CVD equipment for deposition of polymers


CVD equipment for deposition of polymers

The equipment is intended for necessary research needed to obtain new heterostructures with applications in microelectronics, optoelectronics, renewable energy, advanced sensors and for applications in medicine, energy storage.

Substrate size: 2 inches;
Base vacuum chamber in deposit: 10-5 mbar;
Substrate temperature: 550 oC;
Gas Lines: 2, with flow control;
Automatic and computerized control of all process parameters, including recipes’ storage.

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