Scanning Electron Microscope S-3400 N (Hitachi) with Quantum Elphy Nanolithography System and Laser Interferometer Ultra Precision Positioning Strage (Raith)

The nanolithography facility of SEM is esential for preparation of nanostructures and for contact definition with a resolution of about 100 nm. A nanolithography equipment comprises besides the standard SEM feature, a facility with computer controlled electron beam for direct “writing” the small size features directly onto the sample surface. A special CAD software is employed for writing the desired features for defining the nanostructures or electrical contact. A exposure sensitive polymer can be employed to defining of the exposed and nonexposed areas. The procedure can be used for preparing samples with nanodots, nanowires, nanotubes, nanorods of semiconductor or oxidic materials. Actual preparation of nanostructures and/or contacts is completed by chemical etching in the cleanroom or by etching in a focused ion beam equipment.