Multi-cathode radio-frequency (RF), direct current (DC) and pulsed direct current (p-DC) Magnetron Sputtering (MS) systems

Multi-cathode radio-frequency (RF), direct current (DC) and pulsed direct current (p-DC) Magnetron Sputtering (MS) systems with various facilities: bias, etching and heating (up to 800 °C) of substrates; vacuum load-lock for sample transfer; vacuum systems (down to ~10^-6 Pa); computerized control and process automation. The latest MS equipment, AJA PHASE II J, purchased in 2016, is shown in Fig. 1. Each MS system in Laboratory 20 is dedicated to a distinct class of materials: metallic contacts; semiconductor, dielectric and ferroelectric materials; biocompatible materials.