CVD equipment for deposition of carbon-based materials

The equipment will be used for the deposition of carbon-based materials, such as graphene, nanotubes, possibly SiC, necessary for developing heterostructures of interest, including such materials.

• Substrate size: 2 inches;
• Base vacuum chamber in deposit: minimum 10-5 mbar;
• Substrate temperature of 1400 ^oC;
• Gas Lines: 5, with flow control;
• Automatic and computerized control of all process parameters, including recipes’ storage.