SURFACE systems+technology GmbH & Co. KG Pulsed Laser Deposition (PLD) workstation

SURFACE systems+technology GmbH & Co. KG Pulsed Laser Deposition (PLD) workstation equipped with: 2 deposition chambers, each with 4-target carousels; a KrF excimer laser with 248 nm wavelength, repetition rate of 1 – 10 Hz, and maximum energy of 700 mJ; control of laser fluence; substrate heating up to 1000 °C; control of working gases pressure; in-situ reflection high-energy electron diffraction (RHEED) capabilities. One reaction chamber is used to deposit ferroelectric layers based on perovskites and other metal oxides (e.g., doped ZnO, HfO₂), whilst the other chamber is used to prepare superconductor thin films.