The equipment is intended for necessary research needed to obtain new heterostructures with applications in microelectronics, optoelectronics, renewable energy, advanced sensors and for applications in medicine, energy storage.
TECHNICAL SPECIFICATIONS
Substrate size: 2 inches;
Base vacuum chamber in deposit: 10-5 mbar;
Substrate temperature: 550 oC;
Gas Lines: 2, with flow control;
Automatic and computerized control of all process parameters, including recipes’ storage.
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