SURFACE systems+technology GmbH & Co. KG Pulsed Laser Deposition (PLD) workstation
FACILITIES / NANOMATERIALE
SURFACE systems+technology GmbH & Co. KG Pulsed Laser Deposition (PLD) workstation equipped with: 2 deposition chambers, each with 4-target carousels; a KrF excimer laser with 248 nm wavelength, repetition rate of 1 – 10 Hz, and maximum energy of 700 mJ; control of laser fluence; substrate heating up to 1000 °C; control of working gases pressure; in-situ reflection high-energy electron diffraction (RHEED) capabilities. One reaction chamber is used to deposit ferroelectric layers based on perovskites and other metal oxides (e.g., doped ZnO, HfO2), whilst the other chamber is used to prepare superconductor thin films.
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