Chemical Vapor Deposition (CVD) system with quartz tube reactor for synthesis of 2D materials

FACILITIES /

Chemical Vapor Deposition (CVD) system with quartz tube reactor for synthesis of 2D materials

Technical details:

Tube Furnace Model No. CY-1200X-III-50IC with sliding rail support, 2 flange supports and vacuum pump

– Quartz tube with OD 50 mm, flanges, pressure Gauge

– Double layer structure

– Chamber: high purity alumina refractory fiber

– Length of furnace: ~ 800 mm

– Three heating zone with length: 220 mm / 220 mm / 220 mm

– Heating elements are made from Fe-Cr-Al Alloys doped by Mo

– Temperature controller: Three precision temperature controllers to control three zones separately.

– Temperature control mode: PID automatic control with 30 programmable segments for precise control of heating rate, cooling rate and dwell time.

– Operating temperature: 0 – ~1100 °C;

– Temperature control accuracy: ± 1 °C;

– Protections: Built in overheating and broken thermocouple protection, over temperature protection and alarm.

– Sliding rail support length: 2000 mm

Agilent TriScroll 300 vacuum pump: a two-stage clean, dry scroll pump that operates at a pumping speed of 15 m3/h (250 L/min).

Gas mixing system: Twoway for N2 and Ar (other gases by gas tank) each with Mass Flow Controller MKS GM50A013103MBM020 (20 – 1000 sccm N2) and controlled by MKS PR4000B.

Performances:

– Rapid Thermal Annealing for synthesis of 2D materials.



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