Low energy and Photoelectron Electron Microscope LEEM-PEEM (Specs)

The setup operates in ultrahigh vacuum (below 2 x 10-10 mbar).

Methods available:

Low energy electron microscopy (LEEM) in bright and dark field with a lateral resolution of 4 nm;
Photoemission electron microscopy (PEEM) with two UV excitation sources (Hg lamp and He I – He II lamp), lateral resolution about 15 nm;
Mirror electron microscopy (MEM);
Micro-Low energy electron diffraction (Micro-LEED);
k-space mapping with sub-micron lateral resolution (individual grains).
recording LEEM, PEEM, MEM, LEED movies in real time during thermal treatments, ion sputtering or thin layer growth.
Fig. 1 represents the setup and Fig. 2 shows the first results obtained for the visualization of the single atom terraces of Si(001) by low energy electron microscopy (LEEM).