrRuO3 contact and different metals as top electrodes: SrRuO3, Pt, Cu, Al, and Au. The capacitance-voltage characteristics were used to extract information regarding the density of the free carriers and the linear contribution to the static dielectric constant. The frequency dependent impedance was used to develop a suitable equivalent circuit for the epitaxial ferroelectric capacitors. It was found that the frequency dependence of the imaginary part of the impedance can be well simulated, in all cases, using a circuit composed of Schottky-type capacitance related to electrode interfaces, contact resistance, and the R-C parallel connection related to the ferroelectric volume of the film. Values for the components of the equivalent circuit were obtained by fitting the experimental data with the simulated curves. These were then used to extract quantities such as dielectric constant in the ferroelectric volume, the width of the depletion layers, and the apparent built-in potential. It was found that, although the investigated capacitors are of different ferroelectric materials, grown on substrates with different orientations, and having different metals as top electrodes, the values for the capacitance associated with the Schottky contacts and the apparent built-in potential are not very different. The results suggest a strong influence of ferroelectric polarization on the electrode interface properties in the case of epitaxial ferroelectric films. (C) 2014 AIP Publishing LLC.

Electric-field-induced transformations are studied experimentally in cube-on-cube-type epitaxial film of relaxor ferroelectric (FE) PbMg1/3Nb2/3O3 grown on (001) MgO substrate. The dielectric response, polarization, and current are measured along the out-of-plane direction of the film and analyzed as a function of temperature, frequency, and applied field. Compared to the crystal, transformation of the low-temperature relaxor state to a new state in the (001) film takes place at considerably lower temperatures and larger fields. Based on the found bisigmoidal shape and the two scaling regimes of the current-voltage curves, the two corresponding electric-field-induced processes are suggested to be dipolar flips and flow of a phase boundary in the film. The field-induced state in the film is dynamic and unstable, and it differs from the field-induced FE state in the crystal. The robustness of the relaxor state to electric field in the film is discussed in relation to spatial anisotropy of the dipolar system in the (001) film.

Relaxor-to-ferroelectric transformations induced by varying electric fields and temperatures are studied experimentally in acube-on-cubetype epitaxial PbSc1/2Nb1/2O3 film grown on La1/2Sr1/2CoO3/MgO(001). Dielectric response, quasi-static and dynamic polarization, and dynamic current-voltage characteristics evidence the absence of spontaneous relaxor-to-ferroelectric transition. The electricfield-induced transformation from a glass-like relaxor state to a new dynamic polar state is detected at low temperatures below 100 K only. The frustration of ferroelectricity is discussed in relation to orientational anisotropy of the dipolar system in the epitaxial (001) film.

It is shown experimentally that, in contrast to the stable configuration of (interstitial carbon)-(interstitial oxygen) complexes (CiOi), the corresponding metastable configuration (CiOi*) cannot be found in n-Si based structures by the method of capacitance spectroscopy. The rates of transformation CiOi* -> CiOi are practically the same for both n- and p-Si with a concentration of charge carriers of no higher than 10(13) cm(-3). It is established that the probabilities of the simultaneous formation of stable and metastable configurations of the complex under study in the case of the addition of an atom of interstitial carbon to an atom of interstitial oxygen is close to 50%. This is caused by the orientation dependence of the interaction potential of an atom of interstitial oxygen with an interstitial carbon atom, which diffuses to this oxygen atom.

Oxide materials are becoming of increasing interest due to their large variety of physical properties such as dielectric, magnetism, superconductivity, conductivity, ferroelectricity, multiferroism, etc. In addition, interfacing oxides with other materials is conferring new or better device functionalities. The main physical properties of oxides interfaces and their impact on the electrical properties of interest for microelectronic applications are presented. Further on, this subchapter is also devoted to the investigation and understanding of interface effects observed in heterostructures containing linear (SiO2) and non-linear (ferroelectrics) dielectrics in combination with wide-band gap semiconductor materials (e.g. ZnO and SiC) with special emphasis on size effects, interface quality and the opportunity to control the emergent phenomena in Metal-Oxide-Semiconductor (MOS) and Metal-Ferroelectric-Semiconductor (MFS) materials systems.

The high intensity and high repetition rate of the XFEL, the European X-ray Free-Electron Laser presently under construction in Hamburg, results in X-ray doses of up to 1 GGy in silicon sensors for 3 years of operation. Within the AGIPD Collaboration the Hamburg group has systematically studied X-ray-radiation damage using test structures and segmented sensors fabricated on high-ohmic n-type silicon. MOS Capacitors and Gate-Controlled Diodes from 4 vendors with different crystal orientations and different technological parameters, as well as strip sensors have been irradiated in the dose range between 10 kGy and 1 GGy. Current-Voltage, Capacitance/Conductance-Voltage and Thermal Dielectric Relaxation Current measurements were used to extract oxide-charge densities, interface-trap densities and surface-current densities as function of dose and annealing conditions. The results have been implemented into TCAD simulations, and the radiation performance of strip sensors and guard-ring structures simulated and compared to experimental results. Finally, with the help of detailed TCAD simulations, the layout and technological parameters of the AGIPD pixel sensor have been optimized. It is found that the optimization for sensors exposed to high X-ray doses is significantly different than for non-irradiated sensors, and that the specifications of the AGIPD sensor can be met. In 2012 sensors have been ordered, the first batch has been delivered recently, and first results on a comparison between simulations and measurements will be presented.

A systematic experimental study of the main challenges for silicon-pixel sensors at the European XFEL is presented. The high instantaneous density of X-rays and the high repetition rate of the XFEL pulses result in signal distortions due to the plasma effect and in severe radiation damage. The main parameters of X-ray-radiation damage have been determined and their impacton p(+)n sensors is investigated. These studies form the basis of the optimized design of a pixel-sensor for experimentation at the European XFEL. (C) 2013 Elsevier B.V. All rights reserved.

The leakage current in all oxide epitaxial (La,Sr)MnO3-ferroelectric-(La,Sr)MnO3 structures, where the ferroelectric layer is either BaTiO3 or Pb(Zr0.2Ti0.8)O-3, was analyzed on a broad range of temperatures and for different thicknesses of the ferroelectric layer. It was found that, although the structures are nominally symmetric, the current-voltage (I-V) characteristics are asymmetric. The leakage current depends strongly on the thicknesses of the ferroelectric layer, on temperature and on the polarity of the applied voltage. Simple conduction mechanisms such as space charge limited currents or thermionic emission cannot explain in the same time the voltage, temperature, and thickness dependence of the experimentally measured leakage currents. A combination between interface limited charge injection and bulk controlled drift-diffusion (through hopping in the case of BTO and through band mobility in the case of PZT) is qualitatively explaining the experimental I-V characteristics. (C) 2013 AIP Publishing LLC.

The high intensity and high repetition rate of the European X-Ray Free Electron Laser, presently under construction in Hamburg, will require pixel sensors which can stand X-ray doses up to 1 GGy for 3 years of operation. Within the AGIPD Collaboration the Hamburg group has systematically studied X-ray damage in silicon sensors for the dose range between 1 kGy and 1 GGy using strip sensors and test structures fabricated on high-ohmic n-type silicon from four different vendors. The densities of oxide charges, interface traps and surface current as function of dose and annealing conditions have been determined. The results have been implemented in TCAD simulations, and the radiation performance of strip sensors and guard-ring structures has been simulated and compared to experimental results. Finally, with the help of detailed TCAD simulations, the layout and technological parameters of the AGIPD pixel sensor have been optimized. It is found that the optimization for silicon sensors exposed to high X-ray doses is significantly different from that for non-irradiated sensors, and that the specifications of the AGIPD sensor can be met. (C) 2013 Elsevier B.V. All rights reserved.

In this work, anomalous discontinuities observed in Capacitance-Voltage (C-V) characteristics on non-nitridated n-4H-SiC/SiO2 capacitors at low temperature are addressed. The appearance of abrupt capacitance minima, always at the same gate voltages (4V and 8V) and independent on probe frequency, led us to consider a resonant electron tunneling process from neutral donor states present at the SiC/SiO2 interface into two well defined energy levels in the oxide layer. Results of numerical simulations based on this model describe quantitatively the experimentally observed discontinuities at 4V and 8V and provide strong evidence for the presence resonant tunneling.

As-grown n-4H-SiC/SiO2 capacitors exhibit anomalous capacitance-vs.-voltage (C-V) characteristics at low temperatures. Abrupt minima appear in the C-V curves at specific values of the gate voltages independent of the sample temperature, strongly suggesting the presence of resonant electron tunneling. We put forward a qualitative model where neutral donor states present at the SiC/SiO2 interface enable electron tunneling into distinct energy levels in the oxide. Numerical simulations based on this model show close agreement with the anomalous C-V characteristics observed experimentally. The model implies that under given conditions, i.e., the existence of a sufficient density of neutral donors at the semiconductor/oxide interface and empty electron states in the oxide layer, abrupt minima are in general to be expected during C-V measurements of metal-oxide-semiconductor capacitors. (C) 2013 Elsevier B. V. All rights reserved.

Radiation damage in silicon, caused by the creation of point and cluster defects due to energetic charged hadrons and neutrons, results in a serious degradation of silicon-sensor performance and limits their lifetime. So far not all the defects are understood. The work presented here focuses on the study of radiation damage by electrons of different kinetic energies, from 1.5 MeV to 15 MeV, in order to study the differences between point- and cluster-related defects. The introduction rate of vacancy-related point defects and of so-called clustered regions was investigated as a function of electron energy. It is shown that the ratio between cluster dominated and point defect formation increases with increasing electron energy. 1.5 MeV electrons create only point defects, and the formation of cluster defects starts already at 3.5 MeV. To study the defect kinetics, isothermal annealing at 80 degrees C and isochronal annealing measurements were performed. (C) 2013 Elsevier B.V. All rights reserved.

The presence and structure of paramagnetic point defects in C-13 and O-17 implanted ultrapure Si single-crystal material, two impurities which seem to play a major role in the detectors performance degradation and radiation resistance enhancement, respectively, are reported before and after irradiation with 6 MeV electrons. The investigation, performed by Q-band electron spin resonance spectroscopy in the 300 - 10 K temperature range, included also reference ultrapure and O-16 doped single-crystal Si-platelets. It resulted in the observation of points defects associated with lattice defects as dangling bonds and impurities.

Electric and magnetic properties of symmetric and asymmetric Pb(Zr-0.2 Ti-0.8)O-3-CoFe2O4 (PZT/CFO) heterostructures, grown by pulsed laser deposition on SrTiO3 (100) substrates with a 25 nm SrRuO3 (SRO) buffer layer as bottom electrode, were investigated by using hysteresis and capacitance measurements. X-ray diffraction, and transmission electron microscopy investigations reveal the high quality crystalline structure and the epitaxial relationship between SRO, PZT and CFO. The electric polarization-voltage hysteresis reveals that the remnant polarization and the coercive field are significantly affected by the CFO layer. The frequency dependence of capacitance suggests a Maxwell-Wagner type relaxation at low frequencies and is also affected by the presence of the PZT/CFO interface(s). The magnetic hysteresis measurements infer the possible presence of another spinel phase (Co3O4) in the CFO film, due to the lattice mismatch at the PZT/CFO interfaces, and with direct influence on the magnetic response of the structure. According to the electric and magnetic characterization, better room temperature multiferroic properties would be expected for the symmetric heterostructure. (C) 2013 Published by Elsevier B. V.

Metal-ferroelectric-metal structures based on epitaxial Pb(Zr0.2Ti0.8)O-3 thin films are prepared by pulsed laser deposition on single crystal SrTiO3 substrates ((001) orientation) with buffer SrRuO3 layer as bottom electrode. Pt, Cu, and SrRuO3 are used as top contacts. The current-voltage (I-V) measurements reveal a strong influence of the top electrode interface on the magnitude of the leakage current and the shape of the I-V characteristics. The lowest current values are obtained for top Cu and the highest for top Pt. Diode-like behavior is obtained for top Cu and Pt, but the forward and reverse biases are opposite in sign. Contrary to the case of BiFeO3 layers deposited on the same type of substrates, it was found that the diode-like behavior is not switchable with the polarization reversal although the polarization values are comparable. It is also shown that the metal-ferroelectric-metal (MFM) structure based on Pb(Zr,Ti)O-3 (PZT) can be simulated and modeled as a back-to-back connection of two Schottky diodes. The diode-like behavior of the MFM structure can be induced by a slight asymmetry of the potential barriers at the electrode interfaces behaving as Schottky contacts. The study ends with a critical discussion of the MFM structures based on PZT and BiFeO3 (BFO) layers. It is shown that the switchable diode-like behavior is not uniquely determined by the polarization reversal and is not a general characteristic for MFM structures. Such behavior may be present only if the polarization induced band-bending at the interface is generating an accumulation layer at the interface. This could be possible in BiFeO3 based MFM structures due to the lower band gap compared to Pb(Zr0.2Ti0.8)O-3 thin films. (C) 2013 AIP Publishing LLC.

Experiments at the European X-ray Free Electron Laser (XFEL) require silicon pixel sensors which can withstand X-ray doses up to 1 GGy. For the investigation of X-ray radiation damage up to these high doses, MOS capacitors and gate-controlled diodes built on high resistivity n-doped silicon with crystal orientations and produced by two vendors, CiS and Hamamatsu, have been irradiated with 12 keV X-rays at the DESY DORIS III synchrotron light source. Using capacitance/conductance-voltage, current-voltage and thermal dielectric relaxation current measurements, the surface densities of oxide charges and interface traps at the Si-SiO2 interface, and the surface-current densities have been determined as function of dose. Results indicate that the dose dependence of the surface density of oxide charges and the surface-current density depend on the crystal orientation and producer. In addition, the influence of the voltage applied to the gates of the MOS capacitor and the gate-controlled diode during X-ray irradiation on the surface density of oxide charges and the surface-current density has been investigated at doses of 100 kGy and 100MGy. It is found that both strongly depend on the gate voltage if the electric field in the oxide points from the surface of the SiO2 to the Si-SiO2 interface. Finally, annealing studies have been performed at 60 degrees C and 80 degrees C on MOS capacitors and gate-controlled diodes irradiated to 5MGy and the annealing kinetics of oxide charges and surface current determined.

Samarium is deposited on Si(001) at various temperatures (room temperature to 400 A degrees C), and the surface structure, interface reactivity, electron configuration, and magnetic properties are investigated by low-energy electron diffraction (LEED), X-ray photoelectron spectroscopy (XPS), and magneto-optical Kerr effect (MOKE), respectively. It is found that metal Sm is present on samples prepared at room temperature with an interface layer containing mostly Sm2+ and a lower amount of Sm3+. When samples are prepared at high temperature, much less Sm-0 is found with an increasing amount of Sm2+. Freshly prepared Sm-0 and SmSi2 layers react strongly with oxygen from the residual gas, promoting formation of Sm2O3 at the expense of both metal Sm and SmSi2. Room temperature ferromagnetism is observed for all prepared layers with a decrease of the saturation magnetisation when samples are prepared at high temperature. It is found that ferromagnetism implies mostly Sm3+ and Sm metal. In addition to these findings, this work proposes a new assignment of the Sm 3d chemically shifted components. Also, a noticeable variation of the XPS Sm 3d spin-orbit splitting is found as a function of the Sm ionization state.

The rectifying properties of Nb:SrTiO3-Bi1-xGdxFeO3-Pt structures (x = 0, 0.05, 0.1) displaying diode-like behavior were investigated via current-voltage characteristics at different temperatures. The potential barrier was estimated for negative polarity assuming a Schottky-like thermionic emission with injection controlled by the interface and the drift controlled by the bulk. The height of the potential barrier at the Nb:SrTiO3-Bi1-xGdxFeO3 interface increases with Gd doping. The results are explained by the partial compensation of the p-type conduction due to Bi vacancies with Gd doping in addition to the shift of the Fermi level towards the middle of the bandgap with increasing dopant concentration. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.4729816]

(Na1/2Bi1/2)TiO3 doped in situ with 11 inol% BaTiO3 (NBT-BT0.11) powders were synthesized by a sol-gel method, and the electrical properties of the resulting ceramics were investigated. The powders consisting of uniform and fine preliminary particles of about 50 nm were prepared by calcining the gel precursor at 700 degrees C. (Na1/2Bi1/2)(0.89)Ba0.11TiO3 ceramics, sintered at temperatures up to 1150 degrees C have a rhombohedral symmetry while the ceramic sintered at 1200 degrees C exhibits a tetragonal crystalline structure. The ceramics show high dielectric constant (epsilon(r) similar to 5456), dielectric loss of 0.02, depolarization temperature T-d similar to 110 degrees C and temperature corresponding to the maximum value of dielectric constant T-m similar to 262 degrees C. The dielectric constant (epsilon(33)) and the piezoelectric constant (d(33)) attain the maximum values of 924 and 13 pC/N, respectively, while the electromechanical coupling factor (k(p)) value is 0.035. The NBT-BT0.11 ceramics derived from sol-gel present high mechanical quality factor (Q(m) similar to 860). The dielectric and piezoelectric properties values of NBT-BT0.11 ceramics derived from sol-gel are smaller than those of samples produced by the conventional solid state reaction method, due to the grains size and oxygen vacancies that generate dipolar defects. (C) 2012 Elsevier Ltd. All rights reserved.

The hysteretic properties of metal-ferroelectric-semiconductor (MFS) structures based on Pb(Zr0.2Ti0.8)O-3 (PZT) and ZnO films were studied with respect of the quality of the PZT-ZnO interface. The films were grown by pulsed laser deposition (PLD) on platinized silicon (Pt/Si) substrate and on single crystal, (001) oriented SrTiO3 (STO) substrates. The structural analysis has revealed that the PZT-ZnO stack grown on single crystal STO is epitaxial, while the structure grown on Pt/Si has columnar texture. The temperature change of the capacitance-voltage (C-V) hysteresis direction, from clockwise at low temperatures to counter clockwise at high temperatures, was observed at around 300K in the case of the MFS structure grown by PLD on Pt/Si substrate. This temperature is lower than the one reported for the case of the PZT-ZnO structure grown by sol-gel on Pt/Si substrate (Pintilie et al., Appl. Phys. Lett. 96, 012903 (2010)). In the fully epitaxial structures the C-V hysteresis is counter clockwise even at 100K. These findings strongly points out that the quality of the PZT-ZnO interface is essential for having a C-V hysteresis of ferroelectric nature, with negligible influence from the part of the interface states and with a memory window of about 5V at room temperature. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.4765723]

Imaging experiments at the European X-ray Free Electron Laser (XFEL) require silicon pixel sensors with extraordinary performance specifications: doses of up to 1 GGy of 12 keV photons, up to 105 12 keV photons per 200 mu m X 200 mu m pixel arriving within less than 100 fs, and a time interval between XFEL pulses of 220 ns. To address these challenges, in particular the question of radiation damage, the properties of the SiO2 layer and of the SiSiO2 interface, using MOS (metal-oxide-semiconductor) capacitors manufactured on high-resistivity n-type silicon irradiated to X-ray doses between 10 kGy and 1 GGy, have been studied. Measurements of capacitance/conductancevoltage (C/GV) at different frequencies, as well as of thermal dielectric relaxation current (TDRC), have been performed. The data can be described by a dose-dependent oxide charge density and three dominant radiation-induced interface states with Gaussian-like energy distributions in the silicon band gap. It is found that the densities of the fixed oxide charges and of the three interface states increase up to dose values of approximately 10 MGy and then saturate or even decrease. The shapes and the frequency dependences of the C/GV measurements can be quantitatively described by a simple model using the parameters extracted from the TDRC measurements.

The hysteretic behavior of the epitaxial Pb(Zr,Ti)O-3 thin films with different top metal electrodes is studied, with emphasis on the influence of the leakage current and trap generation current on the shape of the loop as well as on the magnitude of the measured polarization. Cu, Pt, and SrRuO3 were used as top contacts and important differences were observed for measurements performed in both dynamic and static modes, although the contacts were deposited on the same epitaxial Pb(Zr,Ti)O-3 film grown on SrRuO3/SrTiO3 substrate. A peculiar behavior was observed especially for the static hysteresis loops where, depending of the top contact, the loop is influenced mainly by the leakage current (Pt) or by the trap generation current (Cu and SrRuO3). The last one can contribute with an additive charge, having a linear dependence on the applied voltage, as suggested by the simple model developed to explain the abnormally high values of the dielectric constant extracted from the linear part of the static hysteresis loop. It is concluded that the properties of the top electrode interface can significantly impact the hysteretic behavior of the ferroelectric films. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.4754318]

The rad-hard EPI diode was characterized envisaging its application in on-line 1.5 MeV electron beam dosimetry in radiation processing. As expected from a current sensitivity loss (13.5%) to the accumulated dose up to 750 kGy, the EPI diode exhibited good short-term repeatability (CV = 1.9%) which is better than that required for CTA dosimeters, routinely applied in radiation processing. The dose-response curve of the EPI diode was fitted by a second order polynomial function for doses up to 775 kGy. In addition, some preliminary studies on the radiation damage effects induced in this diode using a Capacitance Deep Level Transient Fourier Spectroscopy system are presented. The results showed that up to almost 1.5 MGy only 3 defects (VO, V-2 and CiOi) can influence the carrier lifetime and current generated. Further radiation damage studies are under way.

In current particle physics experiments, silicon strip detectors are widely used as part of the inner tracking layers. A foreseeable large-scale application for such detectors consists of the luminosity upgrade of the Large Hadron Collider (LHC), the super-LHC or sLHC, where silicon detectors with extreme radiation hardness are required. The mission statement of the CERN RD50 Collaboration is the development of radiation-hard semiconductor devices for very high luminosity colliders. As a consequence, the aim of the R&D programme presented in this article is to develop silicon particle detectors able to operate at sLHC conditions. Research has progressed in different areas, such as defect characterisation, defect engineering and full detector systems. Recent results from these areas will be presented. This includes in particular an improved understanding of the macroscopic changes of the effective doping concentration based on identification of the individual microscopic defects, results from irradiation with a mix of different particle types as expected for the sLHC, and the observation of charge multiplication effects in heavily irradiated detectors at very high bias voltages. (C) 2011 Elsevier B.V. All rights reserved.

The European X-ray Free Electron Laser (XFEL) will deliver 30,000 fully coherent, high brilliance X-ray pulses per second each with a duration below 100 fs. This will allow the recording of diffraction patterns of single complex molecules and the study of ultra-fast processes. Silicon pixel sensors will be used to record the diffraction images. In 3 years of operation the sensors will be exposed to doses of up to 1 GGy of 12 keV X-rays. At this X-ray energy no bulk damage in silicon is expected. However fixed oxide charges in the insulating layer covering the silicon and interface traps at the Si-SiO(2) interface will be introduced by the irradiation and build up over time. We have investigated the microscopic defects in test structures and the macroscopic electrical properties of segmented detectors as a function of the X-ray dose. From the test structures we determine the oxide charge density and the densities of interface traps as a function of dose. We find that both saturate (and even decrease) for doses between 10 and 100 MGy. For segmented sensors the defects introduced by the X-rays increase the full depletion voltage, the surface leakage current and the inter-pixel capacitance. We observe that an electron accumulation layer forms at the Si-SiO(2) interface. Its width increases with dose and decreases with applied bias voltage. Using TCAD simulations with the dose dependent parameters obtained from the test structures, we are able to reproduce the observed results. This allows us to optimize the sensor design for the XFEL requirements. In addition the Si-SiO(2) interface region has been studied with time resolved signals induced by sub-nanosecond 660 nm laser light, which has a penetration of about 3 m m in silicon. Depending on the biasing history, humidity and irradiation dose, losses of either electrons or holes or no charge losses are observed. The relevance of these results for the sensor stability and performance is under investigation.

The effect of nitrogen (N) introduced by ion implantation at the SiO2/4H-SiC interface on the capacitance of the MOS capacitors is investigated. The Thermal Dielectric Relaxation Current (TDRC) technique and Capacitance-Voltage (C-V) measurements performed at different temperatures and probe frequencies on an N implanted sample and on a virgin sample were employed for this purpose. There are three types of defects located at or near the interface, D-it, NIToxfast and NIToxslow that can be distinguished. Only D-it and NIToxfast respond to the a.c. small, high frequency signal at temperatures above 150K. The separation of D-it from the NIToxfast states have enabled us to study the influence of the excess of interfacial Nitrogen on each of the mentioned defects. It has been found that the N-implantation process fully suppresses the formation of NIToxfast and partially NIToxslow and D-it. Theoretical C-V characteristics were computed, based on the defect distributions determined by TDRC, and compared with the experimental ones showing a close agreement.

Comparative studies of gate oxides on a N+ pre-implanted area (N-interface similar to 1x10(19)cm(-3)) and on a virgin Si face 4H-SiC material (N-interface similar to 1x10(16)cm(-3)) have been undertaken by means of Capacitance-Voltage (C-V) characteristics, performed at different temperatures and frequencies, and Thermal Dielectric Relaxation Current technique. In the non implanted samples, the stretch out of the C-V curves get larger as the temperature is lowered to 150K, while for lower temperatures the C-V characteristics become steeper and some discontinuities occur. These discontinuities are specific for the non-implanted sample and are associated with charging of the fast near interface states (NIToxfast) via a tunneling from the shallow interface states (D-it). The tunneling from the shallow D-it to NIToxfast supress the a.c. response of D-it, which is recovered only after most of the NIToxfast are charged with electrons.

It is shown that the short-circuit photocurrent measured under illumination in Pb(Zr,Ti)O-3 epitaxial films is strongly dependent on the metal used as the top electrode. The magnitude of the photocurrent varies by more than 2 orders of magnitude from Pt (largest signal) to Al (smallest signal). The differences are for both directions of polarization. The imprint is also dependent on the top metal electrode, with a direct effect on the shape of the spectral distribution. The results support the hypothesis that the origin of the photovoltaic effect in ferroelectric thin films is different from that of the anomalous photovoltaic effect observed in bulk ceramics and single crystals. (C) 2011 American Institute of Physics. [doi:10.1063/1.3624738]

This work deals with the influence of neutron and proton induced cluster related defects on the properties of n-type silicon detectors. Defect concentrations were obtained by means of Deep Level Transient Spectroscopy (DLTS) and Thermally Stimulated Current (TSC) technique, while the full depletion voltage and the reverse current were extracted from capacitance-voltage (C-V) and current-voltage (I-V) characteristics. The annealing behaviour of the reverse current can be correlated with the annealing of the cluster related defect levels labeled E4a and E4b by making use of their bistability. This bistability was characterised by isochronal and isothermal annealing studies and it was found that the development with increasing annealing temperature is similar to that of divacancies. This supports the assumption that E4a and E4b are vacancy related defects. In addition we observe an influence of the disordered regions on the shape and height of the DLTS or TSC signals corresponding to point defects like the vacancy-oxygen complex. (C) 2009 Elsevier B.V. All rights reserved.

Pt-ZnO-Pb(Zr0.2Ti0.8)O-3-Pt (PZT-ZnO) heterostructures were fabricated by using a sol-gel process. Capacitance-voltage measurements performed on a wide temperature range (20-450 K) have revealed the presence of a hysteresis that undergo a change of direction from clockwise at temperatures below 350 K to counter-clockwise at higher temperatures. In the first case, the hysteresis is produced by charge injection, similar to the case of classical metal-oxide-semiconductor capacitors. In the last case, the hysteresis is the fingerprint of polarization reversal, as reported for metal-ferroelectric-semiconductor (MFS) structures based on n-Si. The memory window at 450 K is about 6 V. This result suggests that PZT-ZnO MFS heterostructures can be used for memory devices working at elevated temperatures, in which the ZnO plays the role of the semiconductor.

Electron states at the SiO2/4H-SiC interface have been investigated using capacitor structures and especially, the influence of excess nitrogen, introduced by ion implantation, at the interface is studied in detail. Implanted and nonimplanted n-type samples with an interfacial concentration of nitrogen of similar to 10(19) cm(-3) and 10(16) cm(-3), respectively, were analyzed by capacitance-voltage (C-V) measurements, performed at different temperatures and probe frequencies, and thermal dielectric relaxation current (TDRC) measurements performed in the temperature range of 35-295 K. Three main categories of electron states are disclosed, true interface states (D-it), fast near interface states (NIToxfast) and slow near interface states (NIToxslow). The density versus energy distributions of D-it and NIToxfast have been deduced from the TDRC data and they are shown to give a close quantitative agreement with the shape and frequency dependence of the C-V curves. Further, the amount of NIToxslow extracted from TDRC is demonstrated to be responsible for the parallel shifts and hysterezis effects occurring in the C-V characteristics. All three categories of electron states are reduced in concentration in the implanted samples. This holds particularly for NIToxfast with a peak at similar to 0.1 eV below the conduction band edge of 4H-SiC that is suppressed by at least two orders of magnitude relative to the nonimplanted samples. The decrease for D-it is also substantial (a factor of similar to 10) while the loss for NIToxslow is considerably smaller (only similar to 30%). The results provide firm evidence that NIToxfast and NIToxslow do not originate from the same kind of defect center. (C) 2010 American Institute of Physics. [doi:10.1063/1.3457906]

The short-circuit photocurrent was measured in ferroelectric capacitors of polycrystalline and epitaxial quality. The interest was to study the possible relation between photocurrent and back-switching phenomena due to ferroelectric polarization imprint, as suggested by Pintilie [J. Appl. Phys. 101, 064109 (2007)]. An interesting relation between the shape of the ferroelectric hysteresis loop and the shape of the photocurrent spectral distribution was found. In polycrystalline samples, the shape of spectral distribution and the sign of photocurrent are changing in time, although the hysteresis is almost symmetrical. However, the hysteresis is not rectangular as in the case of epitaxial films. This behavior suggests a subtle relation between polarization back-switching and photocurrent. In epitaxial samples a peculiar dependence between photocurrent and polarization imprint was found. All these are explained assuming the presence of an internal field, possibly generated by charged defects, which can change its direction and magnitude under illumination, with consequence on the orientation and magnitude of the ferroelectric polarization, and on the sign/shape of the short-circuit photocurrent spectral distribution. (C) 2010 American Institute of Physics. [doi: 10.1063/1.3445877]

A single ferroelectric Schottky diode was obtained on a SrRuO3-Pb(Zr0.2Ti0.8)O-3-Ta (SRO-PZT20/80-Ta) structure in which the SRO-PZT20/80 interface is the rectifying contact and the PZT20/80-Ta interface behaves as a quasiohmic contact. Both the capacitance-voltage (C-V) and the current-voltage (I-V) characteristics show the memory effect due to the ferroelectric polarization. However, retention studies had revealed that only the "down" orientation of ferroelectric polarization is stable in time (polarization oriented from top to bottom contact). The analysis of the experimental results suggests that the PZT20/80 is n type and that the stable orientation of polarization is related to the presence of a depletion region at the SRO-PZT20/80 Schottky interface.

Imaging experiments at the XFEL pose unprecedented requirements to the detectors in terms of radiation tolerance: Fluxes of up to 10(16) (12 keVphotons/cm(2)) corresponding to approximately 10(9) Gy in silicon, are expected. An irradiation station has been set up in the DORIS beam line F4, MOS test structures have been irradiated, and first results on the dose dependence of the CN-characteristics, surface current density, and interface trap density have been obtained.

This work focuses on the investigation of radiation-induced defects responsible for the degradation of silicon detector performance. Comparative studies of the defects induced by irradiation with Co-60-gamma rays, 6 and 15 MeV electrons, 23 GeV protons and reactor neutrons revealed the existence of point defects and cluster-related centers having a strong impact on damage properties of Si diodes. The detailed relation between the "microscopic" reasons as based on defect analysis and their "macroscopic" consequences for detector performance is presented. In particular, it is shown that the changes in the Si device properties (depletion voltage and leakage current) after exposure to high levels of Co-60-gamma doses can be completely understood by the microscopically investigated formation of two point defects, a deep acceptor and a shallow donor, both depending strongly on the oxygen concentration in the silicon bulk. Specific for hadron irradiation are the annealing effects which decrease (increase) the originally observed damage effects as seen by the changes of the depletion voltage and these effects are known as "beneficial" and "reverse" annealing, respectively. A group of three cluster-related defects, revealed as deep hole traps, proved to be responsible specifically for the reverse annealing. Their formation is not affected by the oxygen content or silicon growth procedure suggesting that they are complexes of multi-vacancies located inside extended disordered regions. (C) 2009 Elsevier B.V. All rights reserved.

PbZr0.2Ti0.8O3-BiFeO3-PbZr0.2Ti0.8O3 (PZT-BFO-PZT) structure was prepared by sol-gel method on Pt/Si wafers. Three metals were tested as top electrod: Au, Cu, and Pt. A double hysteresis loop was observed in all cases, suggesting an antiferroelectric-like behavior. The values for remnant polarization and coercive field are about 3 mu C/cm(2) and 115 kV/cm, respectively. The saturation polarization is about 22 mu C/cm(2). Capacitance and leakage current show significant dependence on the top metal electrode. The results were explained considering the presence of a Schottky-type contact at the PZT-metal interface.

The purpose of this work is to compare the density of shallow interface states (D-it) at the interface of SiO2/SiC MOS capacitors as deducted by the conductance spectroscopy (CS) and thermally dielectric relaxation current (TDRC) techniques. Both capacitors of 4H- and 6H-SiC (n-type) arc investigated, and both ordinary dry oxidation and,in improved industrial procedure have been employed. The two techniques are found to give rather good agreement for interface states located >= 0.3 eV below the conduction band edge (E-c) while for more shallow states vastly different distributions of D-it are obtained. Different reasons for these contradictory results are discussed, such as strong temperature and energy dependence of the capture cross section of the shallow interface States.

Nitrogen doped 4H-SiC epitaxial layers grown by hot-wall chemical vapor deposition were investigated by deep level transient spectroscopy after irradiation with 6 MeV electrons or 1.6 MeV protons. The influence of silane and propane flows used during the epilayers growth on the behaviour of radiation induced EH6,7 levels is studied. Samples grown under different conditions were investigated: 1 sample grown in steps of different C/Si ratio obtained by changing the propane flow only; 1 sample grown in steps of different C/Si ratio obtained by changing the silane flow only; 2 samples grown with a C/Si ratio of 1.5 but with different flows of propane and silane. These investigations revealed that the low thermal stability of EH6,7 (the defects anneal out at temperatures as low as 750K) is due to the magnitude of silane now used during the growth irrespective of the C/Si ratio. A possible structure of the EH6,7 defect is discussed.

This work is focusing oil the effect of a high concentration of nitrogen (N) introduced by ion implantation at the SiO2/4H-SiC interface in MOS capacitors. The N implanted sample (N-interface similar to 1 x 10(19) cm(-3)) is compared with a non-implanted one (N-interface similar to 1 x 10(16) cm(-3)) by means of the electron interface trap density (D-it). The Dit is determined via High-Low frequency C-V method and Thermal Dielectric Relaxation Current (TDRC) technique. It is shown that the TDRC method, mainly used so far for determination of near interface oxide charges, call be exploited to gain information about the D-it too. The determined value of D-it in the N-implanted sample is nearly one order of magnitude lower than that in the sample without N implantation. Good agreement between the TDRC results and those obtained from High-Low frequency C-V measurements is obtained. Furthermore, the TDRC method shows a high accuracy and resolution of D-it,evaluation in the region close to the majority carrier band edge and gives information about the traps located into the oxide.

This work is focusing on the investigation of those radiation induced defects causing degradation effects of Silicon detector performance. Comparative studies of the defects induced by irradiation with Co-60- gamma rays, 23 GeV protons and I MeV equivalent reactor neutrons revealed the existence of some point defects and cluster related centers having a strong impact to damage properties of Si diodes. The detailed relation between the "microscopic" reasons as based on defect analysis and their "macroscopic" consequences for detector performance are presented. In particular, it is shown that the changes in the Si device properties (depletion voltage and leakage current) after exposing to high levels of Co-60- gamma irradiation can be completely understood by the microscopically investigated formation of two point defects: i) a defect formed via a second order process (I-p) that can be associated with the long searched for V2O complex or with a Carbon related center and is the cause for the observed type inversion effect in Oxygen lean material; ii) a bistable donor (BD) created during irradiation that is strongly generated in Oxygen rich material, associated with one of the earlier thermal donors in Si. It is the cause for the observed positive space charge induced by irradiation in oxygenated Si diodes. Specific for hadron irradiation are the annealing effects which decrease resp. increase the originally observed damage effects as seen by the changes of the depletion voltage (effects known as "beneficial" and "reverse" annealing, respectively). A group of four cluster related defects proved to be responsible for these annealing effects. Their formation is not affected by the Oxygen content or Si growth procedure suggesting that they are complexes of multivacancies located inside extended disordered regions.

Leakage currents determine bumps in the capacitance-voltage characteristics of metal-oxide-semiconductor-type heterostructures with capacitance values larger than the insulator capacitance. A nearly parallel shift with frequency is also observed. These aspects are connected with the presence of a high density of interface states. We illustrate these effects for the case of nano-PbS/SiO2/Si heterostructures. The phenomena were simulated and we propose a method to quickly estimate the interface state density level of a heterostructure when leakage channels are present. (C) 2008 American Institute of Physics.

In hydrogenated high-purity Si, the vacancy-oxygen (VO) center is shown to anneal already at temperatures below 200 degrees C and is replaced by a center, identified as a vacancy-oxygen-hydrogen complex, with an energy level 0.37 eV below the conduction-band edge and a rather low thermal stability. At long annealing times, the process is reversed and the concentration of the latter defect is reduced, while the VO center partly recovers. The divacancy (V-2) center anneals in parallel with the initial annealing of the VO center, and the loss in V-2 exhibits a one-to-one proportionality with the appearance of a hole trap 0.23 eV above the valence-band edge attributed to a divacancy-hydrogen (V2H) center.

The nano-crystalline PbS/n-Si heterostructure was studied using photocurrent spectra, I-V and C-V characteristics and admittance spectroscopy. The frequency dependent junction capacitance and conductance measurements show the presence of two contributions: first, a defect related mechanism which we attribute to a deep trap level with a large cross-section in nano-crystals with smaller sizes around 5 nm at the interface with Si and a second mechanism with an activation energy of about 250 meV, attributed to carrier transport in relatively large PbS grains of about 15 nm in size. (c) 2007 Elsevier B.V. All fights reserved.

The influence of the gate voltage on photoconductivity in P-Si/SiO2/(nano)crystalline PbS, Metal-Oxide Semiconductor Field-Effect Transistor (MOSFET)-like structures is investigated. The effect on the photo-signal in the wavelength range 500-1180 nm is opposite compared to the effect in the wavelength range 1600-2500 nm: a negative gate voltage increases the signal in the short wavelength range and decreases it for the long wavelength range. The opposite is valid for a positive gate bias. An on-off ratio better than 85 times is obtained for the spectral range 500-1180 nm, corresponding to the absorption in p-Si and better than 3.5 times for the spectral range 1600-2500 nm corresponding to the absorption in the (nano)crystal line PbS region, respectively. (c) 2007 Elsevier B.V. All rights reserved.

The electric, ferroelectric and photoelectric properties of Pb(Zr,Ti)O-3-Nb:SrTiO3 (PZT-STON) junctions were investigated on a broad range of temperatures. It was found that the hysteresis loop is strongly asymmetric, due to the asymmetry in the leakage current. The capacitance-voltage characteristic has a butterfly shape although it is also asymmetric because of the different nucleation and compensation conditions at the two interfaces. The junction shows a strong photovoltaic effect in the 200500 run wavelength range as short-circuit currents Of the order of nA for an illuminated surface of 0.018 mm(2). This makes the PZT-STON junctions attractive for UV optoelectronic applications.

Cluster related defects were investigated by the thermally stimulated current (TSC) method in neutron irradiated n-type Si diodes during 80 degrees C annealing. Three hole traps labeled H (116 K), H (140 K), and H (152 K) proved to have an electric-field-enhanced emission characteristic of Coulombic wells. Their zero field emission rates were deduced describing the TSC peaks with the three-dimensional Poole-Frenkel formalism when accounting for the electric field distribution. As acceptors in the lower half of the gap, these centers have a direct impact on the effective doping of the n-type diodes. They are revealed as causing the long term annealing effects. (c) 2008 American Institute of Physics.

n-Type epitaxial silicon layers of different thickness and resistivity, grown on highly Sb doped CZ-substrate by ITME (Warsaw), and n-type MCz silicon supplied by Okmetic (Finland) were used for the processing of planar diodes at CiS (Erfurt). For the epi-diodes a standard as well as a diffusion oxygenation process was employed. Irradiations had been performed with 26 MeV protons at the cyclotron of the Karlsruhe University and with neutrons at the TRIGA reactor of the Ljubljana University. Microscopic investigations using the DLTS method were done. The correlation of the IO(2i)-defect and the oxygen concentration was studied by a depth-profile measurement. The annealing behavior of the IO(2i)-defect at different temperatures was investigated and the activation energy extracted. (C) 2007 Elsevier B.V. All rights reserved.

N-type epitaxial layers of 72 mu m thickness and a resistivity of 150 Omega cm have been grown on highly Sb-doped Cz-substrates at ITME (Warsaw). The diode processing was performed at CiS-Erfurt. For comparison a batch of 280 mu m thick n-type MCZ wafers with a resistivity of >600 Omega cm from Okmetic (Finland) was added to the process run. Depth profiles of the oxygen and carbon concentration were measured via the SIMS-method on as grown epi-layers and after different device-process steps at CiS including an oxygen enrichment at 1100 degrees C for 24 h. For the MCz material the profiles were measured on untreated samples and after the full device process. Irradiation runs were performed with neutrons at the TRIGA reactor of Ljubljana up to a fluence value of 10(16) cm(-2). The development of the macroscopic device parameters (effective doping concentration and charge collection for a-particles) as function of fluence is presented for the standard and oxygenated epi-devices and compared with the MCz-diodes. The results are discussed in the frame of defect studies resulting from TSC-measurements. (C) 2007 Elsevier B.V. All rights reserved.

The microscopic damage produced in diodes made of n-type Magnetic Czochralski (MCz) silicon by 24 GeV and 26 MeV protons, up to the fluence of 1.3 x 10(15) cm(-2) 1 MeV equivalent neutrons, has been investigated and results are compared to the damage produced in devices made of standard Floating Zone (STFZ) silicon. It is found by means of Thermally Stimulated Currents (TSC) that the production of a radiation induced charged defect is enhanced in MCz, and might be in part responsible for the differences observed in the two materials at room temperature. The influence of defects on the sign of the space charge density has been studied by current transients at constant temperature i(T, t) and by Transient Current Technique (TCT). Type inversion is not revealed up to the highest investigated fluence. Full depletion voltage V-dep measurements versus fluence exhibits a minimum close to 2 x 10(14) cm(-2) 1 MeV equivalent neutrons; at the same fluence, V-dep measured as a function of annealing time changes its initial slope from positive to negative. It is shown by numerical simulations that these features can be accounted by the formation of a double junction, even in absence of type inversion. (c) 2006 Elsevier B.V. All rights reserved.

Diodes processed on n-type epitaxial silicon with a thickness of 25, 50 and 75 mu m had been irradiated with reactor neutrons and high-energy protons (24 GeV/c) up to integrated fluences of Phi(eq) = 10(16) cm(-2). Systematic experiments on radiation-induced damage effects revealed the following results: in contrast to standard and oxygen-enriched float zone (FZ) silicon devices no space charge sign inversion was observed after irradiation. It is shown that the radiation-generated concentration of deep acceptors, dominating the behavior of n-type FZ diodes, is compensated by creation of shallow donors. Thus a positive space charge is maintained throughout the irradiation up to the highest fluence and even during prolonged elevated-temperature annealing cycles. Defect analysis studies using thermally stimulated current measurements attribute the effect to a damage-induced shallow donor at E-C-0.23 eV. It is argued that, as in the case of thermal donors, oxygen dimers, out diffusing from the Cz substrate during the diode processing, are responsible precursers. Results from extensive annealing experiments at elevated temperatures are verified by comparison with prolonged room-temperature annealing. These results showed that in contrast to FZ detectors, which always have to be cooled, room-temperature storage during beam off periods of future elementary particle physics experiments would even be beneficial for n-type epi-silicon detectors. A dedicated experiment at CERN-PS had successfully proven this expectation. It was verified, that in such a scenario the depletion voltage for the epi-detector could always be kept at a moderate level throughout the full S-LHC operation (foreseen upgrade of the large hadron collider). Practically no difference with respect to FZ-silicon devices was found in the damage-induced bulk generation current. The charge trapping measured with Sr-90 electrons (mip's) is also almost identical to what was expected. A charge collection efficiency of 60% (2500 e) in 50 mu m n-type epi-diodes after 24 GeV/c proton irradiation with Phi(eq) = 6.2 x 10(15) cm(-2) was reported recently, independent of the operating temperature down to -20 degrees C. (c) 2006 Elsevier B.V. All rights reserved.

Detectors processed on epitaxial silicon are a promising solution for the extreme radiation levels in the innermost tracking layers at future particle physics experiments as in the upgraded (S-LHC). In order to systematically investigate their radiation tolerance.. sets of 25 and 50-mu m-thick diodes had been irradiated with 24GeV/c protons up to fluences Of Phi(eq) = 10(16) cm(-2). The full depletion voltage was measured during full isothermal annealing cycles at both 60 and 80 degrees C. A voltage of only 290 V was measured for the 50 mu m diodes after Phi(eq) = 1016cm(-2). In contrast to likewise thin float zone (FZ) diodes, the depletion voltage in epi-devices decreases with annealing during foreseen operational and storage periods. Low-temperature storage during beam-off periods as inevitable for FZ devices could be avoided. The reverse annealing components reveal an overall similar functional time dependence as observed in FZ diodes. However, the most important stable component is drastically different. In contrast to the well-known negative space charge build up observed in FZ diodes, the behavior in epi-diodes can only be explained by an additional formation of positive space charge. The immense improvement of the radiation tolerance of epi-detectors is thus attributed to a compensation effect between acceptor generation and donor creation unique for the epi-material. Charge collection efficiency drops only to about 80% after Phi(eq) = 6 x 10(15)cm(-2) proving that epi-detectors are indeed adequate candidates for the tracking area at extremely large radiation levels. (c) 2005 Elsevier B.V. All rights reserved.

The carrier transport mechanisms in as-grown LaAlO3 and La2Hf2O7 high-k insulator layers deposited on n- and p-Si were deduced from temperature dependent C-V and I-V characteristics correlated with photoelectric measurements. Large, parallel shifts in the high frequency C-V curves are explained by the presence of a large density of interface states and an approximate analytical formula relating the density of states to the C-V shift is deduced. The space charge limited current is explained by the existence of impurity channels situated energetically near the conduction or valence band of silicon.

Shallow defect levels in floating zone (FZ) and diffusion oxygenated FZ (DOFZ) silicon, before and after irradiation with a Co-60 gamma-source up to 300 Mrad, have been studied by thermally stimulated currents (TSC) and deep level transient spectroscopy (DLTS) in the temperature range 4.2-110 K. Besides vacancy oxygen (VO) and interstitial-substitutional carbon (CiCs) emissions, several TSC peaks have been observed. A trap with an activation energy of 11 meV has been observed at 6 K only in irradiated DOFZ. Two hole traps at 80 meV and 95 meV have been observed both in irradiated FZ and DOFZ, while a trap at 100 meV, related to an interstitial-oxygen (IO2) complex, has been revealed only in irradiated DOFZ. A TSC peak close to 24 K has been resolved into two components, whose concentrations are independent of irradiation fluence: a trap at 55 meV and a level which remains charged after emission at 80 meV. Our measurements confirm the formation, only in DOFZ, of a radiation induced donor at 230 meV. It appears to be responsible for the improved radiation hardness of oxygenated Si together with the suppression of deep acceptors, since no shallower radiation-induced donors have been detected in DOFZ samples.

Four different kinds of silicon materials (standard float zone-FZ, oxygen enriched FZ-DOFZ, Czoehralski-Cz and thin epitaxial layers grown on Cz substrates-Epi/Cz) have been investigated in this work. They have been irradiated with (CO)-C-60-gamma- radiation and 24 GeV/c protons. The differences in the changes observed in the effective doping concentration (N-eff) after proton irradiation of Cz and Epi silicon can be explained by the balance between the formation of two types of defects-a deep acceptor (the I center, referred to as It, in this paper in order to avoid any confusion with interstitials) and a shallow donor (the bistable donor (BD) complex). While the formation of the I-P center depends on the concentration of interstitial oxygen, the BD is generated in materials with high concentration of oxygen dimers. Following the generation of the IO2i defect-detected after low irradiation fluences only in Epi and Cz material-the average dimer concentration in 50 put Epi/Cz was estimated to be of only 2.7 times lower than in Cz diodes. A value of similar to 2.7 x 10(-12) cm(2) for the electron capture cross-section of the Thermal Double Donors (TDDs), present in the Cz material, was also measured for the first time. The positive space charge introduced by ionization of the BD centers in Epi diodes was directly determined from TSC experiments for two irradiation fluences. The determined values show a linear fluence dependence for the formation of BD centers. By taking into account the BD and the I-p center generation as well as the donor removal, the change of the effective doping concentration N-eff at 20 degrees C in Epi/Cz and Cz diodes after an annealing time of 120 min at 60 degrees C can be explained up to a negative space charge introduction rate of similar to 2.2 x 10(-2) cm(-1) thought to be determined by negatively charged clusters. Long-time annealing experiments at 80 degrees C have shown that the generation of BDs represents a stable damage. (c) 2005 Elsevier B.V. All rights reserved.

The influence of preliminary treatment in hydrogen plasma on elimination of radiation defects and formation of thermal donors has been studied in detector structures made of standard and oxygenated float zone silicon has been studied. A new type of thermal donors has been found in as-treated diodes. These thermal donors are unstable and can be eliminated by heat-treatment at 200-250 degrees C. After irradiation with 3.5 MeV electrons the detectors had been annealed at temperatures of 50-350 degrees C. It has been found that preliminary hydrogenation at 300 degrees C leads to disappearance of main vacancy-type radiation defects at lower annealing temperatures, The annealing of hydrogenated and irradiated crystals is accompanied by hydrogen redistribution and formation of hydrogen-related donors. Preliminary irradiation influences on both these processes.

The influence of preliminary treatment in hydrogen plasma on elimination of radiation defects and formation of thermal donors has been studied in detector structures made of standard float zone silicon. The detectors were irradiated with 3.5MeV electrons and annealed at temperatures of 50-350 degrees C. It has been found that preliminary hydrogenation at 300 degrees C leads to disappearance of divacancies and vacancy-oxygen complexes at lower annealing temperatures. The annealing of hydrogenated and irradiated crystals is accompanied by hydrogen redistribution and formation of hydrogen-related donors. (c) 2005 Elsevier B.V. All rights reserved.

The proposed luminosity upgrade of the Large Hadron Collider (S-LHC) at CERN will demand the innermost layers of the vertex detectors to sustain fluences of about 10(16) hadrons/cm(2). Due to the high multiplicity of tracks, the required spatial resolution and the extremely harsh radiation field new detector concepts and semiconductor materials have to be explored for a possible solution of this challenge. The CERN RD50 collaboration "Development of Radiation Hard Semiconductor Devices for Very High Luminosity Colliders" has started in 2002 an R&D program for the development of detector technologies that will fulfill the requirements of the S-LHC. Different strategies are followed by RD50 to improve the radiation tolerance. These include the development of defect engineered silicon like Czochralski, epitaxial and oxygen-enriched silicon and of other semiconductor materials like SiC and GaN as well as extensive studies of the microscopic defects responsible for the degradation of irradiated sensors. Further, with 3D, Semi-3D and thin devices new detector concepts have been evaluated. These and other recent advancements of the RD50 collaboration are presented and discussed. (c) 2005 Elsevier B.V. All rights reserved.

An option of increasing the luminosity of the Large Hadron Collider (LHC) at CERN to 1035 cm-2 s-1 has been envisaged to extend the physics reach of the machine. An efficient tracking down to a few centimetres from the interaction point will be required to exploit the physics potential of the upgraded LHC. As a consequence, the semiconductor detectors close to the interaction region will receive severe doses of fast hadron irradiation and the inner tracker detectors will need to survive fast hadron fluences of up to above 1016cm-2. The CERN-RD50 project "Development of Radiation Hard Semiconductor Devices for Very High Luminosity Colliders" has been established in 2002 to explore detector materials and technologies that will allow to operate devices up to, or beyond, this limit. The strategies followed by RD50 to enhance the radiation tolerance include the development of new or defect engineered detector materials (SiC, GaN, Czochralski and epitaxial silicon, oxygen enriched Float Zone silicon), the improvement of present detector designs and the understanding of the microscopic defects causing the degradation of the irradiated detectors. The latest advancements within the RD50 collaboration on radiation hard semiconductor detectors will be reviewed and discussed in this work. 2005 Published by Elsevier B.V.

The envisaged upgrade of the Large Hadron Collider (LHC) at CERN towards the Super-LHC (SLHC) with a 10 times increased luminosity of 10(35) cm(-2) s(-1) Will present severe challenges for the tracking detectors of the SLHC experiments. Unprecedented high radiation levels and track densities and a reduced bunch crossing time in the order of 10 ns as well as the need for cost effective detectors have called for an intensive R&D program. The CERN RD50 collaboration "Development of Radiation Hard Semiconductor Devices for Very High Luminosity Colliders" is working on the development of semiconductor sensors matching the requirements of the SLHC. Sensors based on defect engineered silicon like Czochralski, epitaxial and oxygen enriched silicon have been developed. With 3D, Semi-3D and thin detectors new detector concepts have been evaluated and a study on the use of standard and oxygen enriched p-type silicon detectors revealed a promising approach for radiation tolerant cost effective devices. These and other most recent advancements of the RD50 collaboration are presented. (c) 2005 Elsevier B.V. All rights reserved.

Thin epitaxial layers grown on Cz substrates (Epi) and high resistivity Cz diodes have been irradiated with fluences of 2 x 10(14) cm(-2) 24 GeV protons. It is shown that the differences in the changes observed in the effective doping concentration (N-eff) after irradiation of Epi silicon can be explained by the balance between the formation of two type of defects-a deep acceptor (the I center) and a shallow donor (the BD complex). The BD concentration in Epi material is evaluated to be similar to 1.3 x 10(12) cm(-3). (c) 2005 Elsevier B.V. All rights reserved.

Various types of silicon material and silicon p(+)n diodes have been treated to increase the concentration of the oxygen dimer (02) defect. This was done by exposing the bulk material and the diodes to 6 MeV electrons at a temperature of about 350 degrees C. FTIR spectroscopy has been performed on the processed material confirming the formation of oxygen dimer defects in Czochralski silicon pieces. We also show results from TSC characterization on processed diodes. Finally, we investigated the influence of the dimer enrichment process on the depletion voltage of silicon diodes and performed 24 GeV/c proton irradiations to study the evolution of the macroscopic diode characteristics as a function of fluence. (c) 2005 Elsevier B.V. All rights reserved.

Photoelectrical measurements have shown that the current flow through La2Hf2O7 and LaAlO3 high-k insulator layers deposited on silicon takes place via impurity channels. A space charge limited current is evidenced, for different insulator thicknesses and temperatures, by the square law dependence of current versus voltage. The analysis demonstrates that this space charge limited (SCL) current in thin insulator films can be explained only by the presence of impurity channels situated near the Fermi level of the injecting contact. Many other aspects related to the SCL current behavior were found. (c) 2005 American Institute of Physics.

Nonmonotonic current transients at constant temperature, following a pulsed charge injection, have been observed in silicon diodes heavily irradiated with gamma rays. The features of the transients have been studied at different temperatures and using various reverse biases. The particular shape of the measured transients is interpreted, with the help of numeric simulations, in terms of a strong time dependency of the space charge density due to the discharge of radiation induced deep traps. In particular, a nonmonotonic transient is generated if the discharge of a dominant trap determines the change of the space charge sign (type inversion). In this case the active volume of the sample, from which the current is collected, is increased during the discharge and causes the sample to become fully depleted for a short time. During this time interval the active volume reaches its maximum value and a peak is produced in the transient shape. The measurement of this peak provides a sensitive way to detect type inversion in semiconductor devices and to determine the responsible energy levels. The correlation of nonmonotonic transients with thermally stimulated current spectra and the distortion produced in deep level transient spectroscopy spectra are discussed in detail.

In this paper, electrical investigations performed on complex metal-oxide-semiconductor (MOS) structures with amorphous LaAlO3 deposited as gate oxide on a rapid thermal processed SiO2 buffer layer are presented. Current-voltage (I-V) measurements at different temperatures and high frequency room-temperature capacitance-voltage (C-V measurements indicate the presence of a non-equilibrium state in p-type Si (100) substrate under reverse polarization of the structure. The asymmetry in I-V characteristics is opposite to the expected one for the high-kappa/interfacial layer stack behavior. Different indications for the non-equilibrium MOS state are inferred from the experimental data, and the extraction of MOS physical parameters by using the classical C-V method is shown to be unreliable. For small and large applied forward voltages defect-related charge transport and tunneling currents dominate, respectively. (C) 2003 Elsevier B.V. All rights reserved.

In this work, it is shown that the analysis of thermally stimulated currents (TSC) and current transients (CT) at constant temperature can be a suitable tool to study the influence of deep levels on space charge density N(T) in irradiated silicon diodes. In particular, the occurrence of space charge sign inversion (SCSI) can be related to signal discontinuities in TSC and CT measurements. This approach has been adopted in this work to study devices made of standard Float Zone (FZ) and Diffusion Oxygenated Float Zone silicon, irradiated by gamma-rays up to a dose of 300 Mrad. Our study shows that all the samples are inverted at 50 K after a low-temperature excitation. Several space charge sign inversions, from positive to negative and vice versa, have been observed between cryogenic and room temperature, and have been related to carriers emission from dominating deep traps. Only standard FZ silicon remains inverted at room temperature after a dose of 300 Mrad. (C) 2004 Elsevier B.V. All rights reserved.

The principal of a semiconductor particle detector is briefly outlined and applications in several fields of fundamental and applied physics mentioned. Starting from the basic physics motivation in High Energy Physics (HEP) research, the further discussion then focuses on the use of these devices in present and future HEP experiments outlining especially the requirements for precise measurements of elementary particle tracks, a task ideally fulfilled by segmented silicon detectors. These developments have also initiated further applications in different fields as e.g. material analysis, medical imaging and space missions. In future HEP-experiments such devices will however face an unprecedented challenge imposed by extremely intense radiation fields. Basics of hadron and lepton induced radiation damage in silicon are described together with their implications on the detector quality. The following part of the report is then dealing with several approaches to improve the radiation tolerance of silicon detectors. Defect engineering of the semiconductor material, modified detector geometries and specific operational conditions are outlined. First results toward a complete understanding of detector degradation as caused by point and cluster defects are given and these promising successes may finally pave the way for developments of superior devices.

The influence of oxygen in silicon on bulk damage effects induced by Co-60-gamma irradiation has been studied in a dose range between 0.2 and 900 Mrad. The detector processing and oxygen enrichment were carried out in a common project by the Institute of Micro-sensors CiS using n-type high-resistivity FZ silicon (3-6 kOmega cm) with and orientation. Different oxygen concentrations were achieved by diffusion at 1150degreesC for 24, 48 and 72 h. This report on bulk damage effects is focussed on the observed changes in the reverse current, the effective space charge density N-eff extracted from C/V measurements and investigations using the transient current technique. A substantial improvement of radiation hardness concerning the development of the macroscopic properties was found for detectors manufactured on oxygenated material compared to standard material. It will be demonstrated that the change of the effective space charge density as well as the increase of the reverse current can be attributed to the creation of two deep acceptor levels and a shallow donor level. (C) 2003 Elsevier B.V. All rights reserved.

PbS films were chemically deposited on glass substrates from chemical reducing bath doped with Bi. The growth and properties of PbS layers are investigated. The effect of the reducer and Bi3+ ions on the deposition process was studied with a quartz-crystal microbalance technique. The reducer introduces a new deposition mechanism of electrochemical nature, which allows for thicker films. On the other hand, Bi3+ ions introduce nucleation centers in the solution (Bi(OH)(3)), which accelerate the homogeneous precipitation and diminish the film thickness. The PbS grain size within the layer increases with increasing the Bi content in the deposition bath. A considerable enhancement of the photoconductive signal was found in case of PbS films deposited from Bi doped bath. The signal has nonlinear behavior with the Bi content in the chemical bath. There is an optimum quantity of Bi for which the photoconductive characteristic reaches maximum. (C) 2003 Elsevier Science B.V. All rights reserved.

IR photoconductive properties of PbS films can be controlled using two different methods: (1) chemical, controlling the film morphology and, thus, the physical film properties by adding small amounts of impurities in the deposition bath, (2) physical, using field effect in complex PbS/SiO2/Si pseudo-MOS structures to control the photoconductivity of PbS film. (C) 2003 Elsevier Science B.V. All rights reserved.

Thermally stimulated current measurements of silicon particle detectors have been performed for defect characterization after high levels of gamma- and proton-irradiation. Two defects closely correlated with the detector performance were monitored: a deep acceptor (1) and a bistable donor (BD). In oxygen rich silicon the deep acceptor is largely suppressed while the BD generation is strongly enhanced. The influence of the starting material (standard float zone (FZ), oxygen enriched FZ, Cz, epitaxial silicon) on the formation of these two defects is discussed. Identification of the I-defect with the V2O complex, and of BD with the thermal double donor TDD2 is suggested. (C) 2003 Elsevier B.V. All rights reserved.

Field effect assisted Thermally Stimulated Currents (TSC) measurements were used to differentiate between electron and hole traps in CdS thin films deposited on SiO2/Si substrate. The electrode configuration was designed as for a pseudo-MOS structure, with drain and source contacts on the CdS film surface and using the Si substrate as gate electrode. Electron or hole traps will be favored to fill-up depending on the polarity of the gate voltage applied during illumination at low temperatures. Collection of the thermally released electrons or holes in the drain circuit will depend also on the polarity of the gate voltage applied during heating at constant rate. Comparing the results with those obtained in case of US films deposited on glass, it is possible to differentiate between SiO2/CdS interface traps and bulk CdS ones.

Radiation-induced defects in silicon diodes were investigated after exposure to high doses of Co-60-gamma irradiation using the thermally stimulated current method. We have found that, for high irradiation doses, a second-order defect can be detected. This defect is largely suppressed in oxygen-enriched material while it is the main cause for the space charge sign inversion effect observed in standard float-zone material. (C) 2003 American Institute of Physics.

For the LHC upgrade (fluences up to 10(16) p/cm(2)) epi-Si devices are shown to be a viable solution. No type inversion was measured up to 1.3 x 10(15) 24 GeV/c protons/cm(2) and the charge collection efficiency (CCE) remained close to 100%. For reactor neutrons CCE was measured to be 60% at 8 x 10(15) n/cm(2). Annealing measurements have shown that only moderate cooling during beam off periods would be necessary. As a tentative explanation for the superior quality of these devices, we assume that radiation-induced donor generation leads to compensation effects of deep acceptors. In the future, we will extend the experiments to fluences up to 10(16) p/cm(2) and use also different variants of the epi-Si material and device geometry. (C) 2003 Elsevier B.V. All rights reserved.

Capacitance Deep Level Transient Spectroscopy (C-DLTS) measurements have been performed on standard and oxygen-doped silicon detectors manufactured from high-resistivity n-type float zone material with and orientation. Three different oxygen concentrations were achieved by the so-called diffusion oxygenated float zone (DOFZ) process initiated by the CERN-RD48 (ROSE) collaboration. Before the irradiation a material characterization has been performed. In contrast to radiation damage by neutrons or high-energy charged hadrons, were the bulk damage is dominated by a mixture of clusters and point defects, the bulk damage caused by Co-60-gamma-radiation is only due to the introduction of point defects. The dominant electrically active defects which have been detected after Co-60-gamma-irradiation by C-DLTS are the electron traps VOi, CiCs, V-2(=/-), V-2(-/0) and the hole trap CiOi. The main difference between standard and oxygenated silicon at low dose values can be seen in the introduction rate of CiCs compared to CiOi. For highly oxygenated silicon the introduction of CiCs is fully suppressed, while the sum of the introduction rates g(CiCs)+g(CiOi) is independent on the oxygen concentration. (C) 2003 Elsevier B.V. All rights reserved.

Radiation-induced defects in silicon diodes were investigated after exposure to high doses of Co-60 gamma irradiation, using Deep Level Transient Fourier Spectroscopy and Thermally Stimulated Current methods. The main focus was on differences between standard and oxygen-enriched material and the impact of the observed defect generation on the diode properties. Two close to mid gap trapping levels and a bi-stable donor level have been found to be responsible for the main macroscopic changes both in standard and oxygen-enriched float zone diodes. (C) 2003 Elsevier B.V. All rights reserved.

Isothermal and isochronal annealing experiments have shown that the I defect (the main cause for the changes in silicon diodes characteristics after high levels of gamma-irradiation) is stable up to 325-350degreesC. Possible reactions, which can explain the behavior of different defects formed during the annealing experiments, are discussed. All the experimental results concerning the I center (second-order irradiation induced defect, formed most likely via VO center, suppressed in oxygen rich material, high thermal stability) make it the favorite for being associated with the V2O2 complex. (C) 2003 Elsevier B.V. All rights reserved.

Nitrogen doped 4H-SiC epitaxial layers grown by hot-wall chemical vapor deposition were investigated by deep level transient spectroscopy in the as-grown state. Besides the Z(1,2) defect level at E-C - 0.66 eV, that seems to be omnipresent, four other electron traps labeled IL1 to IL4 With ionization energies between 0.87 and 1.31 eV could be detected. The dependence of the deep level concentrations on the incorporated N concentration ranging from few 10(14) to Some 10(15) cm(-3) and the C/Si ratio (1.2divided by3) was examined. The concentration of both Z(1,2) and IL1 increases with increasing N doping. For medium C/Si ratios this dependence is linear for Z(1,2) and quadratic for IL1. High C/Si ratios enhance the formation of Z(1,2) while they suppress that of IL1. These results suggest a complex of interstitial C and N on carbon site (C-i-N-C) for Z(1,2) and a nitrogen pair (N-C-N-i) for IL1. However, other possibilities like Si vacancy related defects cannot be ruled out at present.

MOS-like structures were obtained by chemical deposition of a polycrystalline PbS thin film on top of a silicon dioxide/Si substrate. Gold ohmic electrodes in coplanar configuration were subsequently deposited by vacuum evaporation on PbS surface (drain and source electrodes). The gate aluminum electrode was deposited on the back of the Si substrate. The dependence of the photoconductive signal, generated in the PbS film, on the gate voltage was studied for wavelengths ranging between 800 nm and 3000 nm at room temperature as well as at low temperatures. It was found that the relative variation of the signal could be as high as 50% for gate voltages ranging between -30 V and +30 V. Two possible mechanisms are proposed to explain the signal variation with the gate voltage: 1) Variation of the depleted region's thickness in the PbS film, that leads to a variation of the conduction channel's resistance (the reference resistance called, also, the dark resistance), 2) The possible variation of the majority carriers (holes) life-time due to the electron blocking at the PbS/oxide interface when positive gate voltages are applied on the back electrode. Integrated IR detectors with controlled sensitivity in the 800-3000 nm range can be manufactured at a relatively low cost using the PbS/oxide/Si MOS-like structure.

The deep level transient spectroscopy method was applied on standard and oxygenated float-zone silicon detectors exposed to high doses of Co-60-gamma irradiation. We have detected and characterized a close to midgap trapping level having an ionization energy of E-C-(0.545+/-0.005) eV and electron/hole capture cross sections of sigma(n)=(1.7+/-0.2)x10(-15) cm(2)/sigma(p)=(9+/-1)x10(-14) cm(2) respectively. This level has a strong impact on the detector performance being responsible for more than 90% of the change in the effective doping concentration. The defect is strongly oxygen related and a possible connection with the V2O complex is discussed. (C) 2002 American Institute of Physics.

We propose an improved method for the analysis of Thermally Stimulated Currents (TSC) measured on highly irradiated silicon diodes. The proposed TSC formula for the evaluation of a set of TSC spectra obtained with different reverse biases leads not only to the concentration of electron and hole traps visible in the spectra but also gives an estimation for the concentration of defects which not give rise to a peak in the 30-220 K TSC temperature range (very shallow or very deep levels). The method is applied to a diode irradiated with a neutron fluence of phi(n) = 1.82 x 10(13) n/cm(2). (C) 2002 Published by Elsevier Science B.V.

As-grown 4H-SiC epitaxial layers were investigated by deep-level transient spectroscopy to study the formation of the well-known Z(1,2) defect with energy levels normally detected at about E-C-0.7 eV. Chemical vapor deposition, applying various nitrogen-doping concentrations and C/Si ratios (1.2-3) in the gas phase, was used to prepare the samples. The Z(1,2) defect concentration was observed to increase with the incorporated nitrogen concentration. The dependence was linear for medium C/Si ratios (1.5-2.5). The highest and lowest applied C/Si ratios (3 and 1.2) enhanced and suppressed the Z(1,2) defect formation, respectively. This behavior tentatively suggests a complex of nitrogen with interstitial carbon atoms or, less probably, silicon vacancies. In particular, the correlation between the Z(1,2) defect formation and the nitrogen incorporation was clearly shown in the present investigation, in contradiction to conclusions of other authors. Previously reported negative-U properties of the Z(1,2) deep-level defects could be confirmed. A 1:1 relation between the concentrations of Z(1) and Z(2) was obtained for the present as-grown epitaxial layers. (C) 2002 American Institute of Physics.

Lead sulfide (PbS) thin films were deposited from a chemical bath onto SiO2/Si (n-type) substrates. Pseudo-metal-oxide-semiconductor devices were obtained by evaporating source and drain gold electrodes on a PbS surface and aluminum gate electrode on a Si substrate. Field-effect-assisted photoconductivity in the PbS layer was investigated at room temperature, in the 800-2700-nm-wavelength domain for different values and polarities of the drain and gate voltages. The best results were obtained for a positive gate, when both semiconductors are in depletion. An enhancement of about 25% of the photoconductive signal is obtained compared with the case when the gate electrode is absent or is not used. A simple model is proposed that explains the behavior of the dark current and photoconductive signal in PbS film with changing the gate voltage. (C) 2002 American Institute of Physics.

PbS films were obtained on glass substrates using the chemical bath deposition (CBD) method. The infrared (IR) photosensitivity increases of about 1000 times when a reducing agent (hydroxylamine hydrochloride NH2OHHCl) is added in the deposition bath. A further enhancement was tried by adding small amounts of antimony chloride (SbCl3) solution in the deposition bath. The result was just opposite. It was found that the photosensitivity decreases with increasing the Sb salt content. The changes in PbS photoconjuctive properties are correlated with the changes in film morphology due to the two compounds added in the bath - the reducing agent and the Sb salt. (C) 2001 Elsevier Science B.V. All rights reserved.

We propose an improved method of thermally stimulated currents (TSC) spectra analysis in the case of diodes having a concentration of traps higher than that of doping impurities. Beside the calculation of trap concentrations from TSC peaks analysis, the method allows us to evaluate the density and the type of the very deep trapping level which, due to the contribution of leakage current, can not be detected in a real TSC experiment. The proposed method is applied to a p(+)-n Silicon diode irradiated with 1.82x10(13)neutrons/cm(2). (C) 2001 American Institute of Physics.

Photoconductive properties of some sol-gel deposited. ferroelectrie thin films are investigated in the ultraviolet (UV) domain. The investigated materials are: Bi4Ti3O12 (BiT), SrBi2Ta2O9 (SBT) and Pb(Zr0.45Ti0.55)O-3 (PZT). It was found that all these materials exhibit pronounced photoconductivity in the 250-500 nm domain. The best current responsivity was obtained for Bi4Ti3O12 (BiT) films. (C) 2001 Elsevier Science B.V. All rights reserved.

6H-SiC bulk single crystals grown by physical vapor transport (PVT) were investigated by deep-level transient spectroscopy (DLTS) and electron paramagnetic resonance (EPR). One of the observed deep level defects was identified as isolated tungsten on Si sites by EPR. The electron spin of 1 could be explained by W5+ (5d(1)). This is equivalent to the single positive charge state of a double donor when taking into account the Fermi level position in the n-type samples. The interpretation is also consistent with the DLTS detection of a W related deep level which showed a behavior of the capture of electrons and holes that hints at a double donor. In addition a tantalum related deep level is tentatively discussed. W and Ta were incorporated on electrically active sites in 6H-SiC only in low concentrations (2-4 x 10(4) cm(-3)) during crystal growth by PVT. (C) 2001 Elsevier Science B.V. All rights reserved.

This report summarises the final results obtained by the RD48 collaboration. The emphasis is on the more practical aspects directly relevant for LHC applications. The report is based on the comprehensive survey given in the 1999 status report (RD48 3rd Status Report, CERN/LHCC 2000-009, December 1999), a recent conference report (Lindstrom et al, (RD48), and some latest experimental results. Additional data have been reported in the last ROSE workshop (5th ROSE workshop, CERN, CERN/LEB 2000-005), A compilation of all RD48 internal reports and a full publication list can be found on the RD48 homepage (http://cern.ch/RD48/). The success of the oxygen enrichment of FZ-silicon as a highly powerful defect engineering technique and its optimisation with various commercial manufacturers are reported. The focus is on the changes of the effective doping concentration (depletion voltage). The RD48 model for the dependence of radiation effects on fluence, temperature and operational time is verified: projections to operational scenarios for main LHC experiments demonstrate vital benefits. Progress in the microscopic understanding of damage effects as well as the application of defect kinetics models and device modelling for the prediction of the macroscopic behaviour was also been achieved but will not be covered in detail. (C) 2001 Elsevier Science B.V. All rights reserved.

The RD48 (ROSE) collaboration has succeeded to develop radiation hard silicon detectors. capable to withstand the harsh hadron fluences in the tracking areas of LHC experiments. In order to reach this objective, a defect engineering technique was employed resulting in the development of Oxygen enriched FZ silicon (DOFZ), ensuring the necessary O-enrichment of about 2 x 10(17) O/cm(3) in the normal detector processing. Systematic investigations have been carried out on various standard and oxygenated silicon diodes with neutron, proton and pion irradiation up to a fluence of 5 x 10(14)cm(-2) (1 MeV neutron equivalent). Major focus is on the changes of the effective doping concentration (depletion voltage). Other aspects (reverse current, charge collection) are covered too and the appreciable benefits obtained with DOFZ silicon in radiation tolerance for charged hadrons are outlined. The results are reliably described by the "Hamburg model": its application to LHC experimental conditions is shown, demonstrating the superiority of the defect engineered silicon. Microscopic aspects of damage effects are also discussed. including differences due to charged and neutral hadron irradiation. (C) 2001 Elsevier Science B.V. All rights reserved.

The trapping levels induced in p-n Si junctions by irradiation with 24 GeV proton were investigated using Thermally Stimulated Currents (TSC) methods in the 90-300 K temperature range. Several trapping levels, with activation energies between 0.27 and 0.57 eV, were put into evidence. The spatial distribution of the traps was investigated using different wavelengths for the light used to fill the traps. The results lead to the conclusion that the deepest trapping levels are not uniformly distributed in the volume of the sample. For the most important trapping level the average introduction rate was estimated to 0.9-1.2 cm(-1). The activation energy and the capture cross-section of this trapping level seems to depend on the impurity element introduced in Si. (C) 2000 Elsevier Science B.V. All rights reserved.

Optical charging spectroscopy (OCS) is first time reported as applied to p-n junctions. The existence of one deep trapping level for electrons and two deep trapping levels for holes was put into evidence, using this method, in proton irradiated p(+)-n-n(+) silicon structures. An analytical formula for the OCS discharging current for this type of structures was deduced. (C) 2000 Elsevier Science B.V. All rights reserved.

Pb(ZrxTil .x)O-3 (x = 0 divided by 0.8) graded thin films were fabricated by sol-gel method on Pt/ SiO2/ Si substrates using metal alkoxide solution. The samples were crystallized by conventional thermal annealing in air for 30 min. at 700 degreesC. The ferroelectric properties of the graded structure were investigated Specific unusual behavior in the ferroelectric loops like large offset on the polarization axis was observed and disscused.

p-type lead sulphide (PbS) thin films were chemically deposited onto Si3N4/n-Si substrates. A three-contact pseudo-metal-oxide-semiconductor structure was designed in order to investigate the possibility of enhancing the signal-to-noise ratio in the PbS film by field effect. It was proved that on the entire sensitivity domain of PbS (1-3 mu m at room temperature), the magnitude of the photoconductive signal generated by the PbS film depends on the polarity and value of the gate voltage. It is shown that the signal-to-noise ratio can be enhanced in this way with by at least 25% compared with the case when the gate electrode is in air (standard configuration for photoconductive measurements). (C) 2000 American Institute of Physics. [S0003-6951(00)01514-X].

Cadmium sulphide films were prepared by Chemical Bath Deposition (CBD) technique from CdCl2, CdSO4, Cd(CH3COO)(2) respectively, as cadmium precursor salts, and thiourea in ammoniacal medium. In this paper we study the changes in the morphology and properties of the films prepared from different cadmium salts, although the starting reaction parameters as concentration of the reactants, pH (denoted as pH(i)), temperature, and time of reaction for all precursor cadmium salts are identical. It is proposed that, during the deposition process, depending upon the anion type of cadmium salt the pH of reaction mixture decrease with different rates. The pH(i) decreases in the deposition bath could allow the change of the layers growth mechanism and therefore the change in the morphology and properties of the films. Above a certain value of starting pH (pH(i) >12.5), the pH decrease did not affect the growth mechanism and properties of the layers. The structure and morphology of the films were investigated by Scanning Electron Microscopy (SEM), Atomic Force Microscopy (AFM) and X-ray diffraction (XRD). Also the optical, electrical and photoelectrical characteristics of the layers and their dependence on films morphology were presented. These studies have allowed us to establish the optimum conditions for fabrication of quality CdS films using CdCl2, CdSO4, or Cd(CH3COO)(2) as cadmium precursor salts.

A detailed formula for the equivalent pyroelectric coefficient of a bimorph structure acting as a pyroelectric detector was deduced. It is shown that electric fields occur in the structure when it is subjected to a temperature variation, due to the unequal charges generated by the two components. The field dependence of the ferroelectric polarization has to be considered in this case and the (partial derivativeP/partial derivativeE) derivative appears explicitly in the deduced formula. The effect is that the equivalent pyroelectric coefficient has different values for heating and cooling. This could lead to a redressing effect on the pyroelectric signal if the temperature difference varies periodically. The equivalent pyroelectric coefficient is, also, thickness dependent. This fact offers the possibility of designing structures with high values of pyroelectric coefficient compared with the values of the component phases. (C) 2000 American Institute of Physics. [S0021- 8979(00)04701-6].

Annealing studies of a proton irradiated Si test diode (1MeV- neutron equivalent fluence is phi (eq) = 1.82x10(13) cm(-2)) were performed. The macroscopic characterization shows that during the annealing experiment the type inversion effect happened. The changes in the microscopic features during the annealing treatment were investigated using Thermally Stimulated Current method.

Cadmium sulphide (CdS) thin films were deposited on glass substrate by precipitation from aqueous solution technique. The films were doped with copper using the direct method consisting in the addition of a copper salt (CuCl(2)) in the deposition bath of CdS. The doped films were annealed in air, at 300 degrees C, for 1 h. We report some structural, optical, electrical and photoelectrical properties of CdS thin films before and after Cu doping, correlated with investigation of trapping levels by Thermally Stimulated Currents (TSC) method. (C) 1999 Elsevier Science S.A. All rights reserved.

Thermally stimulated current (TSC) measurements performed in the 100 K-400 K temperature range on Bi4Ti3O12 (BiT) thin films annealed at 550 degrees C and 700 degrees C had revealed two trapping levels having activation energies of 0.55 eV and 0.6 eV. The total trap concentration was estimated at 10(15) cm(-3) for the samples annealed at 550 degrees C and 3 x 10(15) cm(-3) for a 700 degrees C annealing and the trap capture cross-section was estimated about 10(-18) cm(2). From the temperature dependence of the dark current in the temperature range 20 degrees C-120 degrees C the conduction mechanism activation energy was found to be about 0.956-0.978 eV. The electrical conductivity depends not only on the sample annealing temperature but also whether the measurement is performed in vacuum or air. The results on the dark conductivity are discussed considering the influence of oxygen atoms and oxygen vacancies.

Ferroelectric Bi4Ti3O12 (BiT) thin films of different thicknesses were deposited on p-type Si substrates using the Chemical Solution Deposition (CSD) method. The films were crystallized by the conventional thermal annealing for 30 min at temperatures in the 500-700 degrees C range. It was found that the shape of the photoconductive signal spectral distribution is dependent on the film thickness. For thin films (150 nm) four peaks were observed (400, 500, 860 and 1075 nm) and the photoconductive signal occurs only if the Si substrate is negatively biased. For thicker films (500 nm) only two peaks were observed (370 and 1075 nm) and the photoconductive signal occurs no matter the polarity of the applied voltage. (C) 1999 Elsevier Science Limited. All rights reserved.

An analytical formula for the optical charging spectroscopy (OCS) discharging current in the case of homogeneous semiconductors is deduced. The computation shows that the OCS current is proportional with the square of the initially trapped carrier concentrations. This result leads to a higher sensitivity in case of the OCS method compared with the thermally stimulated current method. The OCS current formula obtained for one trapping level is generalized in the case of many trapping levels. From the generalized formula it can be seen that the OCS current can change the sign if both electron and hole traps exist in the sample. (C) 1998 American Institute of Physics.

The Optical Charging Spectroscopy (OCS) was applied for the first time to investigate the trapping levels in high resistivity silicon irradiated with neutrons. An analytical formula for the OCS discharging current has been obtained. The theoretical and experimental results proved that the OCS is more sensitive than the usual Thermally Stimulated Currents method.

The ferroelectric/semiconductor heterostructures were fabricated by sol-gel deposition of lead titanate (PT) thin films on a single-crystalline p-type Si wafers. The ETT films were crystallyzed by a conventional thermal annealing for 30 min at temperatures ranging from 575 degrees C to 675 degrees C. Current-voltage and capacitance-voltage characteristics show a hysteresis which can be due to the spontaneous polarization of PbTiO3. The current-voltage characteristics exhibit a diode behaviour while the capacitance-voltage exhibits a large memory window, up to 3.5 V, for the films annealed at 600-650 degrees C. At the illumination with modulated light, a.c. photovoltage was detected on a broad range of wavelengths (0.35+4 mu m) for all samples. The spectral distribution of the photoelectric signal in the UV-Vis-IR domain shows two local maxima. A model is proposed to explain the observed experimental results.

PbS films were chemically deposited on poled and unpoled ferroelectric ceramic substrates and on glass. The sensitivity of the PbS thin films and the concentration of trapping centers inside these films depend on the nature of the substrate and, in the case of poled ferroelectric substrates, depend on the polarity of the ferroelectric polarization as well. A considerable enhancement of the photoconductive signal at liquid nitrogen temperature was found in the case of PbS films deposited on the positive face of a poled ferroelectric substrate. (C) 1997 Elsevier Science S.A.

A lead sulphide/lead titanate/silicon (PbS/PbTiO3/Si) heterostructure was manufactured by successive deposition of PbTiO3 and PbS thin film on a single crystalline, p-type Si substrate. Chemical methods were used for deposition. A three electrode configuration was used to control the photoconductivity of PbS thin film by field effect, through the ferroelectric PbTiO3 thin film. The spectral distribution of the photoconductive signal shows two maxima, situated at 1.1 and 2.45 mu m. It was found that the photoconductive signal at 1 mu m varies of about eight times when the voltage applied on the Si substrate is varied between -1 and +1 V. At 2 mu m the photoconductive signal is almost independent of the applied voltage on the Si substrate. The observed results are explained considering a ferroelectric field effect by which the photogenerated carriers in Si influence the photoconductive signal in the PbS thin film. (C) 1997 American Institute of Physics.

The frequency characteristic of the transverse photoelectric signal of a three electroded PbS/ferroelectric heterostructure is analyzed in this paper. The ferroelectric material is a lead titanate-zirconate ceramic obtained by hot pressing. It was found that the frequency characteristic of this signal is similar to a high-pass filter and depends on the properties of the ferroelectric substrates on which the PbS film was deposited, An equivalent circuit was proposed comparing the studied heterostructure with a metal-oxide semiconductor (MOS) structure. The circuit elements were determined fitting the obtained formula for the output signal with the experimental data. Some of the circuit elements were determined experimentally using various measuring techniques. It was found that the experimentally determined values are close to the theoretically determined values. The studied heterostructure can be changed into a band-pass filter adding some external circuit elements such as resistors and capacitors.

Parallel and series pyroelectric bimorph structures, with 2-2 connectivity, are theoretically analysed to obtain the electric fields inside the two component phases. The proposed model takes into consideration the possibility of an electrical interaction between the two phases. It is demonstrated that the value of the internal electric field, due to the pyroelectric charge generated during heating of the bimorph structure, is considerably different than the case where each of the two phases is heated separately. It is shown that the value and the orientation of the electric fields inside the two phases of the bimorph depend on the value of the pyroelectric coefficients and dielectric constants of the two phases. The most interesting result is obtained in the case of the series bimorph, where the orientation of the electric field inside the phase with a lower pyroelectric coefficent is opposite to the orientation of spontaneous polarisation of this phase.

Using the Thermally Stimulated Current (TSC) method, the activation energy of trapping levels in sol-gel deposited lead titanate films was determined. Four levels were found in films annealed at 550 degrees C and 600 degrees C. Their activation energies are: E-1 = 0.23 eV, E-2 = 0.30 eV, E-3 = 0.34 eV and E-4 = 0.40 eV. For the films annealed at 650 degrees C only one level (E-2) was observed. It was found that the TSC magnitude decreases if the same sample is subjected to several cycles of cooling and heating between 100 K and 373 K in vacuum. This suggests a ''healing'' of the traps, probably due to the desorption of some gaseous species from the surface of the ferroelectric thin film.

Cadmium sulphide (CdS) thin films were deposited on glass substrates using the homogeneous precipitation technique and different cadmium salts. The structure of the films was analysed using scanning electron microscopy (SEM). Thermally stimulated current (TSC) measurements had revealed the existence of several trapping levels in as deposited and annealed films. The activation energy of these traps was determined from TSC measurements. The following values were found for CdS films deposited from cadmium acetate: E-1 = 0.3 eV; E-2 = 0.45 eV, E-3 = 0.51 eV. For CdS films deposited from cadmium chloride several trapping levels were found with the activation energies between 0.04 and 0.33 eV. A considerable enhancement of photoconduction after annealing in air was found. The experimental results were explained considering a sensitizing process due to the chemisorbtion of the oxygen. (C) 1997 Elsevier Science S.A.

An anomalous high signal was observed across lead sulphide-ferroelectric ceramic heterostructures illuminated at room temperature with light having wavelengths between 0.8 and 3.1 mu m. The frequency characteristic of this signal is similar to a high-pass filter and depends on the value of the load resistance in series with the lead sulphide thin film, This signal is only two to three times smaller than the usual photoconductive signal generated by the lead sulphide thin film. Its nature is not pyroelectric because of its frequency dependence. The interface charge released from the PbS-ferroelectric interface during polarization reversal was integrated and a hysteresis loop was obtained. Electrons and hole concentrations were evaluated from this curve. The values obtained are: 4.4 x 10(16) cm(-3) for holes and 3.4 x 10(16) cm(-3) for electrons.

PbS/PbTiO3/Si heterostructures were prepared by successive depositions of a PbTiO3 thin film using the sol-gel method and of a PbS thin film using the coprecipitation method on a bulk silicon wafer. The current-voltage characteristic of the heterostructure is of a diode type. The heterostructure is sensitive over a broad range of wavelengths, from 0.35 to 3 mu m, when illuminated with continuous light or with modulated Light. Three sensitivity peaks are observed, at 2.7, 0.95, and 0.38 mu m. The measured signals are attributed to a photovoltaic effect which appears in the studied heterostructure.

Photoelectric properties of PbTiO3/Si heterostructures were investigated over a broad range of wavelengths. The spectral distribution of the a.c. open-circuit voltage was measured for wavelengths ranging from 0.35 mu m to 4 mu m. Two local peaks are observed at 0.38 mu m and 0.9 mu m which can be attributed to band-to-band excitations in PbTiO3 and Si respectively. The shape of the a.c. signal depends both on the light intensity and on the wavelength. When the heterojunction is reverse-biased, a d.c. photocurrent was observed which has a similar spectral distribution as the a.c. open-circuit voltage.

Optical charging spectroscopy and thermally stimulated depolarization measurements were performed on metal-insulator-semiconductor-insulator-metal structures with a ZnS:Mn active layer. Two groups of trapping centres situated at every insulator-semiconductor interface were in evidence. Their depths were found to be centred at 0.55 eV and 0.875 eV respectively in the forbidden gap of a ZnS:Mn film. A partial thermal healing of these interface states was observed.

The growth and properties of PbS thin films, chemically deposited on bull; lead titano-zirconate ceramics, are investigated. Scanning electron microscopy photographs reveal that the medium size of crystallites is much larger for PbS films grown on poled ferroelectric substrates than for the films grown onto glass or onto unpoled ferroelectric substrates. In the first case the medium size of crystallites is about 1-1.5 mu m while in the second case it is less than 0.3 mu m. Spectral distribution of photoconductivity and thermally stimulated currents (TSC) measurements were performed on all samples. Experimental results indicate that the properties of the PbS films can vary, depending on the substrate nature and in the case of poled ferroelectric substrates, on the polarity. The photoconductive signal is usually larger, the dark resistivity is smaller, and the TSC current value is higher for PbS films deposited on the positive face of the ferroelectric substrate than for those deposited on the negative face. (C) 1995 American Institute of Physics.

Localized levels play a major role in the electro-optic properties of Bi12SiO2O (BSO) crystals. The activation energy of trapping levels was studied by different laboratories using various methods (e.g., thermally stimulated currents and photoinduced current transient spectroscopy). A more sensitive investigation of traps in undoped BSO single crystals has been performed by optical charging spectroscopy. The presence of traps in the energy range 0.2-1.1 eV was found, and the results are in good agreement with previous studies. On the other hand, this method led us to suggest that the trapping levels observed can be both electron traps and hole traps. For deep trapping levels at higher temperatures, a strong temperature dependence of the cross section was observed.

The discovery of ferroelectricity in doped HfO2 represents an excellent opportunity to overcome the obstacles in manufacturing reliable ferroelectric field effect transistors (FeFET) for nonvolatile memory applications, considering that HfO2 is compatible with Si and Ge and it is already used in semiconductor industry. The presence of interface defects may have detrimental effects on the operation of FeFETs, so their role is systematically investigated in this study in correlation with the substrate doping. Metal-ferroelectric-semiconductor (MFS) structures are fabricated by depositing Hf0.5Zr0.5O2 (HZO) layers on n-type Ge substrate. Their electric properties are compared with those of MFS structures obtained by depositing HZO on p-type Ge, to study the influence of the doping. It is found that, although the ferroelectric properties of HZO are similar, the capacitance and impedance of the MFS structures behave differently. For n-Ge, the occupation probability of a large number of low-lying interface defect acceptor states, charges the interface negatively which adversely affects the C-V response of the MFS, albeit without harming the ferroelectric (P-V) hysteresis. Although the interface defects do not harm ferroelectricity, they could inhibit inversion in p-type Ge or accumulation in n-type Ge so they should be taken into account when designing Ge FeFET devices.