Clean room (including five chemical fume hoods, spin coater equipment, electric stoves with programmable temperature, RIE and metallization equipment)
The Clean room is designed for research that is needed in order to obtain new…
Tescan Lyra 3XMU SEM-FIB dual system
A multifunctional instrument, provided with imaging (FEG-SEM), ion-beam processing (FIB), analytical (EDS) and electron diffraction…
Scanning Electron Microscope S-3400 N (Hitachi) with Quantum Elphy Nanolithography System and Laser Interferometer Ultra Precision Positioning Strage (Raith)
The nanolithography facility of SEM is esential for preparation of nanostructures and for contact definition…
Photolithography Mask Aligner EVG 620 NT with Nanoimprint Litography (EV Group)
The equipment for optical litography allows for selectively masking and exposing of certain areas of…
Electron lithography equipment – High resolution installation
Equipment for high resolution electron printing that will be used to realize various types of…
CVD equipment for deposition of polymers
The equipment is intended for necessary research needed to obtain new heterostructures with applications in…
CVD equipment for deposition of carbon-based materials
The equipment will be used for the deposition of carbon-based materials, such as graphene, nanotubes,…
Hot-Press Sintering (MRF Inc.)
The Hot Press Sintering equipment, manufactured by MRF Inc. (SUA), is optimized to perform pressure…
Microwave Sintering (LINN)
The Microwave Sintering equipment, manufactured Linn Highterm GmbH (Germany) is optimized to perform microwave assisted…
Spark Plasma Sintering (FCT)
Main characteristics: Front loading Direct (pulsed) current heating Impulse The Spark Plasma Sintering equipment, model…